Prosecution Insights
Last updated: April 19, 2026
Application No. 19/214,066

COWOS IC STRUCTURE WITH EDGE-PAD SEMICONDUCTOR DIE

Final Rejection §103
Filed
May 21, 2025
Examiner
ZARNEKE, DAVID A
Art Unit
2891
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Etron Technology Inc.
OA Round
2 (Final)
71%
Grant Probability
Favorable
3-4
OA Rounds
2y 8m
To Grant
82%
With Interview

Examiner Intelligence

Grants 71% — above average
71%
Career Allow Rate
566 granted / 801 resolved
+2.7% vs TC avg
Moderate +11% lift
Without
With
+10.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
34 currently pending
Career history
835
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
59.3%
+19.3% vs TC avg
§102
24.5%
-15.5% vs TC avg
§112
7.2%
-32.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 801 resolved cases

Office Action

§103
DETAILED ACTION Response to Arguments Applicant’s arguments, see the claim amendments filed 1/5/26, with respect to the rejection(s) of the claim(s) have been fully considered and are persuasive. Therefore, the rejection has been withdrawn. However, upon further consideration, a new ground(s) of rejection is made below. Claim Rejections - 35 USC § 103 The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claim(s) 1, and 5-14 is/are rejected under 35 U.S.C. 103 as being unpatentable over Tao et al., US 20180040587, in view of Applicant’s Admitted Prior Art (AAPA). Regarding claim 1, Tao (figures 13 & 17) teaches an IC structure comprising: a memory stack comprising: a plurality of semiconductor dies 106 horizontally separate with each other, wherein each semiconductor die 106 comprises a primary redistribution layer (RDL) 902, a top surface, a bottom surface opposite to the top surface, and four sidewalls with a first sidewall, a second sidewall, a third sidewall and a fourth sidewall, and a plurality of first edge pads 904 arranged along the first sidewall and exposed from the primary RDL 902, wherein the area of the bottom surface or the top surface of each semiconductor die 106 is larger than that of any sidewall; a memory controlling chip 1502 under and electrically connected (through 102) to the plurality of first edge pads 904 of each semiconductor die 106, wherein the first sidewall of each semiconductor die 106 faces the memory controlling chip 1502, and power and/or data signals of each semiconductor die 106 are propagated to the memory controlling chip 1502 without through other semiconductor dies 106. Tao fails to teach an interposer under and electrically connected to the memory controller controlling chip; a logic processor chip electrically connected to the memory controller controlling chip; and a packaging substrate under and electrically connected to the interposer. AAPA teaches an interposer 23 under and electrically connected to the memory controlling chip 212; a logic processor chip 22 electrically connected to the memory controlling chip 212; and a packaging substrate 24 under and electrically connected to the interposer 23. It would have been obvious to one of ordinary skill in the art at the time of the invention to use the configuration of AAPA in the invention of Tao because AAPA teaches a conventionally known and used package. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). With respect to claim 5, though Tao fails to teach each semiconductor die is a DRAM die and includes data output between 128~2048 bits, it would have been obvious to one ordinary skill in the art at the time of the invention to optimize the data output through routine experimentation (MPEP 2144.05). As to claim 6, Tao (figure 13) teaches an edge redistribution layer (RDL) 902 having a first interconnect surface and a second interconnect surface opposite to the first interconnect surface, wherein the first interconnect surface covers the plurality of first edge pads 904 of each semiconductor die 106, and though Tao fails to teach the plurality of first edge pads 904 are electrically connected to a plurality of second edge pads at the second interconnect surface it would have been obvious to one of ordinary skill in the art at the time of the invention to use a plurality of second edge pads in the invention of Tao because they are conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). In re claim 7, though Tao fails teach each first edge pad 904 includes a conductive via electrically connected to a signal pad (paragraph 0046) in a back-end-of-line (BEOL) region of each of the semiconductor dies 106 surrounded by a seal ring structure, it would have been obvious to one of ordinary skill in the art at the time of the invention to use this configuration in the invention of Tao because it is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). Concerning claim 8, though Tao fails teach each first edge pad of each semiconductor die includes a conductive line in the primary RDL, the conductive line electrically connected to a signal pad in a back-end-of-line (BEOL) region of the semiconductor die surrounded by a seal ring structure, it would have been obvious to one of ordinary skill in the art at the time of the invention to use this configuration in the invention of Tao because it is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). Pertaining to claim 9, though Tao fails to specifically teach the primary RDL includes a plurality of stacked dielectric layers within which the conductive line is located, it would have been obvious to one of ordinary skill in the art at the time of the invention to use this configuration in the invention of Tao because it is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). In claim 10, though Tao fails to specifically teach a portion of the conductive line is configured to be disposed in a scribe line region (SL) of a semiconductor wafer prior to dicing of the semiconductor wafer, it would have been obvious to one of ordinary skill in the art at the time of the invention to use this configuration in the invention of Tao because it is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). Regarding claim 11, AAPA teaches the logic processor chip 22 is disposed over the interposer 23, and though AAPA fails to teach a heat sink is over the logic processor chip; wherein a top surface of the heat sink is substantially leveled up with that of the memory stack, it would have been obvious to one of ordinary skill in the art at the time of the invention to use a heat sink in the invention of Mongia because a heat sink is conventionally known and used in the prior art. It would be substantially level because AAPA (figure 1) teaches the logic die 22 is level with the memory stack 21. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). With respect to claim 12. (Original) The IC structure of claim 1, wherein the memory stack further comprises an upward extending thermal conductivity layer covering each third sidewall of the plurality of semiconductor dies; wherein the upward extending thermal conductivity layer is thermally coupling to a laterally extending thermal conductivity layer over each second sidewall of the plurality of semiconductor dies, and the thermal conductivity of the upward extending thermal conductivity layer is higher than that of Si or SiO2. Pertaining to claim 13, Tao (figures 13 & 17) teaches an IC structure comprising: a memory stack comprising: a plurality of semiconductor dies 106 horizontally separate with each other, wherein each semiconductor die 106 comprises a primary redistribution layer (RDL) 902, a top surface, a bottom surface opposite to the top surface, and four sidewalls with a first sidewall, a second sidewall, a third sidewall and a fourth sidewall, and a plurality of edge pads 904 arranged along the first sidewall, wherein the area of the bottom surface or the top surface of each semiconductor die 106 is larger than that of any sidewall, wherein each of the plurality of edge pads 904 is revealed from an edge surface of the primary RDL 902; wherein there is no through silicon via (TSV) in each semiconductor die 106; a logic controlling chip 1502 under and electrically connected to the plurality of edge pads 904 (through 102), wherein the first sidewall of each semiconductor die 106 faces the logic controlling chip 1502. Tao fails to teach the plurality of edge pads are extended outside a peripheral region defined by a seal ring structure. It would have been obvious to one of ordinary skill in the art at the time of the invention to use a seal ring structure in the invention of Tao because a seal ring structure is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). Tao fails to teach an interposer under and electrically connected to the logic controlling chip; a logic processor chip electrically connected to the logic controlling chip; and a packaging substrate under and electrically connected to the interposer. AAPA (figure 1) teaches an interposer 23 under and electrically connected to the logic controlling chip 212; a logic processor chip 22 electrically connected to the logic controlling chip 212 and a packaging substrate 24 under and electrically connected to the interposer 23. It would have been obvious to one of ordinary skill in the art at the time of the invention to use the configuration of AAPA in the invention of Tao because AAPA teaches a conventionally known and used package. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). In claim 14, though Tao fails to teach at least part of each edge pad 904 of the plurality of edge pads 904 of each semiconductor die 106 is disposed in a scribe line region of the semiconductor die 106, it would have been obvious to one of ordinary skill in the art at the time of the invention to use a scribe line region in the invention of Tao because a scribe line region is conventionally known and used in the art. The use of conventional materials to perform their known functions is obvious (MPEP 2144.07). Claim(s) 2-4 is/are rejected under 35 U.S.C. 103 as being unpatentable over Tao et al., US 20180040587, in view of Applicant’s Admitted Prior Art (AAPA), as applied to claim 1 above, and further in view of Mongia et al., US 2025/0140741. As to claim 2, Tao fails to teach the memory stack further comprising: a laterally extending thermal conductivity layer covering each second sidewall of the plurality of semiconductor dies; and/or an upward extending thermal conductivity layer attached to the top surface or the bottom surface of a first semiconductor die, wherein the thermal conductivity of the laterally extending thermal conductivity layer or the upward extending thermal conductivity layer is higher than that of Si or SiO2. Mongia (figures 1A-1B &/or 3) teaches the memory stack further comprising: a laterally extending thermal conductivity layer 302 covering each second sidewall of the plurality of semiconductor dies 102 (wherein the set of dies 102 can contain one or more die 1043 (paragraph 0092); and/or an upward extending thermal conductivity layer 110 attached to the top surface or the bottom surface of a first semiconductor die 102, wherein the thermal conductivity of the laterally extending thermal conductivity layer 302 or the upward extending thermal conductivity layer is higher than that of Si or SiO2 (paragraph 0100 teaches 302=Cu & middle of paragraph 0092 teaches 110=SiC & diamond). It would have been obvious to one of ordinary skill in the art at the time of the invention to use the configuration of Mongia in the invention of Tao because Mongia teaches it improves thermal dissipation (paragraph 0030-0034). In re claim 3, Mongia (figure 3) teaches the upward extending thermal conductivity layer 110 is thermally coupling to the laterally extending thermal conductivity layer 302, and the upward extending thermal conductivity layer 110 or the laterally extending thermal conductivity layer 302 comprises SiC, BN, AlN, W, or copper (paragraph 0100 teaches 302-Cu). Concerning claim 4, Mongia (figure 1A-1B) teaches the upward extending thermal conductivity layer 110 is disposed between the first semiconductor die 102 and a second semiconductor die 102, or the upward extending thermal conductivity layer is located at a most lateral sidewall of the memory stack. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DAVID A ZARNEKE whose telephone number is (571)272-1937. The examiner can normally be reached M-F. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Matt Landau can be reached at 571-272-1731. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID A ZARNEKE/ Primary Examiner, Art Unit 2891 1/14/26
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Prosecution Timeline

May 21, 2025
Application Filed
Sep 30, 2025
Examiner Interview (Telephonic)
Oct 01, 2025
Examiner Interview (Telephonic)
Oct 02, 2025
Examiner Interview Summary
Oct 09, 2025
Non-Final Rejection — §103
Jan 05, 2026
Response Filed
Jan 14, 2026
Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
71%
Grant Probability
82%
With Interview (+10.8%)
2y 8m
Median Time to Grant
Moderate
PTA Risk
Based on 801 resolved cases by this examiner. Grant probability derived from career allow rate.

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