Prosecution Insights
Last updated: October 02, 2026
Application No. 18/857,016

FILM-FORMING METHOD AND SUBSTRATE-PROCESSING DEVICE

Final Rejection §103§112
Filed
Oct 15, 2024
Priority
Apr 22, 2022 — JP 2022-071107 +1 more
Examiner
TADAYYON ESLAMI, TABASSOM
Art Unit
1718
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tokyo Electron Limited
OA Round
2 (Final)
50%
Grant Probability
Moderate
3-4
OA Rounds
1y 6m
Est. Remaining
76%
With Interview

Examiner Intelligence

Grants 50% of resolved cases
50%
Career Allowance Rate
397 granted / 802 resolved
-15.5% vs TC avg
Strong +26% interview lift
Without
With
+26.5%
Interview Lift
resolved cases with interview
Typical timeline
3y 5m
Avg Prosecution
40 currently pending
Career history
858
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
63.3%
+23.3% vs TC avg
§102
13.3%
-26.7% vs TC avg
§112
21.4%
-18.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 802 resolved cases

Office Action

§103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim 11 withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected group II, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 01/26/26. Applicant's election without traverse of group I in the reply filed on 01/26/26 is acknowledged. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 5 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. It is not clear how the functional group selectively adsorbs on metal film or to the precursor gas when both of the first and the second functional group are thiol. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1, 3-10 are rejected under 35 U.S.C. 103 as being unpatentable over Shuji Shinonome et al (Japanese Patent: 2021125607, here after 607), further in view of Yoshinori Nakano et al (Japanese Patent: 2005053116, here after 116). Claim 1 is rejected. 607 teaches a film forming method, comprising: preparing a substrate (15) having a metal film (11) formed on a surface of a first area and a first insulating film (12) formed on a surface of a second area [fig. 2B, page 4 lines 3-6, page 3 last three paragraphs]; forming a self-assembled monolayer (13) of an organic compound in the first area [fig. 2C, page 4 lines 24-26] by supplying, to a surface of the substrate, a gas containing the organic compound having a chain portion [CH3(CH2) X CH2SH, X = 1 ~ 18, page 4 lines 27-29], a first functional group provided at one end of the chain portion, and a second functional group provided at a remaining end of the chain portion [page 4 last 2 paragraphs]; forming a second insulating film in the second area by supplying a precursor gas and a reaction gas to the surface of the substrate [page 5, paragraphs 2-3, paragraph 5- 6]; and removing the self-assembled monolayer formed in the first area [page 5 paragraph 4]. 607 teaches the first functional group(thiol) is a functional group which selectively adsorbs to the metal film, but 607 does not teach the second functional selectively adsorbs to the precursor gas. 116 teaches a method of depositing self- assembled monolayer on metal surface, where it comprising COOH(CH2) n SH, wherein n is 3-30(organic compound having a chain portion) [abstract]. Therefore, it would have been obvious to one of ordinary skill in the art at the time of the invention was made to have a method of 607, where self-assembly layer comprising COOH(CH2) n SH, because it can be substitute as self -assembly monolayer on metal surface for 607 with expectation of success. Claim 3 is rejected. 607 teaches the first functional group includes thiol [page 4 lines 27-29]. Claim 4 is rejected for the same reason claim 1 is rejected above. 116 teaches the second functional group includes carboxylic acid. Claim 5 is rejected as 116 teaches second functional group comprising thiol as well [fig. 1]. Claim 6 is rejected. 607 teaches the precursor gas includes trimethyl aluminum, trialkyl aluminum [page 5 paragraph 6]. Claim 7 is rejected. 116 teaches the chain portion is an alkyl chain, and a number of carbon atoms in the alkyl chain is 3-30 [page 4 lines 27-29]. Claim 8 is rejected for the same reason claim 7 is rejected above. Although 116 does not teach the number of carbon atoms in the alkyl chain is 10 or less, however teaches the number of carbon atoms in the alkyl chain is 3-30. Overlapping ranges are prima facie evidence of obviousness. It would have been obvious to one having ordinary skill in the art to have selected the portion of [overlapping range] that corresponds to the claimed range. In re Malagari, 182 USPQ 549 (CCPA 1974). Therefore, it would have been obvious to one of ordinary skill in the art at the time of the invention was made to have a method of 607 where the carbon atoms in the alkyl chain is 10 or less, because an ordinary skill in the art can select the portion of overlapping range that corresponds to the claimed range in absence of criticality. Claim 9 is rejected for the same reason claim 1 is rejected above. 607 teaches forming the second insulating film in the second area includes repeating (ALD) a cycle including supplying the precursor gas (TMA) to the surface of the substrate such that the precursor gas is adsorbed to a surface of the first insulating film in the second area and supplying the reaction gas to the surface of the substrate such that the reaction gas reacts with the precursor gas [page 5 paragraph 6, page 6 paragraph 7]. 607 and 116 both teach thiol functional group adsorb on surface of metal, and carboxylic acid functional group of 116 as the second function group adsorb on a surface of the self- assembled monolayer in the first area, where adsorb the precursor gas (TMA). Claim 10 is rejected. 607 teaches the processing is performed on a plurality of substrates in parallel to complete the selective film formation processing of a predetermined number of substrates [page 10 lines 13-14], therefor the forming the self- assembled monolayer in the first area, the forming the second insulating film in the second area, and the removing the self-assembled monolayer formed in the first area are repeated. Response to Arguments Applicant's arguments filed 06/18/26 have been fully considered but they are not persuasive. The applicant argues combination of 607 and 116 is not proper. The examiner disagrees; 607 and 611 both teach forming SAM on metal when metal is copper. Furthermore, the entire three layers of 611 can be substitute for 607 with three layers [fig. 1 when the substrate is copper rather than gold). In response to applicant's argument that 116 is nonanalogous art, it has been held that a prior art reference must either be in the field of the inventor’s endeavor or, if not, then be reasonably pertinent to the particular problem with which the inventor was concerned, in order to be relied upon as a basis for rejection of the claimed invention. See In re Oetiker, 977 F.2d 1443, 24 USPQ2d 1443 (Fed. Cir. 1992). In this case, both od 607 and 116 are related to formation of self-assembly layer on a metal(copper) surface. The applicant argument regarding reaction of IPA and carboxyl group at upper surface of the SAM is not persuasive as esterification of carboxyl group and alcohol require strong acid catalyst which is not exist here. The applicant argument regarding non-bonding terminals of 607 vs hydrophilic terminals of 611 is not persuasive as substituting 611 terminal in 607, does not result 607 not to function. Furthermore although 607 is related to gas phase and 611 is related to liquid, however an ordinary skill in art can perform 611 in vapor phase as well. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to TABASSOM TADAYYON ESLAMI whose telephone number is (571)270-1885. The examiner can normally be reached M-F 9:30-6. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at 5712725166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /TABASSOM TADAYYON ESLAMI/Primary Examiner, Art Unit 1718
Read full office action

Prosecution Timeline

Oct 15, 2024
Application Filed
Mar 18, 2026
Non-Final Rejection mailed — §103, §112
Jun 17, 2026
Response Filed
Jun 18, 2026
Response Filed
Aug 18, 2026
Final Rejection mailed — §103, §112 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
50%
Grant Probability
76%
With Interview (+26.5%)
3y 5m (~1y 6m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 802 resolved cases by this examiner. Grant probability derived from career allowance rate.

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