Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1713 1716 1718 1792
This examiner grants 60% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18766729 | PLASMA PROCESSING APPARATUS | Non-Final OA | Panasonic Intellectual Property Management Co., Ltd. |
| 18362892 | ATOMIC LAYER DEPOSITION (ALD) WITH IMPROVED PARTICLE PREVENTION MECHANISM | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18671402 | THERMALLY AND ELECTRICALLY CONDUCTIVE ADHESIVE FOR GROUNDING AND THERMAL GAP FILLING OF ELECTRODES | Non-Final OA | Applied Materials, Inc. |
| 18896902 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18825163 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18035401 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE | Final Rejection | Tokyo Electron Limited |
| 18469687 | SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Non-Final OA | Kokusai Electric Corporation |
| 18580384 | SHOWERHEAD TEMPERATURE BASED DEPOSITION TIME COMPENSATION FOR THICKNESS TRENDING IN PECVD DEPOSITION SYSTEM | Non-Final OA | LAM RESEARCH CORPORATION |
| 17993996 | PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Final Rejection | SEMES CO., LTD. |
| 17747317 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM | Non-Final OA | SEMES CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy