Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
3 pending office actions • 2 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Globalwafers Japan Co. Ltd. has 2 pending office actions in Semiconductors, Circuits & Optics. The profile includes 2 distinct examiners within 1 distinct art unit. SHAMSUZZAMAN, MOHAMMED is the named busiest examiner, with 1 pending action.
The common art-unit setting may support consistent technical positioning, but the separate examiner assignments still require individualized response planning. Counsel should distinguish examiner-specific issues while coordinating the semiconductor record.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| Multi-statute (no §101) | 3 (100%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| QI, HUA | 1 | 56.5% | +23.0% |
| SHAMSUZZAMAN, MOHAMMED | 1 | 81.2% | +55.1% |
| BRATLAND JR, KENNETH A | 1 | 56.2% | +16.3% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18721810 | METHOD OF MANUFACTURING SILICON EPITAXIAL SUBSTRATE AND SILICON EPITAXIAL SUBSTRATE | QI, HUA | — |
| 18663429 | HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD | SHAMSUZZAMAN, MOHAMMED | — |
| 18626490 | METHOD OF MANUFACTURING SILICON WAFERS | BRATLAND JR, KENNETH A | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18721810 | METHOD OF MANUFACTURING SILICON EPITAXIAL SUBSTRATE AND SILICON EPITAXIAL SUBSTRATE | QI, HUA | — |
| 18663429 | HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD | SHAMSUZZAMAN, MOHAMMED | — |
| 18626490 | METHOD OF MANUFACTURING SILICON WAFERS | BRATLAND JR, KENNETH A | — |
| Art Unit | Apps |
|---|---|
| 1714 | 1 |
| 2897 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18721810 | METHOD OF MANUFACTURING SILICON EPITAXIAL SUBSTRATE AND SILICON EPITAXIAL SUBSTRATE | QI, HUA | 1714 | §103§112 | Final Rejection | — | Pending | Jun 19, 2024 |
| 18663429 | HEAT TREATMENT APPARATUS AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD | SHAMSUZZAMAN, MOHAMMED | 2897 | §103§112 | Non-Final OA | — | Pending | May 14, 2024 |
| 18626490 | METHOD OF MANUFACTURING SILICON WAFERS | BRATLAND JR, KENNETH A | — | §102§112 | Non-Final OA | — | Pending | Apr 04, 2024 |
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Start Free TrialGlobalwafers Japan Co. Ltd. has 3 pending office actions as of October 2026, spread across 2 art units and 3 examiners.
Hua Qi has the most, with 1 of Globalwafers Japan Co. Ltd.'s pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
