Tech Center 1700 • Art Units: 1713 1715 1716 1717
This examiner grants 58% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18523234 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18236748 | EDGE RING, DRY ETCHING APPARATUS HAVING THE SAME, AND OPERATION METHOD OF ETCHING APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO.,LTD. |
| 18739197 | DEPOSITION APPARATUS AND METHOD OF OPERATING THE SAME | Non-Final OA | Samsung Display Co., Ltd. |
| 18376524 | LIQUID-SOURCE PRECURSOR DELIVERY SYSTEM APPARATUS AND METHOD OF USING SAME | Non-Final OA | ASM IP Holding B.V. |
| 17699314 | PLASMA-ASSISTED ETCHING OF METAL OXIDES | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18773943 | BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE | Non-Final OA | Applied Materials, Inc. |
| 17987679 | ADDITION OF EXTERNAL ULTRAVIOLET LIGHT FOR IMPROVED PLASMA STRIKE CONSISTENCY | Non-Final OA | Applied Materials, Inc. |
| 18120050 | UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17644412 | DEPOSITION APPARATUS AND DEPOSITION METHOD | Non-Final OA | Tokyo Electron Limited |
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