Prosecution Insights
Last updated: August 16, 2026

Carl Zeiss SMT GmbH

48 pending office actions • 17 art units • 34 examiners • 0 of 48 (0%) have an AI response strategy ready • 77 patents granted in the last 365 days

Portfolio Summary

48
Total Pending OAs
36
Non-Final OAs
11
Final Rejections
1
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 10 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

6
Overdue
0
Due this week
4
Due this month
0
Due in next 60 days
0
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 10 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (6)Due ≤ 30 days (4)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

26
Hard (54%)
20
Medium (42%)
2
Easy (4%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§101 + other5 (10%)
§103 only15 (31%)
§102 only5 (10%)
§112 only2 (4%)
Multi-statute (no §101)21 (44%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

10
Life Sciences
21% of docket
0
Information Tech
0% of docket
3
Communications
6% of docket
18
Semiconductors
38% of docket
0
Mechanical / Eng
0% of docket
17
Business / Other
35% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

480 h
Manual time on pending OAs
96 h
Time saved (low, 20%)
168 h
Time saved (mid, 35%)
4.2 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
WHITESELL, STEVEN H 8 81.9% +12.9%
RIDDLE, CHRISTINA A 4 80.8% +13.8%
ASFAW, MESFIN T 3 82.8% +14.0%
NGUYEN, HUNG 2 90.8% +8.9%
MCCORMACK, JASON L 2 84.6% +7.9%
PERSAUD, DEORAM 1 76.8% +11.8%
NGUYEN, SANG H 1 88.6% +11.8%
AYUB, HINA F 1 84.7% +17.6%
DUDEK, JAMES A 1 82.1% +3.1%
BAGHDASARYAN, HOVHANNES 1 77.6% +16.7%

Quick Wins (13)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18775344 METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE ASFAW, MESFIN T 32d overdue
18503693 HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT WHITESELL, STEVEN H 8d overdue
18895292 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS WHITESELL, STEVEN H 5d overdue
18362630 METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY WHITESELL, STEVEN H 29d
19082444 METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM WHITESELL, STEVEN H
19076000 HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE WITH A POLYGONAL BORDER AND HAVING A CYLINDRICAL SUBSTRATE BODY RIDDLE, CHRISTINA A
19073220 MICROELECTROMECHANICAL DEVICE WHITESELL, STEVEN H
19034100 OPTICAL SYSTEM, LITHOGRAPHY MACHINE HAVING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN OPTICAL SYSTEM ASFAW, MESFIN T

Hard Cases (26)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18319617 METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY CARRUTH, JENNIFER DOAK 58d overdue
18367208 Mesh Integrity Check CARLSON, JOSHUA MICHAEL 23d overdue
18456304 GAS INJECTION SUBSYSTEM FOR USE IN AN INSPECTION SYSTEM TO INSPECT A SAMPLE BY USE OF CHARGED PARTICLES AND INSPECTION SYSTEM HAVING SUCH GAS INJECTION SUBSYSTEM CHOI, JAMES J 16d overdue
18899247 CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD WHITESELL, STEVEN H 16d
18419940 APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD MCCORMACK, JASON L 20d
19011435 MIRROR FOR A PROJECTION EXPOSURE APPARATUS RIDDLE, CHRISTINA A
19000922 MEASURING ASSEMBLY FOR DETECTING A DISTANCE BETWEEN TWO ELEMENTS, DISTANCE MEASURING DEVICE, OPTICAL MEASURING SYSTEM AND METHOD NGUYEN, SANG H
18999071 EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS NGUYEN, HUNG

Interview Candidates (19)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18775344 METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE ASFAW, MESFIN T 32d overdue
18503693 HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT WHITESELL, STEVEN H 8d overdue
18895292 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS WHITESELL, STEVEN H 5d overdue
18899247 CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD WHITESELL, STEVEN H 16d
18362630 METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY WHITESELL, STEVEN H 29d
19082444 METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM WHITESELL, STEVEN H
19076000 HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE WITH A POLYGONAL BORDER AND HAVING A CYLINDRICAL SUBSTRATE BODY RIDDLE, CHRISTINA A
19073220 MICROELECTROMECHANICAL DEVICE WHITESELL, STEVEN H

Top Art Units

Art UnitApps
1759 6
2881 5
2882 3
2871 3
2877 2
1713 1
2674 1
2858 1
2857 1
2878 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
19082444 METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM WHITESELL, STEVEN H §103 Non-Final OA Pending Mar 18, 2025
19076000 HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE WITH A POLYGONAL BORDER AND HAVING A CYLINDRICAL SUBSTRATE BODY RIDDLE, CHRISTINA A §102 Non-Final OA Pending Mar 11, 2025
19073220 MICROELECTROMECHANICAL DEVICE WHITESELL, STEVEN H §103 Non-Final OA Pending Mar 07, 2025
19046226 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS PERSAUD, DEORAM §103 Non-Final OA Pending Feb 05, 2025
19034100 OPTICAL SYSTEM, LITHOGRAPHY MACHINE HAVING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN OPTICAL SYSTEM ASFAW, MESFIN T §103 Non-Final OA Pending Jan 22, 2025
19017878 FACET MIRROR ASSEMBLY ASFAW, MESFIN T §102 Non-Final OA Pending Jan 13, 2025
19012047 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY NGUYEN, HUNG §103 Non-Final OA Pending Jan 07, 2025
19011435 MIRROR FOR A PROJECTION EXPOSURE APPARATUS RIDDLE, CHRISTINA A §103§112 Non-Final OA Pending Jan 06, 2025
19000922 MEASURING ASSEMBLY FOR DETECTING A DISTANCE BETWEEN TWO ELEMENTS, DISTANCE MEASURING DEVICE, OPTICAL MEASURING SYSTEM AND METHOD NGUYEN, SANG H §102§103 Non-Final OA Pending Dec 24, 2024
18999071 EUV COLLECTOR FOR AN EUV PROJECTION EXPOSURE APPARATUS NGUYEN, HUNG §103§112 Non-Final OA Pending Dec 23, 2024
18988581 IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD RIDDLE, CHRISTINA A §102§103§112 Non-Final OA Pending Dec 19, 2024
18935796 METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING LIGHT REFLECTIVITY AND AN EFFECT OF A POLARIZATION OF MEASURING LIGHT ON A MEASURING LIGHT IMPINGEMENT ON A LITHOGRAPHY MASK AYUB, HINA F 2877 §112 Final Rejection Pending Nov 04, 2024
18903521 REFLECTIVE OPTICAL ELEMENT FOR A WAVELENGTH IN THE EXTREME ULTRAVIOLET WAVELENGTH RANGE DUDEK, JAMES A §102 Non-Final OA Pending Oct 01, 2024
18901513 DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS WHITESELL, STEVEN H 1759 §102§103§112 Non-Final OA Pending Sep 30, 2024
18899247 CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD WHITESELL, STEVEN H 1759 §101§103§112 Non-Final OA 16d Pending Sep 27, 2024
18895292 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS WHITESELL, STEVEN H 1759 §112 Final Rejection 5d overdue Pending Sep 24, 2024
18829619 OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL SURFACE OF AN OPTICAL ELEMENT, AND LITHOGRAPHY SYSTEM BAGHDASARYAN, HOVHANNES §103 Non-Final OA Pending Sep 10, 2024
18807439 METHOD FOR MACHINING A WORKPIECE GATES, BRADFORD M 1713 §102§103§112 Non-Final OA Pending Aug 16, 2024
18802115 COMPUTER IMPLEMENTED METHOD FOR DEFECT DETECTION IN IMAGING DATASETS OF A PORTION OF AN OBJECT COMPRISING INTEGRATED CIRCUIT PATTERNS AND CORRESPONDING COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM AND SYSTEM ROBERTS, RACHEL L 2674 §101§102§103§112 Non-Final OA Pending Aug 13, 2024
18795411 METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INVESTIGATION DEVICE TO PERFORM SUCH METHOD KIM, ROBERT H §102§103 Non-Final OA Pending Aug 06, 2024
18792766 METHOD FOR IMAGE ENHANCEMENT IN AN IMAGING DATASET OF AN OBJECT COMPRISING INTEGRATED CIRCUIT PATTERNS AND CORRESPONDING COMPUTER PROGRAM, COMPUTER-READABLE MEDIUM AND SYSTEM THOMAS, SOUMYA §101§103 Non-Final OA Pending Aug 02, 2024
18792737 COMPUTER IMPLEMENTED METHOD FOR DEFECT DETECTION IN AN OBJECT COMPRISING INTEGRATED CIRCUIT PATTERNS AND CORRESPONDING COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM AND SYSTEM PHAM, ANNIE §101§102§103§112 Non-Final OA Pending Aug 02, 2024
18775344 METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE ASFAW, MESFIN T 2882 §102 Final Rejection 32d overdue Pending Jul 17, 2024
18741925 METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, MIRROR, EUV LITHOGRAPHY SYSTEM, FLUID FEED APPARATUS AND METHOD FOR FEEDING A FLUID KIM, PETER B 2882 §102§103 Non-Final OA Pending Jun 13, 2024
18674144 COMPENSATION RASTER SCANNING MCCORMACK, JASON L §102§103§112 Non-Final OA Pending May 24, 2024
18666211 METHOD, OPTICAL SYSTEM, TEST DEVICE AND ARRANGEMENT MILLER, DANIEL R 2858 §102§103 Final Rejection Pending May 16, 2024
18661793 ELECTRON MICROSCOPE FOR EXAMINING A SPECIMEN EINHORN, MICA JILLIAN 2881 §102§103§112 Non-Final OA Pending May 13, 2024
18638890 MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY WHITESELL, STEVEN H 1759 §103 Non-Final OA Pending Apr 18, 2024
18639028 MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY WANG, JING 2881 §103 Final Rejection Pending Apr 18, 2024
18612175 OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS MERLIN, JESSICA M 2871 §103 Non-Final OA Pending Mar 21, 2024
18612515 APPARATUS AND METHOD FOR ANALYZING AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS WITH THE AID OF A TRANSFORMATION MODEL DINH, LYNDA 2857 §101§103§112 Non-Final OA Pending Mar 21, 2024
18419940 APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD MCCORMACK, JASON L 2881 §102§103 Final Rejection 20d Pending Jan 23, 2024
18503693 HEATING ARRANGEMENT AND METHOD FOR HEATING AN OPTICAL ELEMENT WHITESELL, STEVEN H 1759 §103 Final Rejection 8d overdue Pending Nov 07, 2023
18480263 ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS RIDDLE, CHRISTINA A 2882 §102§103 Non-Final OA Pending Oct 03, 2023
18367208 Mesh Integrity Check CARLSON, JOSHUA MICHAEL 2877 §103§112 Non-Final OA 23d overdue Pending Sep 12, 2023
18456304 GAS INJECTION SUBSYSTEM FOR USE IN AN INSPECTION SYSTEM TO INSPECT A SAMPLE BY USE OF CHARGED PARTICLES AND INSPECTION SYSTEM HAVING SUCH GAS INJECTION SUBSYSTEM CHOI, JAMES J 2878 §102§103§112 Non-Final OA 16d overdue Pending Aug 25, 2023
18456309 ION BEAM INSPECTION AND REPAIR WITH INCREASED SECONDARY ELECTRON YIELD GHYKA, ALEXANDER G 2812 §103§112 Non-Final OA Pending Aug 25, 2023
18362630 METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY WHITESELL, STEVEN H 1759 §103 Final Rejection 29d Pending Jul 31, 2023
18350522 OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY GASSEN, CHRISTOPHER J 2881 §103 Non-Final OA 12d Pending Jul 11, 2023
18319617 METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY CARRUTH, JENNIFER DOAK 2871 §102§103 Non-Final OA 58d overdue Pending May 18, 2023
18124171 METHOD AND APPARATUS FOR MASK REPAIR ANGEBRANNDT, MARTIN J 1737 §102§103 Non-Final OA Pending Mar 21, 2023
18098215 METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A SAMPLE STAGE WHICH IS DISPLACEABLE ALONG AT LEAST ONE AXIS AND ROTATABLE ABOUT AT LEAST ONE AXIS OSENBAUGH-STEWART, ELIZA W 2881 §103§112 Non-Final OA Pending Jan 18, 2023
18090067 OPTICAL ELEMENT FOR THE VUV WAVELENGTH RANGE, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING AN OPTICAL ELEMENT AHVAZI, BIJAN 1763 §103 Non-Final OA Pending Dec 28, 2022
17981798 METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE, AND REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE DILLON, DANIEL P 1783 §103 Final Rejection Pending Nov 07, 2022
17836367 OPTICAL ELEMENT HAVING A PROTECTIVE COATING, METHOD FOR THE PRODUCTION THEREOF AND OPTICAL ARRANGEMENT MEDICH, ANGELA MARGOT 2871 §103§112 Final Rejection Pending Jun 09, 2022
17742733 METHOD FOR DETERMINING A REGISTRATION ERROR RODGERS, ALEXANDER JOHN 2661 §102Other Non-Final OA Pending May 12, 2022
17685432 MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY PASKO, NICHOLAS R 2896 §103§112 Final Rejection Pending Mar 03, 2022
17540976 CROSS SECTION IMAGING WITH IMPROVED 3D VOLUME IMAGE RECONSTRUCTION ACCURACY PARK, CHAN S 2669 §103 Non-Final OA Pending Dec 02, 2021

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