Prosecution Insights
Last updated: July 17, 2026
Application No. 18/842,620

HARD MASK, SUBSTRATE PROCESSING METHOD, AND REMOVAL METHOD FOR HARD MASK

Non-Final OA
Filed
Aug 29, 2024
Priority
Mar 01, 2022 — JP 2022-031091 +1 more
Examiner
AHMED, SHAMIM
Art Unit
Tech Center
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
10m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allowance Rate
953 granted / 1214 resolved
+18.5% vs TC avg
Strong +22% interview lift
Without
With
+22.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
46 currently pending
Career history
1249
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
75.4%
+35.4% vs TC avg
§102
4.1%
-35.9% vs TC avg
§112
1.7%
-38.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1214 resolved cases

Prosecution Timeline

Aug 29, 2024
Application Filed
May 13, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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2y 6m to grant Granted Jul 14, 2026
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Patent 12673892
HIGH TRANSPARENCY, HIGH HAZE NANOSTRUCTURED STRUCTURES
2y 11m to grant Granted Jul 07, 2026
Patent 12677616
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
2y 9m to grant Granted Jul 07, 2026
Patent 12674076
A CHARACTERISTIC STUDY OF ACRYLIC POLYMER DISPERSANT COATED ON SURFACE OF POLISHING PARTICLE
2y 7m to grant Granted Jul 07, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
99%
With Interview (+22.1%)
2y 9m (~10m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1214 resolved cases by this examiner. Grant probability derived from career allowance rate.

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