Listed by the USPTO as QI, HUA
Tech Center 1700 • Art Units: 1714
This examiner grants 56% of resolved cases
QI, HUA is assigned to Tech Center 1700 and Art Unit 1714. The profile covers 559 resolved cases, with a 56.5% allowance rate, a 23.0% interview lift, and a median of 1188 days to allowance. Interviews show a meaningful relationship with allowance outcomes in a docket with a midrange allowance result.
Globalwafers Co., Ltd., Applied Materials Inc., and TCL Zhonghuan Renewable Energy Technology Co. Ltd. are the leading companies. HARNESS, DICKEY & PIERCE, P.L.C., PVIP, and Bochner PLLC are the leading firms. Practitioners should connect technical distinctions to claim language during interviews and written responses.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18522817 | METHOD OF MANUFACTURING SILICON SINGLE CRYSTAL AND METHOD OF MANUFACTURING WAFER USING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18110403 | SYSTEMS AND METHODS FOR PROCESSING THE SURFACE OF AN EPITAXIALLY GROWN SILICON FILM USING A RADICAL SPECIES | Final Rejection | ASM IP Holding B.V. |
| 18756348 | GROUP-III NITRIDE SUBSTRATE | Final Rejection | Panasonic Holdings Corporation |
| 18248740 | METHOD OF TRANSFERRING A PATTERN TO AN EPITAXIAL LAYER OF A LIGHT EMITTING DEVICE | Final Rejection | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
| 18870058 | METHOD FOR PRODUCING SILICON SINGLE CRYSTAL | Non-Final OA | Shin-Etsu Handotai Co., Ltd. |
| 18140207 | EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY | Non-Final OA | Applied Materials, Inc. |
| 17099454 | APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION | Final Rejection | Applied Materials, Inc. |
| 18053796 | SEMICONDUCTOR CRYSTAL GROWTH USING SOURCE POWDER FROM CRUCIBLE WALL | Non-Final OA | SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC |
| 18794112 | METHOD OF PROCESSING CARBON-CONTAINED MONOCRYSTALLINE SUBSTRATE | Non-Final OA | DISCO CORPORATION |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy56.5% of resolved applications examined by Hua Qi were allowed (559 resolved cases), compared with 50.6% across Art Unit 1714 over the last five years.
This examiner's interview lift is +23.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Hua Qi took 1,188 days on average from filing to allowance.
Hua Qi examines applications in Art Unit 1714 in Tech Center 1700 (Chemistry & Materials).
