Listed by the USPTO as AKANBI, ISIAKA O
Tech Center 2800 • Art Units: 2877 2878 2882 2884 2886
This examiner grants 77% of resolved cases
AKANBI, ISIAKA O is a USPTO patent examiner in Tech Center 2800 and art unit 2877. The profile records 1,102 resolved cases, an allowance rate of 76.6%, and a median of 910 days to allowance. The interview lift is 22.9%, indicating that interviews are associated with improved allowance outcomes in the recorded cases.
The listed companies are Sony Group Corporation, Beckman Coulter Inc., and Samsung Electronics Co., Ltd. The listed firms are BakerHostetler, BENNETT JONES LLP, and Bodman PLC. These recurring participants give practitioners a concrete reference for the examiner’s docket, while the allowance and timing figures support planning for claim amendments and prosecution milestones.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18924455 | DEFECT INSPECTION SYSTEM AND DEFECT INSPECTION METHOD | Final Rejection | Samsung Electronics Co., Ltd. |
| 18934246 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., Ltd. |
| 18578067 | OBJECTIVE LENS AND SAMPLE ANALYZER | Non-Final OA | Sony Group Corporation |
| 18873008 | COMPARATOR, LIGHT DETECTION ELEMENT, AND ELECTRONIC DEVICE | Final Rejection | Sony Semiconductor Solutions Corporation |
| 18976737 | OPTICAL FIBER MONITORING SYSTEM, REMOTE MONITORING DEVICE, AND OPTICAL FIBER MONITORING METHOD | Final Rejection | NEC Corporation |
| 18839307 | FLUID ANALYSIS SYSTEM AND METHODS | Final Rejection | The Johns Hopkins University |
| 18993075 | SENSOR MODULE FOR RAMAN SPECTROSCOPY, ELECTRONIC DEVICE AND METHOD OF CONDUCTING RAMAN SPECTROSCOPY | Non-Final OA | ams International AG |
| 19090475 | SUBSTRATE EVALUATION METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18939263 | FLOW CYTOMETER | Final Rejection | Beckman Coulter, Inc. |
| 18938138 | FLOW CYTOMETER | Non-Final OA | Beckman Coulter, Inc. |
| 19190996 | INSPECTION DEVICES AND INSPECTION METHODS | Non-Final OA | TOPPAN HOLDINGS INC. |
| 18414622 | APPARATUSES AND METHODS FOR ASSESSING DEEP ULTRAVIOLET REFLECTIVITY OF A PELLICLE FOR AN EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
| 19186153 | METHOD OF PRODUCING REFERENCE-SPECTRUM LIBRARY FOR USE IN ESTIMATION OF FILM THICKNESS OF WORKPIECE | Non-Final OA | EBARA CORPORATION |
| 18856459 | A LITHOGRAPHIC APPARATUS, AN INSPECTION SYSTEM, AND A DETECTOR HAVING A SQUARE-CORE FIBER | Final Rejection | ASML Netherlands B.V. |
| 18414488 | TEST METHOD FOR A WAFER AND WAFER | Non-Final OA | United Microelectronics Corp. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy76.6% of resolved applications examined by Isiaka O Akanbi were allowed (1,102 resolved cases), compared with 78.2% across Art Unit 2877 over the last five years.
This examiner's interview lift is +22.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Isiaka O Akanbi took 910 days on average from filing to allowance.
Isiaka O Akanbi examines applications in Art Unit 2877 in Tech Center 2800 (Semiconductors, Circuits & Optics).
