DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Status
Acknowledgment is made of the amendment filed on 8/6/2026, which amended claims 1, 3-4, 10, 20, cancelled claim 2, and added new claims 21. Claims 1, 3-21 are currently pending.
Claim Objections
Claim 1 is objected to because of the following informalities:
Claim 1, line 12, “the process chamber” should be changed to --the EUV process chamber-- to correct antecedence.
Appropriate correction is required to place claims in better form.
Double Patenting
The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969).
A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b).
The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13.
The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer.
Claims 1, 4-9, and 21 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-6 of U.S. Patent No. 12,235,593 in view of Nei et al. (US Patent No. 6,342,941, Nei hereinafter).
Regarding claim 1, claim 1 of patent 593 recites a method for dynamically controlling reticle temperature of a thermostatic reticle assembly (claim 1, col. 19, lines 58-59), comprising:
receiving, from at least one sensor, a current temperature of a reticle of the thermostatic reticle assembly via a thermostat component, wherein the reticle is removably coupled to the thermostatic reticle assembly positioned within an EUV process chamber (claim 1, col. 19, lines 60-64);
identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography (claim 1, col. 19, lines 65-67);
retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe (claim 1, col. 20, lines 1-3); and
at least one heating element affixed to a top of the reticle (claim 1, col. 20, lines 5-6);
activating the at least one heating element affixed to the top of the reticle (claim 1, col. 20, lines 4-6),
receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (claim 1, col. 20, lines 7-9),
deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady state temperature (claim 1, col. 20, lines 10-12),
receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element (claim 1, col. 20, lines 13-15),
comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature (claim 1, col. 20, lines 17-19), and
activating a chiller component in response to a result of the comparison (claim 1, col. 20, lines 20-21). Claim 1 of patent 593 does not recite preheating the reticle via the at least one heating element of the thermostatic reticle assembly positioned within the process chamber by the thermostat component in accordance with the retrieved steady-state temperature.
Nei discloses preheating the reticle via at least one heating element of the thermostatic reticle assembly positioned within the process chamber by the thermostat component in accordance with the retrieved steady-state temperature (Figs. 1, 7, 8, col. 6, lines 15-24, col. 8, lines 23-65, col. 11, lines 10-28, col. 15, lines 52-67, col. 16, lines 1-42, the reticle R is preheated within chamber 105 by irradiation light during nonexposure periods, heater HT, or heater HT2 according to the saturation temperature).
It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have included preheating the reticle via at least one heating element of the thermostatic reticle assembly positioned within the process chamber by the thermostat component in accordance with the retrieved steady-state temperature as taught by Nei in the method recited by patent 593 since including preheating the reticle via at least one heating element of the thermostatic reticle assembly positioned within the process chamber by the thermostat component in accordance with the retrieved steady-state temperature is commonly used to provide an exposure apparatus that minimizes the impact of thermal expansion of the reticle without harm to throughput (Nei, col. 2, lines 24-39).
Regarding claim 4, claim 1 of patent 593 as modified by Nei recites wherein identifying at least one of the reticle of the thermostatic reticle assembly and a recipe is performed via a machine learning component (claim 1, col. 19, lines 65-67).
Regarding claim 5, claim 2 of patent 593 as modified by Nei recites wherein the at least one heating element is an inductive heating element or a resistive heating element positioned adjacent to the reticle (see claim 2).
Regarding claim 6, claim 3 of patent 593 as modified by Nei recites wherein the thermostatic reticle assembly includes at least one burl disposed between a clamp of the reticle assembly and the at least one heating element (see claim 3).
Regarding claim 7, claim 4 of patent 593 as modified by Nei recites wherein the thermostat component is configured to monitor the temperature of the reticle in accordance with a predetermined frequency (see claim 4).
Regarding claim 8, claim 5 of patent 593 as modified by Nei recites wherein the at least one heating element is configured to heat within a range of 20 to 80 degrees Celsius (see claim 5).
Regarding claim 9, claim 6 of patent 593 as modified by Nei recites wherein the thermostatic reticle assembly is an extreme ultraviolet lithography (EUV) reticle assembly (see claim 6).
Regarding claim 21, claim 4 of patent 593 as modified by Nei recites the general conditions of the predetermined frequency (see claim 4 of patent 593), but does not appear to explicitly recite wherein the predetermined frequency is in the range of every 5 to 10 seconds. However, absent evidence of criticality, it would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have included optimizing the predetermined frequency in the method as recited by patent 593 as modified by Nei to have obtained wherein the predetermined frequency is in the range of every 5 to 10 seconds since optimizing the predetermined frequency to be in the range of every 5 to 10 seconds would have only required routine skill to determine an optimum frequency to allow accurate determination of the reticle temperature change over time while balancing the need to minimize data necessary to be stored in memory to enable accurate feedback control. "[W]here the general conditions of a claim are disclosed in the prior art, it is not inventive to discover the optimum or workable ranges by routine experimentation." In re Aller, 220 F.2d 454, 456, 105 USPQ 233, 235 (CCPA 1955). See MPEP 2144.05, subsection II.
Claim 3 is rejected on the ground of nonstatutory double patenting as being unpatentable over claim 1 of U.S. Patent No. 12,235,593 as modified by Nei in view of Yang et al. (US PGPub 2021/0033987, Yang hereinafter).
Regarding claim 3, patent 593 as modified by Nei does not recite further comprising receiving temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieving recipe and temperature distribution associated with the reticle from the associated database; and updating the steady-state temperature associated with the reticle for subsequent processing in the associated database.
Yang discloses receiving temperature information from the at least one temperature sensor corresponding to exposures of the reticle (Figs. 9-11, paras. [0041], [0050], [0053]-[0064], the temperature profile of the reticles are measured upon exposure);
retrieving recipe and temperature distribution associated with the reticle from the associated database (Figs. 1-3, 9-11, paras. [0049]-[0063], the saturation temperature of the selected reticle is determined using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature); and
updating the steady-state temperature associated with the reticle for subsequent processing in the associated database (Figs. 1-3, 9-11, paras. [0049]-[0064], [0066], [0069], the saturation temperature of the selected reticle is determined following the generation of sample data using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature).
It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have included receiving temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieving recipe and temperature distribution associated with the reticle from the associated database; and updating the steady-state temperature associated with the reticle for subsequent processing in the associated database as taught by Yang in the method as recited by patent 593 as modified by Nei since including receiving temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieving recipe and temperature distribution associated with the reticle from the associated database; and updating the steady-state temperature associated with the reticle for subsequent processing in the associated database is commonly used to achieve the desired thermal deformation characteristics specific for each reticle in each lithography step used to produce the circuit patterns of a semiconductor device to improve process overlay and yield (Yang, paras. [0002], [0064], [0068]).
Claims 10-17 and 20 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 7-13 and 15 of U.S. Patent No. 12,235,593. Although the claims at issue are not identical, they are not patentably distinct from each other because the instant claims are broader versions of the patented claims, which further require the at least one heating element affixed to a top of the reticle and an extreme ultraviolet process chamber or identifying, via a machine learning component, the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography.
Regarding claim 10, claim 7 of patent 593 recites a system for dynamically controlling a temperature of a thermostatic reticle (claim 7, col. 20, lines 38-39), comprising:
a thermostatic reticle assembly positioned within a process chamber (claim 7, col. 20, lines 40-42), comprising:
a clamp (claim 7, col. 20, line 43);
a reticle removably coupled to the clamp (claim 7, col. 20, line 44),
at least one temperature sensor in proximity to the reticle (claim 7, col. 20, lines 45-46), and
at least one heating element positioned between the clamp and the reticle (claim 7, col. 20, lines 47-49);
a thermostat component in communication with the at least one temperature sensor and the at least one heating element (claim 7, col. 20, lines 50-52); and
a controller comprising a processor in communication with memory storing instructions (claim 7, col. 20, lines 53-55) which are executed by the processor to:
identify the reticle of the thermostatic reticle assembly and a recipe using the reticle in the process chamber (claim 7, col. 20, lines 56-58);
retrieve, from an associated database, a steady-state temperature corresponding to the reticle and recipe (claim 7, col. 20, lines 59-60),
receive, from the at least one temperature sensor by the thermostat component, a current temperature of the reticle (claim 7, col. 20, lines 62-64);
activate, via the thermostat component, the at least one heating element in proximity to the reticle to preheat the reticle to the retrieved steady-state temperature in accordance with the current temperature of the reticle (claim 7, col. 20, lines 64-67);
receive, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (claim 7, col. 21, lines 1-3);
deactivate the at least one heating element responsive to the temperature of the reticle reaching the steady state temperature (claim 7, col. 21, lines 4-6),
receive, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element (claim 7, col. 21, lines 7-9),
compare the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature (claim 7, col. 21, lines 10-12), and
activate a chiller component in response to a result of the comparison (claim 7, col. 21, lines 13-14).
Regarding claim 11, claim 7 of patent 593 recites wherein the at least one heating element is positioned in contact with a top of the reticle (claim 7, col. 20, lines 47-49).
Regarding claim 12, claim 8 of patent 593 recites wherein the at least one heating element is an inductive heating element or a resistive heating element (see claim 8).
Regarding claim 13, claim 9 of patent 593 recites wherein the thermostat component is configured to monitor the temperature of the reticle in accordance with a predetermined frequency (see claim 9).
Regarding claim 14, claim 10 of patent 593 recites wherein the predetermined frequency is in the range of every 5 to 10 seconds (claim 10).
Regarding claim 15, claim 11 of patent 593 recites wherein the thermostatic assembly includes at least one burl disposed between the clamp of the reticle assembly and the at least one heating element (claim 11).
Regarding claim 16, claim 12 of patent 593 recites wherein the at least one heating element is configured to heat within a range of 20 to 80 degrees Celsius (claim 16).
Regarding claim 17, claim 13 of patent 593 recites wherein the thermostatic reticle assembly is an extreme ultraviolet lithography (EUV) reticle assembly (claim 13).
Regarding claim 20, claim 15 of patent 593 recites a computer-implemented method for dynamically controlling reticle temperature of a thermostatic reticle assembly (claim 15, col. 21, lines 38-40), comprising:
receiving, from at least one sensor, a current temperature of a reticle via a thermostat component, wherein the reticle is removably coupled to a clamp of the thermostatic reticle assembly positioned within an EUV process chamber (claim 15, col. 21, lines 41-42, col. 22, lines 1-3);
identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography (claim 15, col. 22, lines 4-6);
retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe (claim 15, col. 22, lines 7-9);
activating at least one heating element positioned between the clamp and the reticle, wherein the at least one heating element is affixed to a top of the reticle (claim 15, col. 22, lines 10-12);
receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (claim 15, col. 22, lines 13-15);
deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady-state temperature (claim 15, col. 22, lines 16-18);
receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element (claim 15, col. 22, lines 19-21);
comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature (claim 15, col. 22, lines 22-24); and
activating a chiller component in response to a result of the comparison (claim 15, col. 22, lines 25-26).
Claims 18-19 rejected on the ground of nonstatutory double patenting as being unpatentable over claim 7 of U.S. Patent No. 12,235,593 as modified by Nei in view of Yang et al. (US PGPub 2021/0033987, Yang hereinafter) and Bow et al. (US PGPub 2018/0275525, Bow hereinafter).
Regarding claim 18, patent 593 as modified by Nei does not recite wherein the memory further stores a machine learning component configured operable to: receive temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieve recipe and temperature distribution associated with the reticle from the associated database; and update the steady-state temperature associated with the reticle for subsequent processing.
Yang discloses the memory configured operable to: receive temperature information from the at least one temperature sensor corresponding to exposures of the reticle (Figs. 9-11, paras. [0041], [0050], [0053]-[0064], the temperature profile of the reticles are measured upon exposure);
retrieve recipe and temperature distribution associated with the reticle from the associated database (Figs. 1-3, 9-11, paras. [0049]-[0063], the saturation temperature of the selected reticle is determined using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature); and
update the steady-state temperature associated with the reticle for subsequent processing (Figs. 1-3, 9-11, paras. [0049]-[0064], [0066], [0069], the saturation temperature of the selected reticle is determined following the generation of sample data using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature).
It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have included the memory configured operable to: receive temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieve recipe and temperature distribution associated with the reticle from the associated database; and update the steady-state temperature associated with the reticle for subsequent processing as taught by Yang in the memory in the system as recited by patent 593 as modified by Nei since including the memory configured operable to: receive temperature information from the at least one temperature sensor corresponding to exposures of the reticle; retrieve recipe and temperature distribution associated with the reticle from the associated database; and update the steady-state temperature associated with the reticle for subsequent processing is commonly used to achieve the desired thermal deformation characteristics specific for each reticle in each lithography step used to produce the circuit patterns of a semiconductor device to improve process overlay and yield (Yang, paras. [0002], [0064], [0068]).
Patent 593 as modified by Nei in view of Yang does not appear to explicitly recite wherein the memory further stores a machine learning component.
Bow discloses wherein the memory further stores a machine learning component (paras. [0030]-[0034], [0056]-[0064], [0125], a machine learning operation is performed with a control system 624 having a memory) configured operable to:
update temperature for subsequent processing (paras. [0030]-[0034], [0057]-[0064], temperature measurements are used to predict and compensate for distortion during processing).
It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention to have included a machine learning component as taught by Bow in the memory in the system as recited by patent 593 as modified by Nei in view of Yang since including a machine learning component is commonly used to provide a faster and more accurate distortion prediction model (Bow, paras. [0027], [0029], [0033]-[0034]).
Regarding claim 19, patent 593 as modified by Nei in view of Yang in view of Bow recites wherein the machine learning component is further configured to record spatial and temporal temperature distribution of the reticle during a current exposure, and wherein the steady-state temperature associated with the reticle is updated in accordance therewith (Yang, Figs. 4, 6-8, 9-11, paras. [0041]-[0045], [0048]-[0066], [0069], the temperature profile over time is measured for exposures and used by the computing device to calculate the saturation temperature of the selected reticle to control the reticle temperature prior to further exposures, and as modified by Bow, the computing device includes a machine learning component for a machine learning operation, paras. [0030]-[0034], [0056]-[0064], [0125]).
Allowable Subject Matter
Claims 1 and 3-21 would be allowable if rewritten or amended to overcome the nonstatutory double patenting rejections set forth in this Office action or if a proper Terminal Disclaimer is filed.
The following is a statement of reasons for the indication of allowable subject matter.
Regarding claim 1, the prior art of record, either alone or in combination, fails to teach or render obvious identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe; preheating the reticle via at least one heating element of the thermostatic reticle assembly positioned within the process chamber by the thermostat component in accordance with the retrieved steady-state temperature, the at least one heating element affixed to a top of the reticle, wherein preheating the reticle further comprises activating at least one heating element affixed to the top of the reticle; receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element, deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady-state temperature; receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element; comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activating a chiller component in response to a result of the comparison. These limitations in combination with the other limitations of claim 1 render the claim non-obvious over the prior art of record.
Regarding claim 10, the prior art of record, either alone or in combination, fails to teach or render obvious at least one heating element positioned between the clamp and the reticle; a controller comprising a processor in communication with memory storing instructions which are executed by the processor to: identify the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieve, from an associated database, a steady-state temperature corresponding to the reticle and recipe; receive, from the at least one temperature sensor by the thermostat component, a current temperature of the reticle, activate, via the thermostat component, the at least one heating element to preheat the reticle to the retrieved steady-state temperature in accordance with the current temperature of the reticle; receive, from the at least one temperature sensor, a temperature of the reticle subsequent to activating the at least one heating element; deactivate the at least one heating element responsive to the temperature of the reticle reaching the steady state temperature; receive, from the at least one temperature sensor, a temperature of the reticle after deactivating the at least one heating element; compare the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activate a chiller component in response to a result of the comparison. These limitations in combination with the other limitations of claim 10 render the claim non-obvious over the prior art of record.
Regarding claim 20, the prior art of record, either alone or in combination, fails to teach or render obvious identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe; activating at least one heating element positioned between the clamp and the reticle, wherein the at least one heating element is affixed to a top of the reticle; deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady-state temperature; receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element; comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activating a chiller component in response to a result of the comparison. These limitations in combination with the other limitations of claim 20 render the claim non-obvious over the prior art of record.
The dependent claims are likewise allowable by virtue of their dependency upon an allowable independent claim as stated above.
Nei et al. (US Patent No. 6,342,941, Nei hereinafter) discloses activating the at least one heating element in proximity to the reticle (Figs. 1, 7, 8, col. 8, lines 23-65, col. 11, lines 10-28, col. 15, lines 52-67, col. 16, lines 1-42, the reticle R is preheated by irradiation light during nonexposure periods, heater HT, or heater HT2), receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (Figs. 1, 7, 8, col. 11, lines 10-28, col. 15, lines 52-67, col. 16, lines 1-24, temperature sensors 15 or 134 constantly monitor and output the temperature of the reticle to controller 22), and deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady state temperature (Figs. 1, 7, 8, col. 8, lines 47-65, col. 11, lines 10-28, col. 15, lines 52-67, col. 16, lines 1-42, once the saturation temperature is achieved, the application of heat is stopped). Nei does not describe or render obvious identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe; activating at least one heating element positioned between the clamp and the reticle, wherein the at least one heating element is affixed to a top of the reticle. Nei fails to describe or render obvious the at least one heating element positioned between the clamp and the reticle. Nei further fails to describe or render obvious activating a chiller component in response to a result of a comparison.
Schneider et al. (DE102011086513, Schneider hereinafter) discloses a computer-implemented method for dynamically controlling reticle temperature of a thermostatic reticle assembly (Figs. 1-8), comprising: receiving, from at least one sensor, a current temperature of a reticle via a thermostat component (Figs. 1-6, page 6, lines 30-33, page 9, page 10, lines 12-51, the reticle stage RST includes a heater HD and cooling device CD, which are controlled by a control device HC of a central control device CU according to a temperature distribution measuring device), wherein the thermostatic reticle assembly is positioned within an EUV process chamber (Figs. 1-5, page 7, lines 9-21, page 8, lines 2-3, lines 17-18, the reticle stage RST with heater HD and cooling device CD are positioned within the EUV exposure apparatus WSC), activating the at least one heating element in proximity to the reticle (Figs. 1-5, page 6, lines 30-33, page 8, lines 42-53, page 9, page 10, lines 12-51, the control device HC controls heater HD to heat the mask); receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (Figs. 1-5, page 6, lines 30-33, page 9, page 10, lines 12-51, the local current heat distribution of the mask is measured using a measuring device, and commands to the heating device are determined based on the temperature measurement); and activating a chiller component (Figs. 4-5, page 10, lines 20-51, a cooling device CD is provided to provide active cooling of the mask). Schneider does not describe or render obvious identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe; activating at least one heating element positioned between the clamp and the reticle, or wherein the at least one heating element is affixed to a top of the reticle; deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady-state temperature; receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element; comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activating a chiller component in response to a result of the comparison.
Yang et al. (US PGPub 2021/0033987, Yang hereinafter) discloses a computer-implemented method for dynamically controlling reticle temperature of a thermostatic reticle assembly (Figs. 1-3, 9-11, paras. [0027], [0047], [0049]-[0052], [0059]-[0063]), comprising: receiving, from at least one sensor, a current temperature of a reticle via a thermostat component (Figs. 2, 9-11, paras. [0049]-[0052], [0060]-[0062], the reticle library includes a temperature sensor in a thermal-managing unit 124A, 124B to measure the current temperature of the selected reticle to be compared with the saturation temperature of the selected reticle); identifying, the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography (Figs. 1-3, 9-11, paras. [0047], [0049]-[0052], the selected reticle and its process recipe are identified to determine the saturation temperature); retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe (Figs. 1-3, 9-11, paras. [0027], [0047], [0049]-[0063], the saturation temperature of the selected reticle is determined using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature); activating the at least one heating element in proximity to the reticle (Figs. 1-3, 9-11, paras. [0049]-[0063], the saturation temperature of the selected reticle is determined using the exposure process, and the stored saturation temperature is used to regulate the selected reticle temperature); receiving, from the at least one sensor, a temperature of the reticle subsequent to activating the at least one heating element (Figs. 9-11, paras. [0049]-[0052], [0059]-[0064], the temperature of the reticle is regulated by applying thermal energy to reach the saturation temperature); and deactivating the at least one heating element responsive to the temperature of the reticle reaching the steady-state temperature (Figs. 9-11, paras. [0049]-[0052], [0059]-[0064], [0069], the temperature of the reticle is regulated by applying thermal energy to reach the saturation temperature at which point the reticle is transferred to the exposure area); receiving, from the at least one sensor, a temperature of the reticle after deactivating the at least one heating element (Figs. 9-11, paras. [0049]-[0052], [0059]-[0064], the temperature of the reticle is regulated by applying thermal energy to reach the saturation temperature). Yang does not describe or suggest comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activating a chiller component in response to a result of the comparison and fails to describe activating at least one heating element positioned between the clamp and the reticle, or wherein the at least one heating element is affixed to a top of the reticle.
Bow et al. (US PGPub 2018/0275525, Bow hereinafter) discloses a machine learning component in a lithography system (paras. [0030]-[0034], [0056]-[0064], [0125], a machine learning operation is performed with a control system 624 having a memory), but Bow fails to describe or render obvious activating at least one heating element positioned between the clamp and the reticle, or wherein the at least one heating element is affixed to a top of the reticle and comparing the temperature of the reticle after deactivating the at least one heating element to the steady-state temperature; and activating a chiller component in response to a result of the comparison.
Onvlee et al. (US PGPub 2015/0192856, Onvlee hereinafter) discloses comparing the temperature of the reticle after deactivating the at least one heating element to the temperature (Figs. 2, 4, para. [0059], [0073]-[0074], the reticle cooling system is configured to provide gas to reduce the temperature of the reticle 210 after a feedback loop to heat the reticle such that the final temperature of the reticle is not too high); and activating a chiller component in response to a result of the comparison (Figs. 2, 4, paras. [0059], [0063]-[0064], [0073]-[0074], the reticle cooling mechanism to provide the reticle with a desired temperature), but Onvlee fails to describe or render obvious activating at least one heating element positioned between the clamp and the reticle, or wherein the at least one heating element is affixed to a top of the reticle.
Niibe et al. (US Patent No. 5,390,228, Niibe hereinafter) discloses wherein the at least one heating element is positioned in contact with a top of the reticle (Fig. 3, col. 7, lines 23-34, lines, 66-67, lines 66-67, col. 8, lines 1-8, heating means 23 heats the reverse surface of the reflection type mask 17 with heater 23a, which is a top surface with respect to the direction of incident radiation), but Niibe does not describe or render obvious activating at least one heating element positioned between the clamp and the reticle or wherein the at least one heating element is affixed to a top of the reticle.
Response to Arguments
Applicant’s arguments, see page 10, filed 8/6/2026, with respect to the objection to the drawings have been fully considered and are persuasive owing to the amendment to the specification. The drawing objection has been withdrawn.
Applicant’s arguments, see page 12, filed 8/6/2026, with respect to the objection to claim 10 have been fully considered and are persuasive owing to the amendment to the claim. The claim 10 objection has been withdrawn.
Applicant's arguments filed 8/6/2026 have been fully considered but they are not persuasive.
The Applicant argues on pages 12-13 with respect to the rejection of claims 1-20 on the ground of nonstatutory double patenting that Nei in view of one or more of Monkman, Tromp, Itai, Yoneda, Niibe, Schneider, Yang and Bow fail to teach or disclose claims 1, 10, and 20 as amended. The Examiner respectfully disagrees. Claim 1 of US Patent No. 12,235,593 recites the limitations receiving, from at least one sensor, a current temperature of a reticle of the thermostatic reticle assembly via a thermostat component, wherein the reticle is removably coupled to the thermostatic reticle assembly positioned within an EUV process chamber (claim 1, col. 19, lines 60-64); identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography (claim 1, col. 19, lines 65-67); and at least one heating element affixed to a top of the reticle (claim 1, col. 20, lines 5-6), as recited in claim 1 as amended. Claim 7 of US Patent No. 12,235,593 recites the limitations at least one heating element positioned between the clamp and the reticle (claim 7, col. 20, lines 47-49); identify the reticle of the thermostatic reticle assembly and a recipe using the reticle in the process chamber (claim 7, col. 20, lines 56-58); retrieve, from an associated database, a steady-state temperature corresponding to the reticle and recipe (claim 7, col. 20, lines 59-60), as recited in claim 10 as amended. Claim 15 of US Patent No. 12,235,593 recites the limitation activating at least one heating element positioned between the clamp and the reticle, wherein the at least one heating element is affixed to a top of the reticle (claim 15, col. 22, lines 10-12), as recited in claim 20 as amended. Applicant’s arguments on this point have been fully considered, but they are not persuasive.
Applicant’s arguments, see pages 13-15, filed 8/6/2026, with respect to the 35 U.S.C. 103 rejections of claims 1 and 3-20 have been fully considered and are persuasive owing to the amendments to claims 1, 10, and 20 to include “identifying the reticle of the thermostatic reticle assembly and a recipe using the reticle in EUV lithography; retrieving, from an associated database, a steady-state temperature associated with the identified reticle and recipe” and “the at least one heating element affixed to a top of the reticle” in claim 1, “at least one heating element positioned between the clamp and the reticle” and “identify the reticle of the thermostatic reticle assembly and a recipe using the reticle in the process chamber; retrieve, from an associated database, a steady-state temperature corresponding to the reticle and recipe” in claim 10, and “activating the at least one heating element positioned between the clamp and the reticle, wherein the at least one heating element is affixed to a top of the reticle” in claim 20. The 35 U.S.C. 103 rejections of claims 1 and 3-20 have been withdrawn owing to the amendments.
Conclusion
Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
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/CHRISTINA A RIDDLE/Primary Examiner, Art Unit 2882
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