Prosecution Insights
Last updated: July 17, 2026
Application No. 18/974,593

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

Non-Final OA
Filed
Dec 09, 2024
Priority
Oct 18, 2017 — continuation of 10/264,663 +4 more
Examiner
LE, TUNG X
Art Unit
2844
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Lam Research Corporation
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
5m
Est. Remaining
90%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
1448 granted / 1666 resolved
+18.9% vs TC avg
Minimal +3% lift
Without
With
+3.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 0m
Avg Prosecution
23 currently pending
Career history
1688
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
50.8%
+10.8% vs TC avg
§102
29.0%
-11.0% vs TC avg
§112
7.9%
-32.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1666 resolved cases

Prosecution Timeline

Dec 09, 2024
Application Filed
Apr 15, 2026
Non-Final Rejection mailed
Jul 02, 2026
Applicant Interview (Telephonic)
Jul 02, 2026
Examiner Interview Summary
Jul 07, 2026
Response Filed

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12684669
LIGHTING DEVICE
2y 8m to grant Granted Jul 14, 2026
Patent 12683503
BOOST CONVERTER
1y 11m to grant Granted Jul 14, 2026
Patent 12676400
ANTENNA DEVICE, RECTIFIER CIRCUIT, POWER SUPPLY DEVICE, AND ELECTRONIC DEVICE
3y 6m to grant Granted Jul 07, 2026
Patent 12666516
LOCATIONS DETERMINATIONS
1y 10m to grant Granted Jun 23, 2026
Patent 12665167
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
1y 8m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
90%
With Interview (+3.2%)
2y 0m (~5m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1666 resolved cases by this examiner. Grant probability derived from career allowance rate.

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