Prosecution Insights
Last updated: October 02, 2026
Application No. 18/857,322

ABRASIVE GRAINS AND METHOD FOR SELECTING SAME, POLISHING LIQUID, MULTI-LIQUID TYPE POLISHING LIQUID, POLISHING METHOD, COMPONENT MANUFACTURING METHOD, AND SEMICONDUCTOR COMPONENT MANUFACTURING METHOD

Non-Final OA §103
Filed
Oct 16, 2024
Priority
Oct 27, 2022 — JP 2022-172587 +1 more
Examiner
AHMED, SHAMIM
Art Unit
Tech Center
Assignee
RESONAC Corporation
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
9m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allowance Rate
955 granted / 1218 resolved
+18.4% vs TC avg
Strong +22% interview lift
Without
With
+22.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
52 currently pending
Career history
1258
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
55.4%
+15.4% vs TC avg
§102
13.7%
-26.3% vs TC avg
§112
18.8%
-21.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1218 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant's election with traverse of Group II, claims 3-11, in the reply filed on 7/22/2026 is acknowledged. The traversal is on the ground(s) that one of the ordinary skill in the art would not select abrasive grains based on an average value of the positron lifetime as suggested by WO-923. This is not found persuasive because WO-923 teaches or suggests abrasive’s positron lifetime value matters as the abrasive as the abrasive grains are selected on the basis of the average value, discusses in the previous communication; and no single general inventive concept exists, therefore, restriction is appropriate. The requirement is still deemed proper and is therefore made FINAL. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 3-7 and 9-11 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kubota et al (WO-2022070923 A1), additionally, in view of Kanamaru et al (US 2021/0189176). Regarding claims 3-4, Kubota et al disclose a CMP slurry comprising selecting cerium oxide abrasive grains wherein the abrasive grains having a positron lifetime of 0.3650 ns or less or (365 ps or less) and “the positron lifetime required for the positron emitted from 22 Na to annihilate with the electron, and is used as a probe for ultrafine voids such as lattice defects and free volumes on the order of sub-nanometer to nanometer [0017], [0018]. That is, the shorter the positron lifetime, the higher the density of the particles” or claimed abrasive grains are selected on the basis of average value of a positron lifetime measured by a positron annihilation method [0018],[0019]. Unlike the claimed invention, Kubota doesn’t describe the positron lifetime value is 360 ps or less. Kubota et al disclose that the abrasive grains are prepared by wet processing (liquid phase), which appears to be similar process as the instant invention and expected to have the same crystallinity of the obtained abrasive grains. However, Kubota’s teaching of 365 ps or less would include those under 360 ps and also describes that “the shorter the positron lifetime, the higher the density of the particles ([0018]). Overlapping ranges are held obvious. See MPEP 2144.05. In the case where the claimed ranges "overlap or lie inside ranges disclosed by the prior art" a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). Therefore, one of ordinary skill in the art would find it obvious before the effective filing date of the invention to use ranges including claimed range, depending on a desired density of the particles, to provide a CMP composition with expected results. Additionally, in the same field of endeavor, Kanamaru et al disclosed that ceria (cerium oxide) can be obtained by oxidizing cerium salts such as cerium carbonate, cerium oxycarbonate, cerium nitrate, cerium sulfate, cerium oxalate, and cerium hydroxide. Examples of the oxidation method include a firing method in which a cerium salt is fired at about 600 to 900° C. [0039]. Examiner pointed out that obtaining or producing the cerium oxide abrasive grains of Kanamaru et al is similar in natrure, such as firing temperature of the cerium source between 600-900 degree C as the instant invention (see [0018],[0019] in the instant specification) and expected to have the same property, namely, the average value of a positron lifetime as measured is 360 ps or less. Paragraph 19 of the application’s specification describes “as the firing temperature of the cerium source when a raw material (raw material for obtaining abrasive grains) containing cerium is obtained is higher, there is a tendency that the positron Lifetime is smaller (shorter)” therefore, it is expected that the cerium oxide abrasive grains from Kanamaru et al’s method would have a the average value of a positron lifetime as measured is 360 ps or less as measured by a positron annihilation method. Regarding claims 5-6, Kubota et al disclose that average particle size of the abrasive grains are 30 nm or more or 50 nm or more [0022]-[0023]; and aforesaid teaching overlaps the claimed rages; and overlapping ranges are prima facie obvious, MPEP 2144.05. Regarding claim 7, Kubota et al disclose that the abrasive grains comprising cerium oxide (abstract), [0013]). Regarding claims 9-11, Kubota et al disclose above for the claim 3 but fail to disclose the abrasive grains of cerium oxide derived form cerium hydroxide (claim 9), cerium carbonate (claim 10) and cerium oxycarbonate (claim 11). However, in the same field of endeavor, Kanamaru et al disclosed that ceria (cerium oxide) can be obtained by oxidizing cerium salts such as cerium carbonate, cerium oxycarbonate, cerium nitrate, cerium sulfate, cerium oxalate, and cerium hydroxide [0039]. Therefore, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to employ Kanamaru et al's teaching of using cerium hydroxide or cerium carbonate or cerium oxycarbonate into the teaching of Kubota et al because they are suitable equivalents or a simple substitution of known materials for predictable result. Claim(s) 8 is/are rejected under 35 U.S.C. 103 as being unpatentable over Kubota et al (WO-2022070923 A1), additionally, in view of Kanamaru et al (US 2021/0189176) as applied to claim 3 above, and further in view of PubChem (1,2,3-Propanetricarboxylic acid, 2-hydroxy-,cerium(3+) salt (1:1); provided with the IDS dated 8/31/2026). With respect to claim 8, modified Kubota et al fail to describe the cerium oxide derived from a cerium complex of trimesic acid. However, cerium complex of trimesic acid such as 1,2,3-Propanetricarboxylic acid, 2-hydroxy-,cerium(3+) salt (1:1) is a known compound as shown here by PubChem. Therefore, in the absent of an expected result or criticality of such, it would have been obvious to one skilled in the art before the effective filing date of the invention to use any known cerium source including any cerium complex of trimesic acid in order to make cerium oxide. Conclusion The prior art made of record, listed in the PTO-892 and not relied upon is considered pertinent to applicant's disclosure. Any inquiry concerning this communication or earlier communications from the examiner should be directed to SHAMIM AHMED whose telephone number is (571)272-1457. The examiner can normally be reached M-TH (8-5:30pm). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Allen can be reached at 571-270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. SHAMIM AHMED Primary Examiner Art Unit 1713 /SHAMIM AHMED/ Primary Examiner, Art Unit 1713
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Prosecution Timeline

Oct 16, 2024
Application Filed
Sep 11, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12745611
SUBSTRATE PROCESSING METHOD AND APPARATUS
3y 11m to grant Granted Sep 22, 2026
Patent 12745608
ENDPOINT DETECTION IN LOW OPEN AREA AND/OR HIGH ASPECT RATIO ETCH APPLICATIONS
2y 2m to grant Granted Sep 22, 2026
Patent 12745583
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
2y 1m to grant Granted Sep 22, 2026
Patent 12735605
POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING,METHOD FOR PREPARING POLISHING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT TO WHICH POLISHING COMPOSITION IS APPLIED
3y 3m to grant Granted Sep 15, 2026
Patent 12729340
SILICON NITRIDE ETCHING LIQUID COMPOSITION
5y 0m to grant Granted Sep 08, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
99%
With Interview (+22.2%)
2y 9m (~9m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1218 resolved cases by this examiner. Grant probability derived from career allowance rate.

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