Last updated: July 17, 2026

Application No. 18/861,859

METHOD AND SYSTEM OF OVERLAY MEASUREMENT USING CHARGED-PARTICLE INSPECTION APPARATUS

Non-Final OA

Filed

Oct 30, 2024

Priority

Jul 15, 2022 — EU 22185195.9 +1 more

Examiner

NGUYEN, HUNG

Art Unit

2882

Tech Center

2800 — Semiconductors & Electrical Systems

Assignee

ASML Holding N.V.

OA Round

1 (Non-Final)

Interview Optional

— +8.9% interview lift. Interview lift (+8.9%) is below the 15.0% threshold. A written response is recommended.

Based on 1466 resolved cases, 2023–2026

Examiner Intelligence

NGUYEN, HUNG View full profile →

Grants 91% — above average

Career Allowance Rate

1330 granted / 1466 resolved

+22.7% vs TC avg

Moderate +9% lift

Without

With

+8.9%

Interview Lift

resolved cases with interview

Fast prosecutor

2y 2m

Avg Prosecution

30 currently pending

Career history

1498

Total Applications

across all art units

Statute-Specific Performance

§101

1.6%

-38.4% vs TC avg

§103

55.7%

+15.7% vs TC avg

§102

16.9%

-23.1% vs TC avg

§112

8.9%

-31.1% vs TC avg

Black line = Tech Center average estimate • Based on career data from 1466 resolved cases

Prosecution Timeline

Oct 30, 2024

Application Filed

Apr 10, 2026

Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

18/727,572

Patent 12681381

PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, PELLICLE PRODUCTION METHOD AND TEST METHOD FOR MASK ADHESIVE LAYER

2y 0m to grant Granted Jul 14, 2026

18/507,439

Patent 12677633

DEVICE FOR HOLDING A SUBSTRATE, METHOD OF HOLDING A SUBSTRATE, AND APPARATUS FOR PROCESSING A SUBSTRATE

2y 7m to grant Granted Jul 07, 2026

18/735,830

Patent 12676455

ELECTRONIC DEVICE MANUFACTURING METHOD, LASER DEVICE, AND WAVELENGTH SEQUENCE CALCULATION SYSTEM

2y 1m to grant Granted Jul 07, 2026

18/487,881

Patent 12663711

METHOD AND SYSTEM TO FOR RAPID INSPECTION OF PHOTOLITHOGRAPHY RETICLE

2y 8m to grant Granted Jun 23, 2026

18/637,683

Patent 12663731

EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD

2y 2m to grant Granted Jun 23, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

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Prosecution Projections

1-2

Expected OA Rounds

91%

Grant Probability

99%

With Interview (+8.9%)

2y 2m (~5m remaining)

Median Time to Grant

Low

PTA Risk

Based on 1466 resolved cases by this examiner. Grant probability derived from career allowance rate.