Prosecution Insights
Last updated: October 02, 2026
Application No. 19/063,773

INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS

Non-Final OA §103
Filed
Feb 26, 2025
Priority
Sep 05, 2022 — DE 10 2022 209 214.7 +1 more
Examiner
ASFAW, MESFIN T
Art Unit
Tech Center
Assignee
Carl Zeiss SMT GmbH
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
1y 0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allowance Rate
823 granted / 991 resolved
+23.0% vs TC avg
Moderate +14% lift
Without
With
+13.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
28 currently pending
Career history
1011
Total Applications
across all art units

Statute-Specific Performance

§101
1.6%
-38.4% vs TC avg
§103
57.8%
+17.8% vs TC avg
§102
33.2%
-6.8% vs TC avg
§112
3.0%
-37.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 991 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hauf et al. [US 20170363861 A1, hereafter Hauf] in view of Böhme et al. [US 20210141191 A1, hereafter Böhme]. As per Claim 1, Hauf teaches an individual mirror of a pupil facet mirror (Para 103, a pupil facet mirror 14), comprising: a reflection surface having a surface normal (See fig. 2); a bearing configured to enable a pivoting movement of the individual mirror about first and second pivot axes, the first and second pivot axes (two tilt axes 33, 34) being transverse to the surface normal (See fig. 3, Para 126). Hauf does not explicitly teach an actuator device configured to pivot the individual mirror, wherein a ratio of the pivotability of the individual mirror about the first and second pivot axes is at least 2:1. Böhme teaches for rotations about the x- and y-axes, space requirements for the magnets in the x- and y-directions are different. The difference is given by the principle of a Gimbal bearing, as pair of magnets is more influenced by the second axis (Para 48-49). Therefore, it would have been obvious to one of ordinary skill in the art at time the invention was made to incorporate a ratio of pivotability as claimed in order to produce a desired illumination. As per Claim 2, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed wherein the first pivot axis has a first pivotability region, the second pivot axis has a second pivotability region, and smaller of the first and second pivotability regions is at most +/−25 mrad (Para 136). As per Claim 3, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed wherein a bearing for each pivoting degree of freedom comprises one or more leaf springs, and the one or more leaf springs for one pivoting degree of freedom are thicker and/or stiffer than the one or more leaf springs for the other pivoting degree of freedom (Para 48-50). As per Claim 4, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed a sensor device configure to detect at most one of the pivoting movements about the first and second pivot axes (Para 52 and 160). As per Claim 5, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed an eddy current sensor configured to detect a pivot position (Para 183). As per Claim 6, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed wherein the first and second pivot axes are spaced apart from the reflection surface (See fig. 3). As per Claim 7, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed a reference position sensor configured to ascertain a reference signal for a pivot position for at least one of the first and second pivot axes (Para 51-52). As per Claim 8, Hauf in view of Böhme teaches the individual mirror of claim 1. Böhme further disclosed wherein the ratio of the pivotability about the first and second pivot axes differs from a ratio of the extents of the reflection surface of the individual mirror in the respective directions (Para 48-49). Therefore, it would have been obvious to one of ordinary skill in the art at time the invention was made to incorporate a ratio of pivotability as claimed in order to produce a desired illumination. As per Claim 9, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf further disclosed wherein the reflection surface has identical dimensions in the direction perpendicular to the two pivot axes (See fig. 3) As per Claim 10, Hauf in view of Böhme teaches the individual mirror of claim 1. Hauf in view of Böhme further disclosed wherein: the first pivot axis has a first pivotability region, the second pivot axis has a second pivotability region, and smaller of the first and second pivotability regions is at most +/−25 mrad; and a bearing for each pivoting degree of freedom comprises one or more leaf springs, and the one or more leaf springs for one pivoting degree of freedom are thicker and/or stiffer than the one or more leaf springs for the other pivoting degree of freedom (Hauf Para 136 in view of Böhme Para 48-49). Therefore, it would have been obvious to one of ordinary skill in the art at time the invention was made to incorporate a ratio of pivotability as claimed in order to produce a desired illumination. As per Claim 11, Hauf in view of Böhme teaches the individual mirror of claim 10. Hauf further disclosed a sensor device configure to detect at most one of the pivoting movements about the first and second pivot axes (Para 52 and 160). As per Claim 12, Hauf in view of Böhme teaches a pupil facet mirror. Hauf further disclosed a plurality of individual mirrors, wherein each individual mirror is an individual mirror according to claim 1 (Para 104). As per Claim 13, Hauf in view of Böhme teaches an optical unit, comprising: a field facet mirror comprising a plurality of field facets; and a pupil facet mirror comprising a plurality of individual mirrors, wherein the optical unit is an illumination optical unit, the field facets are imageable into an object field, and each individual mirror of the pupil facet is an individual mirror according to claim 1 (Hauf Para 104). As per Claim 14, Hauf in view of Böhme teaches the optical unit of claim 13. Hauf further disclosed wherein at least some of the pupil facets are displaceable so that they are assignable to exactly two, three, four or five different field facets (Para 114). As per Claim 15, Hauf in view of Böhme teaches the optical unit of claim 13. Hauf further disclosed wherein the individual mirrors of the pupil facet mirror are aligned so that they have a smaller pivotability region in a cross-scanning direction than in a scanning direction (Para 120). As per Claims 16 and 17, Hauf in view of Böhme teaches an apparatus, comprising: an illumination optical unit (Hauf fig. 1, Para 98-104, an illumination optical unit 4), comprising: a field facet mirror 13 comprising a plurality of field facets; and a pupil facet mirror 14 comprising a plurality of individual mirrors; a radiation source 3 configured to generate illumination radiation; and a projection optical unit 7, wherein: the field facets are imageable into an object field of the projection optical unit; each individual mirror of the pupil facet is an individual mirror according to claim 1; and the projection optical unit is configured to image the object field into an image field of the projection optical unit; and the apparatus is a microlithographic projection exposure apparatus (Para 98-104). As per Claim 18, Hauf in view of Böhme teaches a method, comprising: providing a pupil facet mirror comprising a plurality of individual mirrors, each individual mirror of the pupil facet is an individual mirror according to claim 1; pivoting an individual mirror at a constant pivoting speed; ascertaining a profile of a counter-electromotive force; ascertaining a jump site in the profile of the counter-electromotive force; and ascertaining a calibration support point via a current value at the jump site (Böhme Para 4). As per Claim 19, Hauf in view of Böhme teaches the method of claim 18. Hauf further disclosed comprising ascertaining two calibration support points for each pivoting degree of freedom, and using this information to ascertain offset and/or gain corrections (Para 39 and 49). As per Claim 20, Hauf in view of Böhme teaches the method of claim 18. Hauf further disclosed comprising using a reference position sensor to ascertain a reference signal (Para 51-52). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to MESFIN ASFAW whose telephone number is (571)270-5247. The examiner can normally be reached Monday - Friday 8 am - 4 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Toan Ton can be reached at 571-272-2303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MESFIN T ASFAW/ Primary Examiner, Art Unit 2882
Read full office action

Prosecution Timeline

Feb 26, 2025
Application Filed
Sep 01, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
97%
With Interview (+13.9%)
2y 8m (~1y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 991 resolved cases by this examiner. Grant probability derived from career allowance rate.

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