Prosecution Insights
Last updated: October 04, 2026

Young Chang Chemical Co. Ltd.

Technology area: Chemistry & Materials

3 pending office actions • 3 art units • 3 examiners • 0 of 3 (0%) have an AI response strategy ready

Analysis

Young Chang Chemical Co. Ltd. operates a company patent portfolio within the Chemistry & Materials technology area. The portfolio currently has 3 pending office actions, which suggests a broader range of active prosecution than smaller portfolios in the same sector. These actions are distributed across 3 distinct examiners, showing that the company is interacting with multiple points of review within the patent office simultaneously.

The work is further spread across 3 distinct art units. This variety in art units indicates that the Chemistry & Materials innovations being pursued may span different technical subclasses or specialized examination groups. LEE, ALEXANDER N is the busiest examiner associated with the portfolio. This examiner is currently handling 1 pending office action, which is a portion of the total actions pending for the company.

The fact that the busiest examiner pending count is 1 confirms that no single examiner dominates the current workload. Instead, the prosecution is split among the distinct examiners. This distribution can provide the company with diverse perspectives from different officials within the USPTO's Chemistry & Materials divisions.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Portfolio Summary

3
Total Pending OAs
0
Non-Final OAs
3
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 1 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

1
Overdue
0
Due this week
0
Due this month
0
Due in next 60 days
0
Due later

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

0
Hard (0%)
3
Medium (100%)
0
Easy (0%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§103 only3 (100%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

3
Life Sciences
100% of docket
0
Information Tech
0% of docket
0
Communications
0% of docket
0
Semiconductors
0% of docket
0
Mechanical / Eng
0% of docket
0
Business / Other
0% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

30 h
Manual time on pending OAs
6 h
Time saved (low, 20%)
10 h
Time saved (mid, 35%)
0.3 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
LEE, ALEXANDER N 1 76.7% +11.9%
LAOBAK, ANDREW KEELAN 1 75.4% +34.5%
KUMAR, PREETI 1 31.9% +43.7%

Interview Candidates (3)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 3 ordered by deadline are shown.

App #TitleExaminerDue in
17641229 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME KUMAR, PREETI 72d overdue
18040167 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME LEE, ALEXANDER N —
18016725 ETCHANT COMPOSITION FOR ADJUSTING ETCHING SELECTIVITY OF TITANIUM NITRIDE FILM WITH RESPECT TO TUNGSTEN FILM, AND ETCHING METHOD USING SAME LAOBAK, ANDREW KEELAN —

Top Art Units

Art UnitApps
1737 1
1713 1
1761 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
18040167 PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME LEE, ALEXANDER N 1737 §103 Final Rejection — Pending Feb 01, 2023
18016725 ETCHANT COMPOSITION FOR ADJUSTING ETCHING SELECTIVITY OF TITANIUM NITRIDE FILM WITH RESPECT TO TUNGSTEN FILM, AND ETCHING METHOD USING SAME LAOBAK, ANDREW KEELAN 1713 §103 Final Rejection — Pending Jan 18, 2023
17641229 PROCESS LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME KUMAR, PREETI 1761 §103 Final Rejection 72d overdue Pending Mar 08, 2022

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