Prosecution Insights
Last updated: October 27, 2026
Application No. 19/243,488

PLASMA ENHANCED NUCLEATION LAYER FORMATION

Non-Final OA §102§103§112
Filed
Jun 19, 2025
Priority
Jul 12, 2024 — provisional 63/670,889
Examiner
GAMBETTA, KELLY M
Art Unit
1718
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Applied Materials Inc.
OA Round
1 (Non-Final)
72%
Grant Probability
Favorable
1-2
OA Rounds
1y 8m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 72% — above average
72%
Career Allowance Rate
684 granted / 952 resolved
+6.8% vs TC avg
Strong +33% interview lift
Without
With
+33.0%
Interview Lift
resolved cases with interview
Typical timeline
3y 0m
Avg Prosecution
43 currently pending
Career history
998
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
57.9%
+17.9% vs TC avg
§102
17.7%
-22.3% vs TC avg
§112
18.8%
-21.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 952 resolved cases

Office Action

§102 §103 §112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant's election with traverse of claims 1-10 in the reply filed on 7/21/2026 is acknowledged. The traversal is on the ground(s) that the searches of the method and apparatus would overlap and would not produce an undue burden. This is not found persuasive because the two claim sets have separate classifications in the art and would encompass different search terms and areas. As such, an undue burden exists. Claims 11-20 have been withdrawn as being drawn to a non-elected invention. The requirement is still deemed proper and is therefore made FINAL. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 10 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 10 includes that the flowrate of the precursor gas is constant. However, it does not distinguish this with a time limit. Is the flowrate to be constant throughout the deposition of the nucleation layer, during the pulse length, or during the entire process of claim 1? Clarification in the claims is required. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-4 and 6-10 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Zope et al. (US 2019/0067094 A1). As to claim 1, Zope teaches injecting a molybdenum-containing precursor (MCP) into a processing chamber at a processing temperature less than or equal to 450 degrees Celsius (para 0040, 0061); generating a plasma from a precursor gas that includes hydrogen, or a reduction gas (plasma contains nitrogen gas in para 0083); forming a molybdenum nucleation layer on a substrate within the processing chamber using the plasma and the MCP (para 0083); and depositing a metal containing layer over the molybdenum nucleation layer, wherein the metal containing layer comprises molybdenum (para 0097, Fig. 1). As to claim 2, the molybdenum nucleation layer is formed on a dielectric material formed on a surface of the substrate (Fig. 1, para 0040). As to claim 3, the dielectric vias are filled with the nucleation layer and metal layer in Figs 4A-4B, paras 0093-0097, for example. As to claim 4, the metal containing layer is deposited over the molybdenum nucleation layer using a thermal deposition process at the processing temperature less than or equal to 450 degrees Celsius in para 0098. As to claim 6, a pressure within the processing chamber is in a range of 0.5 to 50 Torr in para 0063. As to claim 7, the substrate may include many of the claimed materials in paras 0046-0049. As to claim 8, the processing temperature is less than or equal to 450 degrees Celsius is greater than or equal to 200 degrees Celsius in para 0061. As to claim 9, the molybdenum precursor is as claimed in para 0031-0033. As to claim 10, the flow rate is as broadly claimed in para 0073. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. This application currently names joint inventors. In considering patentability of the claims the examiner presumes that the subject matter of the various claims was commonly owned as of the effective filing date of the claimed invention(s) absent any evidence to the contrary. Applicant is advised of the obligation under 37 CFR 1.56 to point out the inventor and effective filing dates of each claim that was not commonly owned as of the effective filing date of the later invention in order for the examiner to consider the applicability of 35 U.S.C. 102(b)(2)(C) for any potential 35 U.S.C. 102(a)(2) prior art against the later invention. Claim(s) 5 is/are rejected under 35 U.S.C. 103 as being unpatentable over Zope et al. Claim 5 includes that the plasma be used in the deposition of the nucleation layer and the metal layer. In para 0084, Zope uses a reducing plasma to deposit the nucleation layer. In para 0105-0106, Zope teaches using a reducing plasma to deposit the metal layer. It would have been obvious to one of ordinary skill in the art the use the same plasma in the nucleation and reducing layers given the teaching in Zope as Zope teaches they have the same function. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to KELLY M GAMBETTA whose telephone number is (571)272-2668. The examiner can normally be reached M-F 9-5:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Gordon Baldwin can be reached at 571-272-5166. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. KELLY M. GAMBETTA Primary Examiner Art Unit 1718 /KELLY M GAMBETTA/ Primary Examiner, Art Unit 1718
Read full office action

Prosecution Timeline

Jun 19, 2025
Application Filed
Sep 01, 2026
Non-Final Rejection mailed — §102, §103, §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION
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Patent 12768039
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME
2y 5m to grant Granted Oct 20, 2026
Patent 12760417
ATOMIC LAYER DEPOSITION METHODS FOR MAKING OMNIDIRECTIONAL STRUCTURAL COLOR MULTILAYER STRUCTURES
3y 3m to grant Granted Oct 13, 2026
Patent 12722206
COATED CUTTING TOOL
4y 9m to grant Granted Sep 01, 2026
Patent 12723309
METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE ELEMENT IN A PROCESS CHAMBER AND SUBSEQUENT CLEANING OF THE PROCESS CHAMBER
2y 3m to grant Granted Sep 01, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
72%
Grant Probability
99%
With Interview (+33.0%)
3y 0m (~1y 8m remaining)
Median Time to Grant
Low
PTA Risk
Based on 952 resolved cases by this examiner. Grant probability derived from career allowance rate.

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