Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1712 1715 1718 1784 1792 2818
This examiner grants 50% of resolved cases
Tabassom Tadayyon Eslami has a substantial record of 802 resolved cases in Art Unit 1712. The allowance rate is 49.5 percent, which is lower than many other examiners in Tech Center 2800. This suggests a more rigorous examination process where roughly half of the cases result in an allowance. The median days to allowance is 1274, indicating a longer prosecution timeline.
The interview lift of 26.5 percent shows that applicants can significantly improve their odds through direct engagement. This 26.5 percent lift is a vital metric for practitioners facing the examiner's 49.5 percent baseline allowance rate. With 802 cases resolved, the data provides a clear picture of the challenges and opportunities present. The 1274-day median should be factored into any long-term patent strategy. Direct communication is a recommended approach.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19238885 | METHOD OF MANUFACTURING GAS BARRIER FILM | Non-Final OA | FUJIFILM Corporation |
| 18818999 | Electrode Coating Apparatus and Electrode Coating Method | Non-Final OA | LG Energy Solution, Ltd. |
| 18596144 | REACTANT VAPORIZER AND RELATED SYSTEMS AND METHODS | Final Rejection | ASM IP Holding B.V. |
| 18234549 | METHOD OF FORMING MATERIAL WITHIN A RECESS | Final Rejection | ASM IP Holding B.V. |
| 18214656 | METHOD OF FORMING P-TYPE DOPED SILICON-GERMANIUM LAYERS AND SYSTEM FOR FORMING SAME | Non-Final OA | ASM IP Holding B.V. |
| 17842007 | REACTOR SYSTEM AND METHOD FOR FORMING A LAYER COMPRISING INDIUM GALLIUM ZINC OXIDE | Final Rejection | ASM IP Holding B.V. |
| 19207361 | ELECTRODE SHEET PROCESSING METHOD AND ELECTRODE SHEET MANUFACTURING DEVICE | Non-Final OA | JTEKT CORPORATION |
| 19035837 | MANUFACTURING METHOD OF MOLDED BODY FOR SHEET-LIKE ELECTRODE | Final Rejection | KYOCERA CORPORATION |
| 19170154 | CATALYST AND METHOD FOR CONVERTING CO2 TO SOLID CARBON, AND COMPOSITES INCLUDING SOLID CARBON | Final Rejection | Washington University |
| 18561503 | METHOD FOR MANUFACTURING CONDUCTIVE PIGMENT PASTE | Non-Final OA | KANSAI PAINT CO., LTD. |
| 18021554 | SUBSTRATE PROCESSING METHOD | Non-Final OA | JUSUNG ENGINEERING CO., LTD. |
| 18856864 | LATERAL GAP FILL | Final Rejection | Lam Research Corporation |
| 18854240 | NONCONFORMAL OXIDE FILM DEPOSITION USING CARBON-CONTAINING INHIBITOR | Final Rejection | Lam Research Corporation |
| 18840453 | THERMAL FILM DEPOSITION | Non-Final OA | Lam Research Corporation |
| 18412071 | DEPOSITION TOOL WITH DIELECTRIC COATED CHAMBER SIDEWALLS TO IMPROVE ELECTROMANGNETIC FIELD UNIFORMITY | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18980063 | HYDROGEN ADDITION TO LOW-K DIELECTRIC BARRIER FILMS | Non-Final OA | Applied Materials, Inc. |
| 18589629 | ENABLING THICK MOSI GROWTH | Final Rejection | Applied Materials, Inc. |
| 18684088 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 18857016 | FILM-FORMING METHOD AND SUBSTRATE-PROCESSING DEVICE | Final Rejection | Tokyo Electron Limited |
| 18146535 | FILM FORMING METHOD AND FILM FORMING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17708999 | LOW TEMPERATURE DEPOSITION PROCESS | Final Rejection | ENTEGRIS, INC. |
| 18991879 | LIQUID METAL ALLOY FEED MATERIALS FOR ION IMPLANTATION | Non-Final OA | Axcelis Technologies, Inc. |
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