Tech Center 1700 • Art Units: 1737
This examiner grants 74% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18127118 | RESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18184697 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | Non-Final OA | FUJIFILM Corporation |
| 17952941 | PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 17320398 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18314481 | IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE | Non-Final OA | Applied Materials, Inc. |
| 18776675 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18447568 | PHOTORESIST MATERIALS AND ASSOCIATED METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18232774 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18232264 | PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17486223 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17340838 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 17302880 | PHOTORESIST MATERIALS AND ASSOCIATED METHODS | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18193324 | Dry Developing Metal-Free Photoresists | Non-Final OA | Tokyo Electron Limited |
| 18207250 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18309793 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18310925 | CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18131279 | GAS-PHASE METHOD OF FORMING RADIATION-SENSITIVE PATTERNABLE MATERIAL | Non-Final OA | ASM IP Holding, B.V. |
| 17900578 | METHOD OF FORMING A PHOTORESIST ABSORBER LAYER AND STRUCTURE INCLUDING SAME | Non-Final OA | ASM IP Holding B.V. |
| 18026396 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 17795061 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 17790324 | EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 17763253 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 18040167 | PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME | Non-Final OA | YOUNG CHANG CHEMICAL CO., LTD |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy