Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1737
This examiner grants 74% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18131279 | GAS-PHASE METHOD OF FORMING RADIATION-SENSITIVE PATTERNABLE MATERIAL | Non-Final OA | ASM IP Holding, B.V. |
| 17900578 | METHOD OF FORMING A PHOTORESIST ABSORBER LAYER AND STRUCTURE INCLUDING SAME | Non-Final OA | ASM IP Holding B.V. |
| 17952941 | PATTERN FORMATION METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 17867327 | COLORING RESIN COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | Final Rejection | FUJIFILM Corporation |
| 17320398 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Non-Final OA | FUJIFILM Corporation |
| 18314481 | IMPLANT INTO EUV METAL OXIDE PHOTORESIST MODULE TO REDUCE EUV DOSE | Non-Final OA | Applied Materials, Inc. |
| 18251922 | PHOTORESIST REMOVER COMPOSITIONS | Non-Final OA | Merck Patent GmbH |
| 18776675 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18232774 | UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18447568 | PHOTORESIST MATERIALS AND ASSOCIATED METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17340838 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18193324 | Dry Developing Metal-Free Photoresists | Non-Final OA | Tokyo Electron Limited |
| 18310925 | CROSS-LINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18026396 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINAL-BLOCKED REACTION PRODUCT | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 17795061 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 17790324 | EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 17763253 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND | Non-Final OA | NISSAN CHEMICAL CORPORATION |
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