Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1715 1716
This examiner grants 58% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18523234 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 17880588 | PLASMA PROCESSING DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE BY USING THE SAME | Non-Final OA | Samsung Display Co., LTD. |
| 18376524 | LIQUID-SOURCE PRECURSOR DELIVERY SYSTEM APPARATUS AND METHOD OF USING SAME | Non-Final OA | ASM IP Holding B.V. |
| 18773943 | BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE | Non-Final OA | Applied Materials, Inc. |
| 18484352 | RESISTANT COATINGS INCLUDING POLYMER SEALANT AND RESISTANT PARTICLES | Final Rejection | Applied Materials, Inc. |
| 18227226 | CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18107157 | Electrostatic Chuck | Final Rejection | Applied Materials, Inc. |
| 17991651 | PLASMA GENERATOR FOR EDGE UNIFORMITY | Final Rejection | Applied Materials, Inc. |
| 17545618 | SCANNING RADICAL SENSOR USABLE FOR MODEL TRAINING | Non-Final OA | Applied Materials, Inc. |
| 17023186 | PLASMA CHAMBER WITH A MULTIPHASE ROTATING MODULATED CROSS-FLOW | Non-Final OA | Applied Materials, Inc. |
| 18789306 | EXTERNAL MAGNETIC FIELD-COUPLED PLASMA ATOMIC LAYER DEPOSITION DEVICE AND ATOMIC LAYER DEPOSITION METHOD | Final Rejection | Research & Business Foundation SUNGKYUNKWAN UNIVERSITY |
| 18442022 | PLASMA PROCESSING APPARATUS, PLASMA STATE DETECTION METHOD, AND PLASMA STATE DETECTION PROGRAM | Non-Final OA | TOKYO ELECTRON LIMITED |
| 18303485 | SUBSTRATE SUPPORT ASSEMBLY, SUBSTRATE SUPPORT, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 18120050 | UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17854944 | FILM FORMING APPARATUS AND FILM FORMING METHOD | Non-Final OA | Tokyo Electron Limited |
| 17644412 | DEPOSITION APPARATUS AND DEPOSITION METHOD | Non-Final OA | Tokyo Electron Limited |
| 18637111 | ELECTROSTATIC CHUCK (ESC) PEDESTAL VOLTAGE ISOLATION | Non-Final OA | Lam Research Corporation |
| 18032154 | COLD EDGE LOW TEMPERATURE ELECTROSTATIC CHUCK | Final Rejection | Lam Research Corporation |
| 17959052 | SEMICONDUCTOR APPARATUS AND GAS DISTRIBUTOR OF SEMICONDUCTOR APPARATUS | Non-Final OA | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. |
| 17471728 | FIXTURE COMPRISING MAGNETIC MEANS FOR HOLDING ROTARY SYMMETRIC WORKPIECES | Final Rejection | Oerlikon Surface Solutions AG, Pfaffikon |
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