Listed by the USPTO as DEES, NIKKI H
Tech Center 1700 • Art Units: 1691 1726 1781 1791 1794
This examiner grants 22% of resolved cases
DEES, NIKKI H is a USPTO patent examiner in tech center 1700 and art unit 1691. The record includes 637 resolved cases, with an allowance rate of 22.0%. The median time to allowance is 1607 days. Interview lift is 20.7%, indicating some relationship between interviews and allowance outcomes within a generally difficult prosecution profile.
The principal companies are Denso Corporation, Nestlé S.A., and California Institute of Technology. The leading firms are Boone IP Law, PLLC, HARNESS DICKEY (DETROIT), and K&L Gates LLP-Nestec S.A. Applicants should plan for extended prosecution and use interviews as one element of a carefully developed claim strategy.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18308708 | ELECTROCHEMICAL CELL, GAS RECOVERY SYSTEM EQUIPPED WITH ELECTROCHEMICAL CELL, AND METHOD OF MANUFACTURING ELECTROCHEMICAL CELL | Non-Final OA | DENSO CORPORATION |
| 18550744 | GLUTEN-FREE PIZZA CRUST WITH A LIGHT, AERATED AND CRISPY STRUCTURE | Non-Final OA | SOCIÉTÉ DES PRODUITS NESTLÉ S.A. |
| 18279319 | DEVICES AND METHODS FOR ELECTROPHORETIC EXTRACTION OF NUCLEIC ACIDS FROM BIOLOGICAL SAMPLES | Non-Final OA | Roche Sequencing Solutions, Inc. |
| 18553945 | METHOD FOR MANUFACTURING PROCESSED HEMP BEVERAGE/FOODSTUFF OR FOODSTUFF MATERIAL | Non-Final OA | AMANO ENZYME INC. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy22.0% of resolved applications examined by Nikki H Dees were allowed (637 resolved cases), compared with 66.4% across Art Unit 1691 over the last five years.
This examiner's interview lift is +20.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Nikki H Dees took 1,607 days on average from filing to allowance.
Nikki H Dees examines applications in Art Unit 1691 in Tech Center 1700 (Chemistry & Materials).
