Prosecution Insights
Last updated: October 27, 2026

Applied Materials Inc.

Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics

542 pending office actions • 103 art units • 344 examiners • 0 of 542 (0%) have an AI response strategy ready • 897 patents granted in the last 365 days

Analysis

Applied Materials Inc. has 559 pending office actions in Chemistry & Materials. The portfolio spans 350 distinct examiners and 103 distinct art units, reflecting very substantial prosecution activity across a large examiner network and a wide range of technical assignments. The assignment pattern also indicates repeated work within those art units, making technical organization essential.

BENNETT, CHARLEE is the busiest examiner, with 14 pending matters. That concentration warrants dedicated review of recurring issues, interview history, and amendment positions for the relevant cases. It remains only one part of the portfolio, so counsel also needs standardized processes for issue coding, ownership, and response quality across 350 examiner relationships and 103 art-unit assignments.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Portfolio Summary

542
Total Pending OAs
334
Non-Final OAs
186
Final Rejections
22
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 145 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

48
Overdue
4
Due this week
51
Due this month
25
Due in next 60 days
17
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 145 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Overdue (48)Due ≤ 7 days (4)Due ≤ 30 days (51)Due ≤ 60 days (25)Due later (17)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

241
Hard (44%)
278
Medium (51%)
21
Easy (4%)
2
Unknown (0%)

Rejection Statute Mix

BucketCases
§101 only4 (1%)
§101 + other9 (2%)
§103 only245 (45%)
§102 only22 (4%)
§112 only18 (3%)
Double-patenting only3 (1%)
Double-patenting + other11 (2%)
Multi-statute (no §101)228 (42%)
No statute on record2 (0%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

216
Life Sciences
40% of docket
36
Information Tech
7% of docket
6
Communications
1% of docket
207
Semiconductors
38% of docket
62
Mechanical / Eng
11% of docket
15
Business / Other
3% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

5,420 h
Manual time on pending OAs
1,084 h
Time saved (low, 20%)
1,897 h
Time saved (mid, 35%)
47.4 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
BENNETT, CHARLEE 13 58.8% +35.1%
MCDONALD, RODNEY GLENN 8 63.7% +24.3%
ZERVIGON, RUDY 7 66.9% -5.4%
CHEN, KEATH T 7 30.2% +24.7%
REYES, JOSHUA NATHANIEL PI 7 42.3% +50.5%
MOORE, KARLA A 6 43.1% +13.6%
MILLER, JR, JOSEPH ALBERT 6 68.5% +16.2%
KLUNK, MARGARET D 6 44.0% +31.5%
ROLLAND, ALEX A 5 47.7% +27.0%
LUND, JEFFRIE ROBERT 5 60.6% +29.3%

Hard Cases (241)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18360074 METHOD AND SYSTEM FOR AUTOMATIC IHC MARKER-HER2 SCORE TAYLOR, MEREDITH IREENE DUPAI 97d overdue
18136970 HYBRID MOLYBDENUM FILL SCHEME FOR LOW RESISTIVITY SEMICONDUCTOR APPLICATIONS PARKER, JOHN M 73d overdue
18306187 METHOD OF METROLOGY ON PATTERN WAFER USING REFLECTOMETRY WEGNER, AARON MICHAEL 60d overdue
18319876 EPITAXIAL SILICON CHANNEL GROWTH STEPHENSON, KENNETH STEPHEN 46d overdue
18182856 DISPLAY PIXELS MADE FROM STACKED MICRO-LED STRUCTURES AND PHOTOLUMINESCENT MATERIALS HAN, JONATHAN 43d overdue
18238107 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH RODRIGUEZ, MICHAEL P 42d overdue
18417124 POLISHING HEAD WITH RETAINING RING WEAR SENSING DION, MARCEL T 31d overdue
17693037 SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING CHEN, KEATH T 30d overdue

Interview Candidates (63)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18093156 PLASMA-ENHANCED MOLYBDENUM DEPOSITION ROLLAND, ALEX A 42d overdue
17693037 SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING CHEN, KEATH T 30d overdue
18138733 MULTI-ELECTRODE SOURCE ASSEMBLY FOR PLASMA PROCESSING REYES, JOSHUA NATHANIEL PI 23d overdue
17893430 CLAMPED DUAL-CHANNEL SHOWERHEAD KLUNK, MARGARET D 2d overdue
18131212 HIGH TEMPERATURE METAL SEALS FOR VACUUM SEGREGATION MOORE, KARLA A 1d overdue
18144747 HIGH EFFICIENCY MICROWAVE PLASMA APPLICATOR MCDONALD, RODNEY GLENN 9d
18379915 SHOWERHEAD DESIGN FOR PLASMA-ENHANCED DEPOSITION BENNETT, CHARLEE 12d
17510111 HORIZONTAL BUFFING MODULE REYES, JOSHUA NATHANIEL PI 13d

Top Art Units

Art UnitApps
1716 53
1718 43
1713 28
3723 28
2818 20
2893 17
2899 17
2898 17
1712 15
1714 15

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
19303500 TFT STRUCTURES AND ELECTRICAL SIGNAL CONNECTIONS IN GOA AND PIXEL CIRCUITS FOR LCD AND OLED DISPLAYS KETEMA, BENYAM 2626 §102§103 Final Rejection — Pending Aug 19, 2025
19282056 HIGH CONDUCTANCE VARIABLE ORIFICE VALVE ROST, ANDREW J 3753 §101§102§103Other Non-Final OA — Pending Jul 28, 2025
19261609 ION SOURCE FOR CONTROLLING DECOMPOSITION BUILDUP USING CHLORINE CO-GAS KING, MONICA C 2845 §102Other Non-Final OA — Pending Jul 07, 2025
19243488 PLASMA ENHANCED NUCLEATION LAYER FORMATION GAMBETTA, KELLY M 1718 §102§103§112 Non-Final OA — Pending Jun 19, 2025
19208337 CYCLIC PLASMA AND THERMAL PROCESS TO IMPROVE PECVD TI SILICIDE DEPOSITION SELECTIVITY TALBOT, BRIAN K — §103 Non-Final OA — Pending May 14, 2025
19206441 METHOD OF COATING A SUBSTRATE INCLUDING A MULTI-LAYER COATING HERNANDEZ-KENNEY, JOSE 1717 §103 Final Rejection — Pending May 13, 2025
19195644 HIGH BANDGAP SWITCHED SHUNT CAPACITOR ARCHITECTURE SKIBINSKI, TOMI SWEET 2836 §102§103 Non-Final OA — Pending Apr 30, 2025
19123123 OPTICAL COATING FOR ELIMINATING GHOST IMAGES IN OPTICAL METROLOGY TOOLS BOLOGNA, DOMINIC JOSEPH 2877 §102§103 Non-Final OA — Pending Apr 22, 2025
19173421 PRECURSOR, GAS MIXTURE, AND METHOD FOR DEPOSITING A LOW K DIELECTRIC FILM WALTERS JR, ROBERT S 1717 §103§112 Final Rejection — Pending Apr 08, 2025
19173702 IMPEDANCE TUNING UTILITY OF VECTOR SPACE DEFINED BY TRANSMISSION LINE QUANTITIES NGUYEN, HAI L 2836 §112 Non-Final OA — Pending Apr 08, 2025
19096353 DELIVERY OF CONFIGURABLE PULSED VOLTAGE WAVEFORMS FOR SUBSTRATE PROCESSING OTT, PATRICK S 1794 §103 Non-Final OA — Pending Mar 31, 2025
19093677 SYSTEM AND METHOD TO MAP THICKNESS VARIATIONS OF SUBSTRATES IN MANUFACTURING SYSTEMS RIZVI, AKBAR HASSAN 2877 §102§103Other Non-Final OA — Pending Mar 28, 2025
19111758 METHODS TO MEASURE LIGHT LOSS AND EFFICIENCY OF DIFFRACTION GRATINGS ON OPTICAL SUBSTRATES AYUB, HINA F 2877 §103§112 Non-Final OA — Pending Mar 13, 2025
19076106 MULTISCALE CONTROL OF SUBSTRATE DEFORMATION IN DEVICE MANUFACTURING KIM, PETER B — §102§103§112 Non-Final OA — Pending Mar 11, 2025
19075466 REMOTE PLASMA SOURCES PHAM, THAI N 2845 §103Other Final Rejection — Pending Mar 10, 2025
19074857 APPARATUS AND METHOD FOR CONTACTLESS TRANSPORTATION OF A CARRIER JACKSON, STEPHEN W 2838 §101DP Non-Final OA — Pending Mar 10, 2025
19073823 ELECTROSTATIC CHUCK WITH LIGHT-UP RESISTANT FLOW ENHANCEMENT PLUG CADUGAN, ERICA E 3722 §102§112 Non-Final OA — Pending Mar 07, 2025
19070718 METHODS OF DEPOSITING SILICON NITRIDE TALBOT, BRIAN K 1712 §103DP Final Rejection — Pending Mar 05, 2025
19071301 MATCHING PROCESS CONTROLLERS FOR IMPROVED MATCHING OF PROCESS NORTON, JENNIFER L 2117 §101Other Non-Final OA — Pending Mar 05, 2025
19070247 APPARATUS AND METHOD FOR CLEANING SUSCEPTORS WITH PLASMA CAMPBELL, NATASHA N. 1714 §103 Non-Final OA — Pending Mar 04, 2025
19064042 SEMICONDUCTOR PROCESSING CHAMBER WITH ENHANCED PRESSURE TUNING MURPHY, KEVIN F 3753 §102§103§112 Non-Final OA — Pending Feb 26, 2025
19058316 TUNABILITY OF DOPANT CONCENTRATION IN THIN HAFNIUM OXIDE FILMS DUMBRIS, SETH M 1784 §102§103§112 Non-Final OA — Pending Feb 20, 2025
19057024 DIFFUSER-LESS GRAY-TONE LITHOGRAPHY PROCESS, MASK DESIGN, AND FABRICATION METHOD NGUYEN, HUNG — §102§112 Non-Final OA — Pending Feb 19, 2025
19104809 HIGH ASPECT RATIO GAP FILL USING CYCLIC DEPOSITION AND ETCH PROCTOR, CACHET I 1712 §103§112 Non-Final OA — Pending Feb 19, 2025
19052990 METHOD FOR DETERMINING WAFER UNIFORMITY NAH, JONGBONG 2674 §103§112 Non-Final OA — Pending Feb 13, 2025
19051244 ELECTROSTATIC CHUCK FOR NON-PLANAR SUBSTRATES THOMAS, LUCY M 2838 §103 Non-Final OA — Pending Feb 12, 2025
19051385 METAL OXIDE DIRECTIONAL REMOVAL PHAM, THOMAS T 1713 §103 Final Rejection 2d overdue Pending Feb 12, 2025
19051679 HIGH DENSITY AMORPHOUS CARBON FILM WITH REDUCED HYDROGEN CONTENT ROLLAND, ALEX A 1759 §103§112 Non-Final OA — Pending Feb 12, 2025
19051154 SEALING STRUCTURES FOR PROCESSING CHAMBERS FOSTER, NICHOLAS L 3675 §102§112 Non-Final OA — Pending Feb 11, 2025
19049659 INSPECTION OF LITHOGRAPHIC LAYERS AND DYNAMIC DATA VIA INLINE METROLOGY PERSAUD, DEORAM 2882 §103 Non-Final OA — Pending Feb 10, 2025
19047868 METHODS AND MECHANISMS FOR ADJUSTING PROCESS CHAMBER PARAMETERS DURING SUBSTRATE MANUFACTURING JARRETT, RYAN A 2116 §102§103 Non-Final OA — Pending Feb 07, 2025
19037527 ENCAPSULATION MATERIALS FOR FLAT OPTICAL DEVICES KHAN, TAHSEEN 1781 §103Other Non-Final OA — Pending Jan 27, 2025
19034051 ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING GOLIGHTLY, ERIC WAYNE 1714 §103 Non-Final OA — Pending Jan 22, 2025
19028671 LIFT PIN INTERFACE IN A SUBSTRATE SUPPORT NEJAD, MAHDI H 3723 §102§103 Non-Final OA — Pending Jan 17, 2025
18995474 PROCESSING APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHODS THEREFOR ZHANG, HAI Y 1717 §102§103 Non-Final OA — Pending Jan 16, 2025
19018386 EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY LUND, JEFFRIE ROBERT 1714 §102§103Other Non-Final OA — Pending Jan 13, 2025
19019158 MULTI-CHAMBER LASER SENSING USING SPLIT BEAMS RAHMAN, MD M 2877 §103 Non-Final OA — Pending Jan 13, 2025
19013048 Bowed Substrate Clamping Method, Apparatus, and System PATEL, DHARTI HARIDAS 2838 Other Non-Final OA — Pending Jan 08, 2025
19003394 Cassette for Vapor Processing Chamber IMPINK, MOLLIE LLEWELLYN 3799 §103§112 Final Rejection — Pending Dec 27, 2024
18987976 PLASMA TREATMENT FACILITATING SELECTIVE METAL GROWTH AND PREVENTING DIELECTRIC DAMAGE DAGENAIS, KRISTEN A 1717 §103 Final Rejection — Pending Dec 19, 2024
18984643 GAS DELIVERY SYSTEM JELLETT, MATTHEW WILLIAM 3753 §102§103 Final Rejection 27d Pending Dec 17, 2024
18983235 APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION MOORE, KARLA A 1716 §103 Non-Final OA — Pending Dec 16, 2024
18980063 HYDROGEN ADDITION TO LOW-K DIELECTRIC BARRIER FILMS TADAYYON ESLAMI, TABASSOM 1718 §103 Non-Final OA — Pending Dec 13, 2024
18977686 TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING CRANDALL, JOEL DILLON 3723 §103 Non-Final OA — Pending Dec 11, 2024
18973504 RADICAL SPECIES RECOMBINATION IN SUBSTRATE PROCESSING SYSTEMS MURATA, AUSTIN 1712 §103 Non-Final OA — Pending Dec 09, 2024
18968156 DETECTION OF SURFACE PARTICLES ON CHAMBER COMPONENTS WITH CARBON DIOXIDE WEST, PAUL M 2855 §103 Non-Final OA — Pending Dec 04, 2024
18960809 COOLING ARRANGEMENTS FOR PROCESSING SYSTEMS, CHAMBERS, AND RELATED METHODS TO MODIFY SUBSTRATE TEMPERATURE PROFILES KUNEMUND, ROBERT M 1714 §103 Non-Final OA — Pending Nov 26, 2024
18958006 NANOCRYSTALLINE DIAMOND AND ULTRA-NANOCRYSTALLINE DIAMOND FILMS BY CATALYTIC CVD PROCTOR, CACHET I 1712 §103 Non-Final OA — Pending Nov 25, 2024
18957056 REAL-TIME IMAGE PROCESSING TO MEASURE SUBSTRATE OFFSETS AND APPLY CORRECTIONS TO ROBOT END EFFECTOR POSITIONING BODNARK, MATTHEW JAMES 2668 §103 Non-Final OA — Pending Nov 22, 2024
18948311 OPTICAL SPECTRUM SENSOR WAFER OR ROBOT FOR CHAMBER CONDITION MONITORING LYONS, MICHAEL A 2877 §102§103 Non-Final OA — Pending Nov 14, 2024

View all 542 →

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Frequently Asked Questions

How many pending USPTO office actions does Applied Materials Inc. have?

Applied Materials Inc. has 542 pending office actions as of October 2026, spread across 103 art units and 344 examiners.

Which USPTO examiner handles the most Applied Materials Inc. applications?

Charlee Bennett has the most, with 13 of Applied Materials Inc.'s pending office actions.

What technology area are Applied Materials Inc.'s patent applications in?

Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.

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