Prosecution Insights
Prosecution Insights
Technology area: Semiconductors, Circuits & Optics
53 pending office actions • 16 art units • 36 examiners • 0 of 53 (0%) have an AI response strategy ready • 74 patents granted in the last 365 days
Carl Zeiss SMT GmbH is currently managing 53 pending office actions within the Semiconductors, Circuits & Optics technology area. These matters are assigned to 36 distinct examiners, showing a level of concentration among the reviewing staff. The prosecution activity is spread across 16 distinct art units, which indicates a variety of technical subject matter within the Semiconductors, Circuits & Optics sector. This breadth across 16 distinct art units requires an approach that accounts for different procedural norms.
WHITESELL, STEVEN H is the busiest examiner for the company, overseeing 6 of the 53 pending actions. This concentration of 6 actions with a single examiner is a specific feature compared to the 36 distinct examiners involved overall. While WHITESELL, STEVEN H is a primary point of contact, the remaining actions are distributed among the other distinct examiners. Practitioners must manage 53 pending office actions while addressing the feedback from 36 distinct examiners.
Based on the USPTO statutory response window for each pending office action. 9 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 9 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 + other | 5 (9%) |
| §103 only | 16 (30%) |
| §102 only | 3 (6%) |
| §112 only | 2 (4%) |
| Multi-statute (no §101) | 27 (51%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| WHITESELL, STEVEN H | 7 | 81.9% | +12.9% |
| RIDDLE, CHRISTINA A | 4 | 81.0% | +13.9% |
| ASFAW, MESFIN T | 3 | 83.0% | +13.9% |
| KIM, PETER B | 3 | 83.0% | +9.5% |
| NGUYEN, HUNG | 2 | 90.7% | +9.0% |
| MCCORMACK, JASON L | 2 | 84.6% | +8.1% |
| CARLSON, JOSHUA MICHAEL | 2 | 59.1% | +39.5% |
| CARRUTH, JENNIFER DOAK | 2 | 77.3% | +15.5% |
| TSWEI, YU-JANG | 1 | 83.6% | +16.0% |
| HO, ALLEN C | 1 | 86.9% | +17.6% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | WHITESELL, STEVEN H | 5d overdue |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | WHITESELL, STEVEN H | 29d |
| 19073220 | MICROELECTROMECHANICAL DEVICE | WHITESELL, STEVEN H | — |
| 19063773 | INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS | ASFAW, MESFIN T | — |
| 19018304 | LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER | WHITESELL, STEVEN H | — |
| 19015842 | X-RAY IMAGING SYSTEM | HO, ALLEN C | — |
| 18984649 | IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD | NGUYEN, HUNG | — |
| 18638890 | MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | WHITESELL, STEVEN H | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18319617 | METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY | CARRUTH, JENNIFER DOAK | 58d overdue |
| 18419940 | APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD | MCCORMACK, JASON L | 20d |
| 19170404 | MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD OF PROCESSING A MIRROR | RIDDLE, CHRISTINA A | — |
| 19171128 | METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT | RIDDLE, CHRISTINA A | — |
| 19095316 | COMPUTER IMPLEMENTED METHOD, COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM PRODUCT AND CORRESPONDING SYSTEMS FOR THE PREDICTION OF DEFECTS IN WAFERS AND FOR OFFLINE WAFER-LESS PROCESS WINDOW QUALIFICATION | TSWEI, YU-JANG | — |
| 19082444 | METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM | WHITESELL, STEVEN H | — |
| 19082944 | OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM COMPRISING SAME AND PROJECTION EXPOSURE SYSTEM COMPRISING THE OPTICAL ELEMENT AND/OR THE OPTICAL SYSTEM | RIDDLE, CHRISTINA A | — |
| 19068695 | ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMINATING A RETICLE, AND LITHOGRAPHY SYSTEM | ASFAW, MESFIN T | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18319617 | METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY | CARRUTH, JENNIFER DOAK | 58d overdue |
| 18587228 | METHOD AND MEASURING DEVICE FOR INSPECTING PHOTOMASKS, AND EUV CAMERA | CARLSON, JOSHUA MICHAEL | 24d overdue |
| 18367208 | Mesh Integrity Check | CARLSON, JOSHUA MICHAEL | 23d overdue |
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | WHITESELL, STEVEN H | 5d overdue |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | WHITESELL, STEVEN H | 29d |
| 19170404 | MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD OF PROCESSING A MIRROR | RIDDLE, CHRISTINA A | — |
| 19171128 | METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT | RIDDLE, CHRISTINA A | — |
| 19095316 | COMPUTER IMPLEMENTED METHOD, COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM PRODUCT AND CORRESPONDING SYSTEMS FOR THE PREDICTION OF DEFECTS IN WAFERS AND FOR OFFLINE WAFER-LESS PROCESS WINDOW QUALIFICATION | TSWEI, YU-JANG | — |
| Art Unit | Apps |
|---|---|
| 2877 | 5 |
| 2881 | 5 |
| 2882 | 4 |
| 1759 | 4 |
| 2871 | 4 |
| 2884 | 1 |
| 1713 | 1 |
| 2858 | 1 |
| 2878 | 1 |
| 2857 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19170404 | MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD OF PROCESSING A MIRROR | RIDDLE, CHRISTINA A | — | §103§112 | Non-Final OA | — | Pending | Apr 04, 2025 |
| 19171128 | METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT | RIDDLE, CHRISTINA A | — | §102§103§112 | Non-Final OA | — | Pending | Apr 04, 2025 |
| 19095316 | COMPUTER IMPLEMENTED METHOD, COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM PRODUCT AND CORRESPONDING SYSTEMS FOR THE PREDICTION OF DEFECTS IN WAFERS AND FOR OFFLINE WAFER-LESS PROCESS WINDOW QUALIFICATION | TSWEI, YU-JANG | — | §101§103 | Non-Final OA | — | Pending | Mar 31, 2025 |
| 19082444 | METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM | WHITESELL, STEVEN H | — | §102§103 | Non-Final OA | — | Pending | Mar 18, 2025 |
| 19082944 | OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM COMPRISING SAME AND PROJECTION EXPOSURE SYSTEM COMPRISING THE OPTICAL ELEMENT AND/OR THE OPTICAL SYSTEM | RIDDLE, CHRISTINA A | — | §103§112 | Non-Final OA | — | Pending | Mar 18, 2025 |
| 19073220 | MICROELECTROMECHANICAL DEVICE | WHITESELL, STEVEN H | — | §103 | Non-Final OA | — | Pending | Mar 07, 2025 |
| 19068695 | ILLUMINATION SYSTEM, RADIATION SOURCE APPARATUS, METHOD FOR ILLUMINATING A RETICLE, AND LITHOGRAPHY SYSTEM | ASFAW, MESFIN T | — | §102§103 | Non-Final OA | — | Pending | Mar 03, 2025 |
| 19063773 | INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS | ASFAW, MESFIN T | — | §103 | Non-Final OA | — | Pending | Feb 26, 2025 |
| 19059808 | INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, METHOD FOR PRODUCING AN INTERMEDIATE PRODUCT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT | NGUYEN, HUNG | — | §102§103 | Non-Final OA | — | Pending | Feb 21, 2025 |
| 19034100 | OPTICAL SYSTEM, LITHOGRAPHY MACHINE HAVING AN OPTICAL SYSTEM, AND METHOD FOR PRODUCING AN OPTICAL SYSTEM | ASFAW, MESFIN T | — | §102§103 | Non-Final OA | — | Pending | Jan 22, 2025 |
| 19018304 | LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS DESIGNED FOR OPERATION IN THE DUV, AND METHOD AND ARRANGEMENT FOR FORMING AN ANTIREFLECTION LAYER | WHITESELL, STEVEN H | — | §103 | Non-Final OA | — | Pending | Jan 13, 2025 |
| 19015842 | X-RAY IMAGING SYSTEM | HO, ALLEN C | 2884 | §102 | Non-Final OA | — | Pending | Jan 10, 2025 |
| 19008383 | APPARATUS AND METHOD FOR PROVIDING SENSOR DATA OF AN OPTICAL SYSTEM, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM | PERSAUD, DEORAM | — | §102§103 | Non-Final OA | — | Pending | Jan 02, 2025 |
| 19000922 | MEASURING ASSEMBLY FOR DETECTING A DISTANCE BETWEEN TWO ELEMENTS, DISTANCE MEASURING DEVICE, OPTICAL MEASURING SYSTEM AND METHOD | NGUYEN, SANG H | — | §102§103 | Non-Final OA | — | Pending | Dec 24, 2024 |
| 18984649 | IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD | NGUYEN, HUNG | — | §103 | Non-Final OA | — | Pending | Dec 17, 2024 |
| 18971089 | COMPUTER IMPLEMENTED METHOD FOR GENERATING AN AERIAL IMAGE OF A PHOTOLITHOGRAPHY MASK USING A MACHINE LEARNING MODEL | BAYAT, ALI | — | §101§103§112 | Non-Final OA | — | Pending | Dec 06, 2024 |
| 18948801 | CATADIOPTRIC PROJECTION OBJECTIVE, PROJECTION ILLUMINATION SYSTEM AND PROJECTION ILLUMINATION METHOD | KIM, PETER B | 2882 | §102§112Other | Non-Final OA | — | Pending | Nov 15, 2024 |
| 18935796 | METHOD FOR MEASURING AN EFFECT OF A WAVELENGTH-DEPENDENT MEASURING LIGHT REFLECTIVITY AND AN EFFECT OF A POLARIZATION OF MEASURING LIGHT ON A MEASURING LIGHT IMPINGEMENT ON A LITHOGRAPHY MASK | AYUB, HINA F | 2877 | §112 | Final Rejection | — | Pending | Nov 04, 2024 |
| 18920238 | METHOD FOR MEASURING THE ILLUMINATION PUPIL IN A SCANNER TAKING INTO ACCOUNT A MEASUREMENT RETICLE | KIM, PETER B | 2882 | §102§112 | Final Rejection | — | Pending | Oct 18, 2024 |
| 18901513 | DEVICE AND METHOD FOR ALIGNING TWO COMPONENTS | WHITESELL, STEVEN H | 1759 | §102§103§112 | Non-Final OA | — | Pending | Sep 30, 2024 |
| 18897888 | BEAM ANGLE ROTATION AND SAMPLE ROTATION | KALISZEWSKI, ALINA ROSE | — | §102§103§112 | Non-Final OA | — | Pending | Sep 26, 2024 |
| 18895292 | DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS | WHITESELL, STEVEN H | 1759 | §112 | Final Rejection | 5d overdue | Pending | Sep 24, 2024 |
| 18807439 | METHOD FOR MACHINING A WORKPIECE | GATES, BRADFORD M | 1713 | §102§103§112 | Non-Final OA | — | Pending | Aug 16, 2024 |
| 18792737 | COMPUTER IMPLEMENTED METHOD FOR DEFECT DETECTION IN AN OBJECT COMPRISING INTEGRATED CIRCUIT PATTERNS AND CORRESPONDING COMPUTER-READABLE MEDIUM, COMPUTER PROGRAM AND SYSTEM | PHAM, ANNIE | — | §101§102§103§112 | Non-Final OA | — | Pending | Aug 02, 2024 |
| 18778483 | INFEROMETRIC MEASURING APPARATUS | SCHNASE, PAUL DANIEL | 2877 | §103 | Final Rejection | 12d | Pending | Jul 19, 2024 |
| 18741925 | METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, MIRROR, EUV LITHOGRAPHY SYSTEM, FLUID FEED APPARATUS AND METHOD FOR FEEDING A FLUID | KIM, PETER B | 2882 | §102§103 | Non-Final OA | — | Pending | Jun 13, 2024 |
| 18674144 | COMPENSATION RASTER SCANNING | MCCORMACK, JASON L | — | §102§103§112 | Non-Final OA | — | Pending | May 24, 2024 |
| 18666211 | METHOD, OPTICAL SYSTEM, TEST DEVICE AND ARRANGEMENT | MILLER, DANIEL R | 2858 | §103§112 | Non-Final OA | — | Pending | May 16, 2024 |
| 18648644 | OPTICAL SYSTEM FOR A METROLOGY SYSTEM AND METROLOGY SYSTEM WITH SUCH AN OPTICAL SYSTEM | MENDOZA, ALEXANDRIA ARELLANO | 2877 | §103 | Non-Final OA | 12d | Pending | Apr 29, 2024 |
| 18639028 | MEASUREMENT APPARATUS AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | WANG, JING | 2881 | §103 | Final Rejection | — | Pending | Apr 18, 2024 |
| 18638890 | MEASURING DEVICE AND METHOD FOR INSPECTING PHOTOMASKS INTENDED FOR EUV MICROLITHOGRAPHY | WHITESELL, STEVEN H | 1759 | §103 | Non-Final OA | — | Pending | Apr 18, 2024 |
| 18631733 | HIGH RESOLUTION, LOW ENERGY ELECTRON MICROSCOPE FOR PROVIDING TOPOGRAPHY INFORMATION AND METHOD OF MASK INSPECTION | SMYTH, ANDREW P | 2878 | §103§112 | Non-Final OA | — | Pending | Apr 10, 2024 |
| 18612515 | APPARATUS AND METHOD FOR ANALYZING AN ELEMENT OF A PHOTOLITHOGRAPHY PROCESS WITH THE AID OF A TRANSFORMATION MODEL | DINH, LYNDA | 2857 | §101§103§112 | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18612175 | OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS | MERLIN, JESSICA M | 2871 | §103 | Non-Final OA | — | Pending | Mar 21, 2024 |
| 18587228 | METHOD AND MEASURING DEVICE FOR INSPECTING PHOTOMASKS, AND EUV CAMERA | CARLSON, JOSHUA MICHAEL | 2877 | §103Other | Final Rejection | 24d overdue | Pending | Feb 26, 2024 |
| 18422302 | METHOD FOR EXAMINING SAMPLES PERTAINING TO MICROLITHOGRAPHY | NGUYEN, LEON VIET Q | — | §103 | Non-Final OA | — | Pending | Jan 25, 2024 |
| 18419940 | APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD | MCCORMACK, JASON L | 2881 | §102§103 | Final Rejection | 20d | Pending | Jan 23, 2024 |
| 18519993 | METHODS, SYSTEMS, COMPUTER PROGRAMS AND COMPUTER-READABLE MEDIA FOR AUTOMATICALLY DESIGNING A WORKFLOW TO PERFORM A SEMICONDUCTOR INSPECTION TASK | WALTON, CHESIREE A | 3624 | §101§103 | Non-Final OA | — | Pending | Nov 27, 2023 |
| 18387905 | METHOD AND APPARATUS FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK | GARBOWSKI, LEIGH M | — | §102 | Non-Final OA | — | Pending | Nov 08, 2023 |
| 18480263 | ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS | RIDDLE, CHRISTINA A | 2882 | §102§103 | Non-Final OA | — | Pending | Oct 03, 2023 |
| 18367208 | Mesh Integrity Check | CARLSON, JOSHUA MICHAEL | 2877 | §103 | Non-Final OA | 23d overdue | Pending | Sep 12, 2023 |
| 18460760 | Support Device for One or More MEMS Components | MCDONALD, JASON ANDREW | 2898 | §103 | Final Rejection | — | Pending | Sep 05, 2023 |
| 18456309 | ION BEAM INSPECTION AND REPAIR WITH INCREASED SECONDARY ELECTRON YIELD | GHYKA, ALEXANDER G | 2812 | §103§112 | Non-Final OA | — | Pending | Aug 25, 2023 |
| 18362630 | METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY | WHITESELL, STEVEN H | 1759 | §103 | Final Rejection | 29d | Pending | Jul 31, 2023 |
| 18350522 | OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY | GASSEN, CHRISTOPHER J | 2881 | §103 | Non-Final OA | 12d | Pending | Jul 11, 2023 |
| 18319617 | METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY, AND MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICONDUCTOR LITHOGRAPHY | CARRUTH, JENNIFER DOAK | 2871 | §102§103 | Final Rejection | 58d overdue | Pending | May 18, 2023 |
| 18124171 | METHOD AND APPARATUS FOR MASK REPAIR | ANGEBRANNDT, MARTIN J | 1737 | §102§103 | Non-Final OA | — | Pending | Mar 21, 2023 |
| 18121722 | APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD | LOGIE, MICHAEL J | 2881 | §102 | Final Rejection | — | Pending | Mar 15, 2023 |
| 18098215 | METHOD AND DEVICE FOR DETERMINING AN ALIGNMENT OF A PHOTOMASK ON A SAMPLE STAGE WHICH IS DISPLACEABLE ALONG AT LEAST ONE AXIS AND ROTATABLE ABOUT AT LEAST ONE AXIS | OSENBAUGH-STEWART, ELIZA W | 2881 | §102§103 | Non-Final OA | — | Pending | Jan 18, 2023 |
| 17836367 | OPTICAL ELEMENT HAVING A PROTECTIVE COATING, METHOD FOR THE PRODUCTION THEREOF AND OPTICAL ARRANGEMENT | MEDICH, ANGELA MARGOT | 2871 | §103§112 | Final Rejection | — | Pending | Jun 09, 2022 |
| 17742733 | METHOD FOR DETERMINING A REGISTRATION ERROR | RODGERS, ALEXANDER JOHN | 2661 | §102§103§112 | Non-Final OA | — | Pending | May 12, 2022 |
| 17685432 | MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY | PASKO, NICHOLAS R | 2896 | §103§112 | Final Rejection | — | Pending | Mar 03, 2022 |
| 17162439 | SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR | CARRUTH, JENNIFER DOAK | 2871 | §103 | Final Rejection | — | Pending | Jan 29, 2021 |
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