Prosecution Insights
Last updated: August 16, 2026
Application No. 18/832,322

Storage Device

Final Rejection §103
Filed
Jul 23, 2024
Priority
Jan 28, 2022 — JP 2022-012185 +1 more
Examiner
LEBOEUF, JEROME LARRY
Art Unit
2824
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Semiconductor Energy Laboratory Co., Ltd.
OA Round
2 (Final)
85%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
439 granted / 515 resolved
+17.2% vs TC avg
Moderate +7% lift
Without
With
+7.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
23 currently pending
Career history
541
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
46.4%
+6.4% vs TC avg
§102
26.3%
-13.7% vs TC avg
§112
21.9%
-18.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 515 resolved cases

Office Action

§103
DETAILED ACTION As per MPEP 2111 and 2111.01, the claims are given their broadest reasonable interpretation and the words of the claims are given their plain meaning consistent with the specification without importing claim limitations from the specification. In responding to this Office action, the applicant is requested to include specific references (figures, paragraphs, lines, etc.) to the drawings/specification of the present application and/or the cited prior arts that clearly support any amendments/arguments presented in the response, to facilitate consideration of the amendments/arguments. Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Should applicant desire to obtain the benefit of foreign priority under 35 U.S.C. 119(a)-(d) prior to declaration of an interference, a certified English translation of the foreign application must be submitted in reply to this action. 37 CFR 41.154(b) and 41.202(e). Failure to provide a certified translation may result in no benefit being accorded for the non-English application. Amendment Acknowledgment is made of applicant's Amendment, filed 06-17-2026. The changes and remarks disclosed therein have been considered. Claim(s) 1-3 has/have been amended, and claim(s) 1-5 remain(s) pending in the application. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-5 is/are rejected under 35 U.S.C. 103 as being unpatentable over Ishizu, US 20160351243 A1. As to claim 1, Ishizu discloses a storage device comprising: N memory layers (see Ishizu Fig 10 Refs 401 and 100), wherein N is an integer greater than or equal to 2 (see Ishizu Fig 10 Refs 401 and 100; Figure 10 depicts three memory layers.); a plurality of first wirings (see Ishizu Fig 4 Ref WBL1 and Fig 8 Refs 331 and 334b) extending in particular directions (see Ishizu Fig 5 Refs 201, 202, RBL, WBL1, WBL2, SL, CL1, and CL2, and Para [0131]); a plurality of second wirings extending in the particular directions (see Ishizu Fig 4 Ref SL and Fig 8 Refs 327c and 334a); a plurality of third wirings extending in the particular directions (see Ishizu Fig 4 Ref RBL and Fig 8 Refs 327d and 334d); a plurality of fourth wirings (see Ishizu Fig 4B Ref WL and Fig 7 Ref 328) extending in a second direction (see Ishizu Fig 8 Ref WL) intersecting with the first direction; and a plurality of fifth wirings (see Ishizu Fig 7 Ref 321b and Fig 8 Ref 321b) extending in the second direction, wherein each of the N memory layers comprises a plurality of memory cells arranged in a matrix (see Ishizu Fig 10), wherein each of the plurality of memory cells comprises a first transistor (see Ishizu Fig 4B Ref OS1-1 and Fig 7 OS1-2), a second transistor (see Ishizu Fig 4B Ref OS1-2 and Fig 7 OS1-1; The transistors are mislabeled between the relied upon figures.), and a capacitor (see Ishizu Fig 4B Ref C1 and Fig 7 Ref C1), wherein a gate of the first transistor is electrically connected to one of the plurality of fourth wirings (see Ishizu Fig 4B Ref OS1-1 and Fig 7 OS1-2), wherein one of a source and a drain of the first transistor is electrically connected to one of the plurality of first wirings (see Ishizu Fig 4B Ref OS1-1 and Fig 7 OS1-2) through a first conductor (see Ishizu Fig 8 Ref CNT3), wherein one electrode of the capacitor is electrically connected to one of the plurality of fifth wirings (see Ishizu Fig 4B Ref C1 and Fig 7 Ref C1), wherein the other electrode of the capacitor is electrically connected to the other of the source and the drain of the first transistor and a gate of the second transistor (see Ishizu Fig 4B Ref C1 and Fig 7 Ref C1), wherein one of a source and a drain of the second transistor is electrically connected to one of the plurality of second wirings (see Ishizu Fig 4B Ref OS1-2 and Fig 7 OS1-1), wherein the other of the source and the drain of the second transistor is electrically connected to one of the plurality of third wirings (see Ishizu Fig 4B Ref OS1-2 and Fig 7 OS1-1), and wherein the first conductor comprises a first region (see Ishizu Fig 8 Ref CNT3; In contact does not imply in direct contact.) where the first conductor is in contact with the one of the plurality of first wirings. Ishizu does not appear to explicitly disclose a first direction that is a stacking direction of the N memory layers. However, it would have been obvious to one skilled in the art at the time of the effective filing of the invention that periphery circuity disclosed in figure 5, reference characters 201 and 202, figure 10, reference character 1712, and paragraph [0120] requires wiring in the directions claimed in the invention, thus it is obvious that such wirings would be present in the particular directions annotated on figures 9 and 10 below. PNG media_image1.png 636 602 media_image1.png Greyscale PNG media_image2.png 555 694 media_image2.png Greyscale Ishizu does not appear to explicitly disclose the first conductor comprises a first region where a top surface, a side surface, and a bottom surface. However, it would have been obvious to one skilled in the art at the time of the effective filing of the invention that the contact plugs, as disclosed in figure 14 is connected to reference characters BL1-4. Only so many interconnect lines can be fabricated on a given metal layer, and it is obvious that contact plugs with a top surface, a side surface, and a bottom can be implemented in particular regions forming a wiring. As to claim 2, Ishizu discloses the storage device according to claim 1, wherein the one of the source and the drain of the second transistor is electrically connected to the one of the plurality of second wirings through a second conductor (see Ishizu Fig 7 Ref CNT1), and wherein the second conductor comprises a second region where at least one of a top surface, a side surface, and a bottom surface of the second conductor is in contact with the one of the plurality of second wirings (see Ishizu Fig 14 the contact plugs connected to BL1-4). As to claim 3, Ishizu discloses the storage device according to claim 1, wherein the other of the source and the drain of the second transistor is electrically connected to the one of the plurality of third wirings through a third conductor (see Ishizu Fig 7 Ref CNT5), and wherein the third conductor comprises a third region where at least one of a top surface, a side surface, and a bottom surface of the third conductor is in contact with the one of the plurality of third wirings (see Ishizu Fig 14 the contact plugs connected to BL1-4). As to claim 4, Ishizu discloses the storage device according to claim 1, wherein the first transistor comprises a back gate (see Ishizu Fig 4B Ref BG). As to claim 5, Ishizu discloses the storage device according to claim 1, wherein the first transistor comprises an oxide semiconductor (see Ishizu Paras [0076] and [0207]). Response to Arguments Applicant's arguments filed 06/17/2026 have been fully considered but they are not persuasive. Examiner has further clarified the obviousness of how wirings connecting the terminals of transistors in a stacked memory array are connected to periphery circuity located at the bottom of said stack. Such arrangements are common and well known in the art. Examiner clarified in the first action the obviousness of contact plugs, as disclosed in figure 14, being implemented in the disclosed contact region, and arguments contrary thereto are not convincing. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JEROME LARRY LEBOEUF whose telephone number is (571)272-7612. The examiner can normally be reached M-Th: 8:00AM - 6:00PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, RICHARD ELMS can be reached at (517)272-1869. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JEROME LEBOEUF/Primary Examiner, Art Unit 2824 - 07/24/2026
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Prosecution Timeline

Jul 23, 2024
Application Filed
Mar 18, 2026
Non-Final Rejection mailed — §103
Jun 17, 2026
Response Filed
Jul 28, 2026
Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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ASYMMETRIC PASS THROUGH VOLTAGE FOR REDUCTION OF CELL-TO-CELL INTERFERENCE
2y 11m to grant Granted Aug 11, 2026
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MEMORY DEVICE RELATED TO PERFORMING A READ OPERATION AND METHOD OF OPERATING THE MEMORY DEVICE
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Patent 12700434
SEMICONDUCTOR MEMORY DEVICE
1y 10m to grant Granted Aug 04, 2026
Patent 12682950
SEMICONDUCTOR STORAGE DEVICE
2y 2m to grant Granted Jul 14, 2026
Patent 12676182
BIT LINE PRE-CHARGE VOLTAGE GENERATING CIRCUIT IN SEMICONDUCTOR MEMORY DEVICES FOR REDUCING CURRENT CONSUMPTION
1y 11m to grant Granted Jul 07, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
85%
Grant Probability
92%
With Interview (+7.2%)
2y 0m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 515 resolved cases by this examiner. Grant probability derived from career allowance rate.

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