Prosecution Insights
Last updated: October 01, 2026

Examiner: LE, TUNG X

Tech Center 2800 • Art Units: 2814 2821 2844 2845 2855 2881

This examiner grants 87% of resolved cases

Analysis

Tung X. Le is a highly experienced examiner in Art Unit 2814, within Tech Center 2800. He has a very high volume of 1672 resolved cases, which is one of the largest data sets available for analysis. The allowance rate for this examiner is 87.0 percent, indicating a very high probability of success for patent applicants. The interview lift is 3.2 percent, which is a small but positive increase in the likelihood of allowance. This 3.2 percent lift suggests that while interviews are helpful, they are not the primary driver of the examiner's decisions.

The median time to allowance is 736 days, which is an efficient timeline for patent issuance. This 736-day duration, paired with the 87.0 percent allowance rate, makes for a very streamlined prosecution experience. The 1672 resolved cases provide a high level of statistical confidence in these trends. Practitioners can expect a predictable and relatively fast process when their cases are assigned to Art Unit 2814. The 3.2 percent lift indicates that the examiner is generally inclined toward allowance even without an interview. The 736-day median pendency is a key advantage for those looking to secure patents quickly. Overall, the data indicates that this examiner is both productive and consistent in his approach.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

87.0%
Allow Rate
+19.0% vs TC avg
1,699
Total Applications
+3.2%
Interview Lift
736
Avg Prosecution Days
Based on 1672 resolved cases, 2023–2026

Rejection Statute Breakdown

0.2%
§101 Eligibility
37.3%
§102 Novelty
39.1%
§103 Obviousness
9.7%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18811382 PLASMA PROCESSING APPARATUS Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
18721943 LIGHT-EMITTING DEVICE FOR A MOTOR VEHICLE Non-Final OA VALEO VISION
18975869 APPARATUS AND METHOD FOR HIGH FREQUENCY PHASE SHIFTER Final Rejection ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
18974593 MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION Final Rejection Lam Research Corporation
18846216 SPATIALLY TUNABLE INDUCTIVELY COUPLED PLASMA ANTENNA Non-Final OA Lam Research Corporation
19281842 THREE LEVEL SWITCHING CONVERTER AND CONTROL Non-Final OA Texas Instruments Incorporated
19252963 BALANCING PROCESS KIT AREA TO WAFER AREA WITHIN A PROCESSING CHAMBER Non-Final OA Applied Materials, Inc.
19240089 PLASMA PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18893142 SUBSTRATE PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18616802 ENERGY EFFICIENT ULTRA-WIDEBAND LATCHING TUNABLE METASURFACES Final Rejection Dell Products L.P.
19171337 QUICK-DETACHABLE ANTENNA SIGNAL TRANSMISSION MODULE AND METHOD FOR MANUFACTURING THE SAME Non-Final OA INPAQ TECHNOLOGY CO., LTD.
18602529 PATCH ANTENNA ARRAY AND METHOD FOR MANUFACTURING A PATCH ANTENNA ARRAY Non-Final OA u-blox AG

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