Prosecution Insights
Last updated: October 02, 2026
Application No. 18/866,369

METHOD FOR PRODUCING AQUEOUS SOLUTION OF PURIFIED AMINOSILANOL COMPOUND AND AMINOSILOXANE COMPOUND, AND COMPOSITION FOR ETCHING

Non-Final OA §103
Filed
Nov 15, 2024
Priority
May 19, 2022 — JP 2022-082415 +2 more
Examiner
DEO, DUY VU NGUYEN
Art Unit
Tech Center
Assignee
Shin-Etsu Chemical Co., Ltd.
OA Round
1 (Non-Final)
82%
Grant Probability
Favorable
1-2
OA Rounds
6m
Est. Remaining
90%
With Interview

Examiner Intelligence

Grants 82% — above average
82%
Career Allowance Rate
864 granted / 1049 resolved
+22.4% vs TC avg
Moderate +7% lift
Without
With
+7.3%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
35 currently pending
Career history
1063
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
44.9%
+4.9% vs TC avg
§102
26.7%
-13.3% vs TC avg
§112
13.7%
-26.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1049 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 3-5 is/are rejected under 35 U.S.C. 103 as being unpatentable over White et al. (US 2021/0054287A1) in view of Clews et al. (US 6,892,578). With respect to claims 3-5, White teaches an etching composition comprising water, phosphoric acid and at least one compound including aminosiloxane of 1,3 bis(n-aminoalkylaminoalkyl) tetraalkylsiloxanes,1,3 bis(n-aminoalkyl) tetraalkylsiloxanes or claimed aminosiloxane that is a condensate of general formula (1) (para 47, 48, 50, 68, 69). The aminosiloxanes would react with the phosphoric acid, which acts as a catalyst, to form aminosilanol of general formula (2) in the composition (see the Royal Society of Chemistry for the synthesis of aminosilanol with siloxane being catalyzed with some acid in water). Unlike claimed invention, White doesn’t teach the etching composition has sodium, potassium, and calcium contents of less than 250 ppb and iron content of less than 100 ppb. However, it is known to one skilled in the art to provide high-purity or “semiconductor grade” etching composition, which is higher level of purity than in a “technical grade” chemical for a high-purity semiconductor manufacturing operations as shown here by Clews (col. 2, lines 1-3, 21-31). Therefore, it would have been obvious for one skilled in the art before the effective filing date of the invention to provide a high-purity or “semiconductor grade” etching composition, which is free of other impurities such as claimed composition having sodium, potassium, and calcium contents of less than 250 ppb and iron content of less than 100 ppb, in light of Clews because he teaches a high-purity composition is desired to improve the manufacturing yield and reliability (col. 2, lines 28-31). Furthermore, a product which differs from prior art only in purity is obvious except when the pure product possesses unexpected properties not possessed by the impure one. Ex parte Gray 10 USPQ 2d 1922, 1926 (BPAI 1989); Ex parte Steelmand 140 USPQ 189, 190; In re King 43 USPQ 400 (CCPA 1939); In re Merz 38 USPQ 143 (CCPA 1938); In re Ridgeway 25 USPQ 202 (CCPA 1935); Ex parte Windhaus 15 USPQ 45 (PO BdPatApp 1931). However secondary considerations such as unexpected results or long felt need may rebut a prima facie case based on purity. Ex parte Stern 13 USPQ 2d 1379, 1381 (BPAI 1989); In re Kratz 201 USPQ 71 (CCPA 1979); In re Bergstrom 166 USPQ 256 (CCPA 1970); In re Irani 166 USPQ 24 (CCPA 1970); In re Cofer 148 USPQ 268 (CCPA 1966); In re Doyle 140 USPQ 421 (CCPA 1964); In re Williams 80 USPQ 150 (CCPA 1948). The Royal Society of Chemistry, the Initial Stages of Aminosilanol polymerisation, is cited for the synthesis of aminosilanol with siloxane being catalyzed with some acid in water. Allowable Subject Matter Claims 1 and 2 are allowed are allowed because the applied prior art White doesn’t teach a method for producing an aqueous solution of a purified aminosilanol compound and aminosiloxane compound having step of contacting, with an acidic cation exchange resin, an aqueous solution containing claimed aminosilanol compound having claimed general formula (1) and an aminosiloxane compound that is a condensate thereof to remove a metal component from the aqueous solution, wherein a concentration of the aminosilanol compound and the aminosiloxane compound in the aqueous solution to be contacted with the acidic cation exchange resin is 10 to 70 wt%. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DUY VU NGUYEN DEO whose telephone number is (571)272-1462. The examiner can normally be reached 9-5 M-F. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Allen can be reached at 571-272-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DUY VU N DEO/Primary Examiner, Art Unit 1713 8/14/2026
Read full office action

Prosecution Timeline

Nov 15, 2024
Application Filed
Aug 18, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12745582
METHOD OF CLEANING SILICON WAFER, METHOD OF MANUFACTURING SILICON WAFER, AND SILICON WAFER
3y 1m to grant Granted Sep 22, 2026
Patent 12745610
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2y 8m to grant Granted Sep 22, 2026
Patent 12727412
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3y 6m to grant Granted Sep 01, 2026
Patent 12727414
METHOD FOR PROCESSING A SUBSTRATE
2y 5m to grant Granted Sep 01, 2026
Patent 12713528
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2y 9m to grant Granted Aug 18, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
82%
Grant Probability
90%
With Interview (+7.3%)
2y 4m (~6m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1049 resolved cases by this examiner. Grant probability derived from career allowance rate.

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