Prosecution Insights
Prosecution Insights
3 pending office actions • 3 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready • 2 patents granted in the last 365 days
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 2 (67%) |
| Multi-statute (no §101) | 1 (33%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| BOWMAN, ANDREW J | 1 | 65.6% | +13.2% |
| RODRIGUEZ, MICHAEL P | 1 | 73.1% | +29.4% |
| SCHMITT, BENJAMIN R | 1 | 84.5% | +15.8% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17177770 | LIQUID CHROMATOGRAPHY TECHNIQUE | SCHMITT, BENJAMIN R | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18706858 | PROCESS, COMPONENT, AND SYSTEM WITH AMORPHOUS SILICON-CONTAINING COATING EXPOSED TO A TEMPERATURE OF GREATER THAN 600 DEGREES CELSIUS | RODRIGUEZ, MICHAEL P | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18767554 | THERMAL CHEMICAL VAPOR DEPOSITION COATING PROCESS | BOWMAN, ANDREW J | — |
| 18706858 | PROCESS, COMPONENT, AND SYSTEM WITH AMORPHOUS SILICON-CONTAINING COATING EXPOSED TO A TEMPERATURE OF GREATER THAN 600 DEGREES CELSIUS | RODRIGUEZ, MICHAEL P | — |
| 17177770 | LIQUID CHROMATOGRAPHY TECHNIQUE | SCHMITT, BENJAMIN R | — |
| Art Unit | Apps |
|---|---|
| 1717 | 1 |
| 1712 | 1 |
| 2852 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18767554 | THERMAL CHEMICAL VAPOR DEPOSITION COATING PROCESS | BOWMAN, ANDREW J | 1717 | §103 | Non-Final OA | — | Pending | Jul 09, 2024 |
| 18706858 | PROCESS, COMPONENT, AND SYSTEM WITH AMORPHOUS SILICON-CONTAINING COATING EXPOSED TO A TEMPERATURE OF GREATER THAN 600 DEGREES CELSIUS | RODRIGUEZ, MICHAEL P | 1712 | §102§103 | Non-Final OA | — | Pending | May 02, 2024 |
| 17177770 | LIQUID CHROMATOGRAPHY TECHNIQUE | SCHMITT, BENJAMIN R | 2852 | §103 | Non-Final OA | — | Pending | Feb 17, 2021 |
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