Prosecution Insights
Last updated: July 12, 2026
Application No. 19/002,891

Untitled Application

Unknown
Filed
Examiner
LUND, JEFFRIE ROBERT
Art Unit
Tech Center
Applied Materials, Inc.
Assignee
Applied Materials Inc.
OA Round
1 (Non-Final)
60%
Grant Probability
Moderate
1-2
OA Rounds
3y 12m
Filing → Grant
90%
With Interview

Examiner Intelligence

Grants 60% of resolved cases
60%
Career Allowance Rate
448 granted / 743 resolved
At TC average
Strong +29% interview lift
Without
With
+29.2%
Interview Lift
resolved cases with interview
Typical timeline
3y 12m
Avg Prosecution
19 currently pending
Career history
762
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
71.1%
+31.1% vs TC avg
§102
14.0%
-26.0% vs TC avg
§112
2.6%
-37.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 743 resolved cases

Prosecution Timeline

Apr 01, 2026
Response after Non-Final Action
Apr 02, 2026
Response after Non-Final Action
May 20, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12671063
LOW PRESSURE LIFT PIN CAVITY HARDWARE
8y 10m to grant Granted Jun 30, 2026
Patent 12666901
ETCHING DEVICE AND ETCHING METHOD THEREOF
1y 9m to grant Granted Jun 23, 2026
Patent 12655522
GAS INJECTION APPARATUS FOR LAYER DEPOSITION
3y 3m to grant Granted Jun 16, 2026
Patent 12644183
Showerhead Assembly with Heated Showerhead
3y 0m to grant Granted Jun 02, 2026
Patent 12644179
APPARATUS FOR COLLECTING REACTION BY-PRODUCTS FOR SEMICONDUCTOR PROCESSES THROUGH PYROLYSIS IN THE HIGH TEMPERATURE REGION AND OXIDATION REACTION IN THE LOW TEMPERATURE REGION
2y 9m to grant Granted Jun 02, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
60%
Grant Probability
90%
With Interview (+29.2%)
3y 12m
Median Time to Grant
Low
PTA Risk
Based on 743 resolved cases by this examiner. Grant probability derived from career allowance rate.

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