Prosecution Insights
Last updated: August 18, 2026
Application No. 18/907,436

SENSOR SUBSTRATE, APPARATUS, AND METHOD

Non-Final OA §102
Filed
Oct 04, 2024
Priority
Apr 08, 2022 — EU 22167493.0 +1 more
Examiner
IPPOLITO, NICOLE MARIE
Art Unit
Tech Center
Assignee
ASML Holding N.V.
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
1500 granted / 1732 resolved
+26.6% vs TC avg
Moderate +10% lift
Without
With
+9.6%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
25 currently pending
Career history
1734
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
33.8%
-6.2% vs TC avg
§102
30.2%
-9.8% vs TC avg
§112
15.8%
-24.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1732 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by De Boer et al. (U.S. Patent Application Publication Number 20110193574, from hereinafter “Boer”). In regards to claim 1, Boer teaches a sensor substrate for a charged particle optical device (abstract) comprising at least one distance sensor configured to generate a measurement signal representative of a distance between the distance sensor and a facing surface of a target (see, i.e., paragraph 0020) and at least one charged particle optical component (paragraph 0020 teaches a projection lens system, also see FIG. 4 and paragraphs 0073-0074). In regards to claim 2, Boer teaches a plurality of distance sensors (see FIG. 4 and paragraphs 0073-0077). In regards to claim 3, Boer teaches that the distance sensors are positioned surrounding the at least one charged particle optical component (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, paragraphs 0126-0128). In regards to claim 4, Boer teaches that the plurality of distance sensors are positioned equidistantly from an origin and/or adjacent distance sensors being separated by similar distances (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, paragraphs 0126-0128). In regards to claim 5, Boer teaches that the distance sensor is proximate to the at least one charged particle optical component (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, paragraphs 0126-0128). In regards to claim 6, Boer teaches that a sensing surface of the distance sensor and a main surface of the charged particle optical component are configured, when in operation to face a target (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 7, Boer teaches that a sensing surface of the distance sensor and a main surface of the charged particle optical component are parallel to each other (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 8, Boer teaches that the sensing surface of the distance sensor and the main surface of the particle optical component are in the same plane (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 9, Boer teaches that the distance sensor comprises at least part of an isolating element (see, i.e., the abstract, that teaches insulating components). In regards to claim 10, Boer teaches that the distance sensor comprises a sensing electrode (abstract). In regards to claim 11, Boer teaches that the sensing electrode is configured to be supported by the isolating element (see paragraph 0007, an insulating layer separates the electrode from the housing). In regards to claim 12, Boer teaches that at least part of the circuitry of the sensor substrate is positioned in the isolating element (see paragraphs 0012-0015 at least). In regards to claim 13, Boer teaches that the circuitry in a portion of the isolating element associated with the at least one distance sensor is the circuitry of the at least one distance sensor (paragraphs 0012-0015 at least). In regards to claim 14, Boer teaches that each portion corresponds in shape to a shape of the distance sensor (see FIGS. 1A-1B, 6A-9C that all illustrate shapes). In regards to claim 15, Boer teaches that the distance sensor is a capacitive sensor (see the abstract and title). In regards to claim 16, Boer teaches that the charged particle optical component comprises a signal detector configured, when in operation, to detect charged particle emitted from the target (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 17, Boer teaches that the charged particle optical component teaches at least part of at isolating element (paragraphs 0100-0102, 0108-0110, 0112, 0115-0116, 0119, 0123-0124, 0133 and 0144-0147). In regards to claim 18, Boer teaches that the charged particle optical element comprises one or more detector electrodes (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 19, Boer teaches that the detector is configured to face, when in operation, the target (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). In regards to claim 20, Boer teaches that at least one aperture is defined through the sensor substrate for passage of the at least one beam towards the target (FIGS. 16A-16B, deflector/lens stack 132, sensors 30, wafer 9, table 134 paragraphs 0126-0128). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to NICOLE M IPPOLITO whose telephone number is (571)270-7449. The examiner can normally be reached Monday-Thursday 6:00am-4:00pm Mountain Time. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Robert H Kim can be reached at 571-272-2293. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /NICOLE M IPPOLITO/ Primary Examiner, Art Unit 2881
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Prosecution Timeline

Oct 04, 2024
Application Filed
Jul 15, 2026
Non-Final Rejection mailed — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
96%
With Interview (+9.6%)
2y 0m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1732 resolved cases by this examiner. Grant probability derived from career allowance rate.

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