Listed by the USPTO as GAMBETTA, KELLY M
Tech Center 3700 • Art Units: 1715 1718 1792 2812 3774
This examiner grants 72% of resolved cases
GAMBETTA, KELLY M is assigned to tech center 3700 and art unit 1715. The profile covers 952 resolved cases, an allowance rate of 71.8%, and a median of 1104 days to allowance. The extensive record supports treating the allowance figure as a useful indicator of prosecution outcomes, while the median shows that allowance commonly follows a lengthy process. Interviews are associated with a 33.0% lift, giving practitioners a meaningful reason to evaluate interview timing and preparation.
The leading companies are Applied Materials Inc., RTX Corporation, and ASM IP Holding B.V. The principal firms are Snell & Wilmer (ASM IP Holding B.V.), VOLPE KOENIG, and AGORA LAW GROUP, PLLC. This mix points to semiconductor, aerospace, and industrial technology matters. Applicants can use the listed organizations to identify relevant experience and develop arguments directed to the examiner’s technical focus.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18690370 | GAS-ASSISTED COCRYSTAL DE-SUBLIMATION | Non-Final OA | THE REGENTS OF THE UNIVERSITY OF MICHIGAN |
| 18564811 | ELECTROLYSER, BIPOLAR PLATE AND METHOD FOR PRODUCTION THEREOF | Non-Final OA | Robert Bosch GmbH |
| 19008803 | METHOD AND APPARATUS FOR AREA-SELECTIVE DEPOSITION | Final Rejection | ASM IP Holding B.V. |
| 18072764 | METHODS FOR IMPROVING THIN FILM QUALITY | Final Rejection | ASM IP Holding B.V. |
| 19037480 | METHOD FOR PREPARING A CATHODE MATERIAL FOR A BATTERY | Non-Final OA | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES |
| 18847652 | LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE | Non-Final OA | Lam Research Corporation |
| 18954901 | METHOD FOR FORMING INSULATION FILM | Final Rejection | Tokyo Electron Limited |
| 18653410 | FILM-FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18973613 | ALUMINUM-CHROMIUM OXIDE COATING AND METHOD THEREFOR | Non-Final OA | RTX CORPORATION |
| 18748021 | SLURRY INFILTRATION WITH FREEZE DRYING AND GELLING FOR MORE UNIFORM DISTRIBUTION OF PARTICULATE MATERIAL | Non-Final OA | RTX CORPORATION |
| 18678693 | DAMAGE RESISTANT CERAMIC MATRIX COMPOSITES | Final Rejection | RTX CORPORATION |
| 19243488 | PLASMA ENHANCED NUCLEATION LAYER FORMATION | Non-Final OA | Applied Materials, Inc. |
| 18233984 | METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND INCREASED DENSITY | Non-Final OA | Applied Materials, Inc. |
| 18128124 | CERAMIC SYNTHESIS THROUGH SURFACE COATING OF POWDERS | Non-Final OA | Applied Materials, Inc. |
| 19056022 | CHEMICAL VAPOR DEPOSITION FOR UNIFORM TUNGSTEN GROWTH | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19273395 | COATED CUTTING TOOL | Non-Final OA | AB SANDVIK COROMANT |
| 17951205 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM | Final Rejection | Kokusai Electric Corporation |
| 18551302 | SUBSTRATE TREATING METHOD AND TREATMENT LIQUID | Final Rejection | SCREEN Holdings Co., Ltd. |
| 18859908 | SURFACTANT-LOADED MOF-BASED ANTIVIRAL FABRIC FOR USE IN FACEMASKS AND RESPIRATORS | Non-Final OA | DREXEL UNIVERSITY |
| 18764717 | Area-Selective Hardmask Deposition: Methods and Tools for Advanced Patterning | Final Rejection | Nederlandse Organisatie voor Toegepast-natuurwetenschappelijk onderzoek TNO |
| 18975045 | FINISHING OF ADDITIVELY MANUFACTURED PARTS WITH SMOOTHING AND COLOR | Non-Final OA | PostProcess Technologies, Inc. |
| 18908629 | METHOD OF FORMING ALLOY THIN FILM USING ATOMIC LAYER DEPOSITION PROCESS INCLUDING OPTIMAL UNIT PROCESS, AND ELECTRONIC ELEMENT MANUFACTURED USING THE SAME | Final Rejection | INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS |
| 19038705 | SYSTEM AND METHOD FOR EXPOSED AGGREGATE ARCHITECTURAL COATING FOR EXISITING CONCRETE STRUCTURES | Non-Final OA | Individual inventor |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy71.8% of resolved applications examined by Kelly M Gambetta were allowed (952 resolved cases), compared with 51.6% across Art Unit 1715 over the last five years.
This examiner's interview lift is +33.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Kelly M Gambetta took 1,104 days on average from filing to allowance.
Kelly M Gambetta examines applications in Art Unit 1715 in Tech Center 3700 (Medical Devices & Mechanical Engineering).
