Prosecution Insights
Last updated: October 01, 2026
Application No. 19/029,083

SEMICONDUCTOR DEVICE AND DYNAMIC LOGIC CIRCUIT

Non-Final OA §103
Filed
Jan 17, 2025
Priority
Nov 24, 2017 — JP 2017-225312 +4 more
Examiner
SMET, UYEN TRAN
Art Unit
Tech Center
Assignee
Semiconductor Energy Laboratory Co., Ltd.
OA Round
1 (Non-Final)
93%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 93% — above average
93%
Career Allowance Rate
558 granted / 600 resolved
+33.0% vs TC avg
Minimal +3% lift
Without
With
+3.2%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 11m
Avg Prosecution
28 currently pending
Career history
620
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
55.8%
+15.8% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
6.8%
-33.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 600 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of certified copies of papers required by 37 CFR 1.55. Information Disclosure Statement The information disclosure statement (IDS) submitted has been considered by the examiner. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-3 is/are rejected under 35 U.S.C. 103 as being unpatentable over Asnaashari et al. (US 9,697,874 “Asnaashari”) in view of Yamazaki et al. (US 2016/0247548 “Yamazaki”). Regarding claim 1, Asnaashari discloses a semiconductor device comprising: a COMS logic circuit (210; fig. 2); and a memory device (200; fig. 2) over the COMS logic circuit, wherein the COMS logic circuit comprises a CPU (CPU; fig. 2) and a bus (260; fig. 2), wherein the memory device comprises a memory cell (220-250; fig. 2), wherein the memory cell comprises a first transistor, a second transistor, a third transistor (fig. 3-6), and wherein data communication between the memory device and the CPU is performed through the bus (column/line(s): 12/36-56). Asnaashari does not expressly disclose a capacitor, and wherein the first transistor, the second transistor, and the third transistor each comprise a channel formation region including a metal oxide. Yamazaki discloses a capacitor (any capacitor of memory cell; fig. 1-3, 6-17), and wherein the first transistor, the second transistor, and the third transistor each comprise a channel formation region (432 [0195]) including a metal oxide (first M0 to third Mn transistors may comprise metal oxide 432; fig. 1-3, 6-17 [0192-0195]). Therefore, it would have been obvious to one with ordinary skill in the art before the effective filing date of the invention to recognize that the device of Asnaashari is modifiable as taught by Yamazaki for the purpose of allowing a large amount of current flow to increase an on-state of a transistor, suitable for achieving high density circuits such as large-scale integration [0208+ of Yamazaki]. Regarding claim 2, Asnaashari discloses the semiconductor device according to claim 1, wherein the memory device is in a plurality of memory devices, and wherein the plurality of memory devices overlap with the COMS logic circuit (fig. 2). Regarding claim 3, Asnaashari discloses the semiconductor device according to claim 1, wherein the COMS logic circuit further comprises a first peripheral circuit and a second peripheral circuit (fig. 2). Claim(s) 4-6 is/are rejected under 35 U.S.C. 103 as being unpatentable over Asnaashari et al. (US 9,697,874 “Asnaashari”) in view of Yamazaki et al. (US 2016/0247548 “Yamazaki”), and further in view of Ohmaru et al. (US 2014/0204645 “Ohmaru”). Regarding claim 4, Asnaashari discloses a semiconductor device comprising: a COMS logic circuit (210; fig. 2); and a memory device (200; fig. 2) over the COMS logic circuit, wherein the COMS logic circuit comprises a CPU (CPU; fig. 2) and a bus (260; fig. 2), wherein the memory device comprises a memory cell (220-250; fig. 2), wherein the memory cell comprises a retention node, a first transistor, a second transistor, a third transistor (fig. 3-6), and wherein data communication between the memory device and the CPU is performed through the bus (column/line(s): 12/36-56). Asnaashari does not expressly disclose wherein the memory device comprises a first wiring, a second wiring, a third wiring, a fourth wiring, a fifth wiring, and a memory cell, and a capacitor, wherein the first transistor, the second transistor, and the third transistor each comprise a channel formation region including a metal oxide, wherein a gate of the first transistor is electrically connected to the first wiring, wherein one of a source and a drain of the first transistor is electrically connected to the third wiring, wherein the other of the source and the drain of the first transistor is electrically connected to the retention node, wherein a gate of the second transistor is electrically connected to the retention node, wherein a gate of the third transistor is electrically connected to the second wiring, wherein the second transistor and the third transistor are electrically connected in series between the fourth wiring and the fifth wiring, wherein a first terminal of the capacitor is electrically connected to the retention node, wherein a second terminal of the capacitor is electrically connected to the fourth wiring. Ohmaru discloses wherein the memory device comprises a first wiring, a second wiring, a third wiring, a fourth wiring, a fifth wiring, and a memory cell, and a capacitor (fig. 4), wherein the first transistor (109; fig. 4), the second transistor (110; fig. 4), each comprise a channel formation region [0163], wherein a gate of the first transistor (109) is electrically connected to the first wiring (wire for BK input; fig. 4), wherein one of a source and a drain of the first transistor (109) is electrically connected to the third wiring (wire for storage circuit 320_(m+1) input; fig. 4), wherein the other of the source and the drain of the first transistor (109) is electrically connected to the retention node (M2; fig. 4), wherein a gate of the second transistor (110) is electrically connected to the retention node (M2), wherein a gate of the third transistor (113; fig. 4) is electrically connected to the second wiring (wire for PR input; fig. 4), the second transistor (110) and the third transistor (113) are electrically connected in series between the fourth wiring (wire for V1 input; fig. 4) and the fifth wiring (M1 wiring; fig. 4), wherein a first terminal of the capacitor (108; fig. 4) is electrically connected to the retention node (M2), wherein a second terminal of the capacitor (108) is electrically connected to the fourth wiring (wire for V1 input). Therefore, it would have been obvious to one with ordinary skill in the art before the effective filing date of the invention to recognize that the device of Asnaashari is further modifiable as taught by Ohmaru for the purpose of facilitating data accessing schemes by preventing delays of signals [0019 oh Ohmaru], to benefit, predictably, the commonly understood advantage of having a more efficient and robust operating memory device. Yamazaki discloses wherein the memory device comprises a first wiring, a second wiring, a third wiring, a fourth wiring, a fifth wiring, and a memory cell, and a capacitor (fig. 1-3, 6-17), wherein the first transistor, the second transistor, and the third transistor (any of transistors M0-Mn) each comprise a channel formation region (432 [0195]) including a metal oxide (M0 to Mn transistors may comprise metal oxide 432; fig. 1-3, 6-17 [0192-0195]). Therefore, it would have been obvious to one with ordinary skill in the art before the effective filing date of the invention to recognize that the device of Asnaashari is further modifiable as taught by Yamazaki for the purpose of allowing a large amount of current flow to increase an on-state of a transistor, suitable for achieving high density circuits such as large-scale integration [0208+ of Yamazaki]. Regarding claim 5, Asnaashari discloses the semiconductor device according to claim 4, wherein the memory device is in a plurality of memory devices, and wherein the plurality of memory devices overlap with the COMS logic circuit (fig. 2). Regarding claim 6, Asnaashari discloses the semiconductor device according to claim 4, wherein the COMS logic circuit further comprises a first peripheral circuit and a second peripheral circuit (fig. 2). Allowable Subject Matter Claim(s) 7-9 are allowed. The following is an examiner’s statement of reasons for allowance: the prior art made of record and not relied upon is considered pertinent to applicant’s disclosure does not teach or suggest the claimed invention having the following limitation, in combination with the remaining claimed limitations. With respect to independent claim 7 (and all dependent claim(s) therefrom), the prior art fails to teach or suggest the claimed limitations, namely wherein a back gate of the first transistor is electrically connected to the sixth wiring, wherein a gate of the second transistor is electrically connected to the retention node, wherein a back gate of the second transistor is electrically connected to the seventh wiring, wherein a gate of the third transistor is electrically connected to the second wiring, wherein a back gate of the third transistor is electrically connected to the eighth wiring. The allowable claims are supported in at least fig. 1B of the instant application. Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.” Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to UYEN SMET whose telephone number is (571) 272-2267. The examiner can normally be reached M-F, 9 AM-5 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Richard Elms can be reached on (571) 272-1869. The fax phone number for the organization where this application or proceeding is assigned is (571) 273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /UYEN SMET/ Primary Examiner, Art Unit 2824
Read full office action

Prosecution Timeline

Jan 17, 2025
Application Filed
Aug 21, 2026
Non-Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
93%
Grant Probability
96%
With Interview (+3.2%)
1y 11m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 600 resolved cases by this examiner. Grant probability derived from career allowance rate.

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