Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
DETAILED ACTION
Claims 1-10 are pending in this application, which is a CON of PCT/JP2023/040168.
Election/Restrictions
Applicant’s election without traverse of claims 1-9 in the reply filed on 09/03/2026 is acknowledged.
Claim 10 is withdrawn from consideration a being directed to a nonelected invention.
Specification
The title of the invention is not descriptive. A new title is required that is clearly indicative of the invention to which the claims are directed.
It is noted that the claimed invention is directed solely to a method. The examiner suggests amending the title to reflect same.
Claim Rejections - 35 USC § 112
The following is a quotation of 35 U.S.C. 112(b):
(b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph:
The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention.
Claims 1-9 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention.
In claim 1 lines 7-8, from which claims 2-8 depend, the phrase “removing a carbon film on the first insulating film” is deemed confusing as to what it is referring to as a carbon film was never previously mentioned. Is this the same as the graphene film? Clarification is requested.
In claim 3 line 3, the term “low-k” is deemed a relative term. The term “low” is a relative term which renders the claim indefinite. The term “low” is not defined by the claim, the specification does not provide a standard for ascertaining the requisite degree, and one of ordinary skill in the art would not be reasonably apprised of the scope of the invention. The same issue applies to claim 4.
In independent claim 9, the phrase “forming the second insulating film on the first insulating film, using, as a mask, the graphene film and the carbon nanowall” is deemed confusing as to how the graphene film is used as a mask. In the previous step, the graphene film is formed on the metal film, which means nothing is on the first insulating film. If that’s true, then how is the graphene film used as a mask for the first insulating film? Clarification is requested.
Allowable Subject Matter
Claims 1-9 are allowed.
In general, it is well known to use selective deposition of a metal on a substrate having a metal and insulator surface as noted in Wilson et al. (4,741,928) and JP4268726. It is also well known to deposit a metal pattern on the insulating portion of the substrate as noted in JP 7-45528.
With respect to insulating layers, it is well known to use selective deposition to form an insulating layer on a substrate as noted in Ramappa et al. (2011/0259408). It is also well known to form an insulating layer on an insulating substrate by selective deposition as noted in Liu et al. (2019/0148144).
With respect to specific materials, it is well known to selectively deposit a chalcogenide film by atomic layer deposition onto a substrate having a conductive metal layer and an insulating layer as noted in KR 10-2021-0019333. It is also well known to selectively deposit graphene onto a metal layer relative to a dielectric layer of a semiconductor substrate as noted in WO 2021/262527.
With respect to etching, it is well known to selectively deposit an insulating layer using a plasma in an isolative groove and etching the graphene as noted in CN 114582907. However, the references fail to teach or suggest forming a graphene film and a carbon nanowall from the graphene film and removing a carbon film and oxygen defects.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to BRET CHEN whose telephone number is (571)272-1417. The examiner can normally be reached M-F 8:30-8:30 MT.
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If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at (571) 272-5166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
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/BRET P CHEN/Primary Examiner, Art Unit 1718 09/15/2026
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