Listed by the USPTO as EWALD, MARIA VERONICA
Tech Center 1700 • Art Units: 1744 1754 1783 1791
This examiner grants 58% of resolved cases
EWALD, MARIA VERONICA is assigned to technology center 1700 and art unit 1744. The record covers 310 resolved cases, with an allowance rate of 58.4%, an interview lift of 8.0%, and a median of 1146 days to allowance. The allowance outcome is near the middle of the recorded range, while the interview measure shows only a limited positive association.
Shin-Etsu Chemical Co., Ltd., RESONAC Corporation, and 3D Systems Inc. appear among the listed companies. The listed firms are BIRCH STEWART KOLASCH & BIRCH, LLP, Brannon Sowers & Cracraft PC, and Conley Rose, P.C. The data favors careful written claim analysis, with interviews available as a supporting tactic rather than the principal lever. The median timing calls for realistic expectations about prosecution duration.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18407974 | WINDOW MATERIAL FOR OPTICAL ELEMENT, LID FOR OPTICAL ELEMENT PACKAGE, AND OPTICAL ELEMENT PACKAGE | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18562166 | PREPREG, LAMINATED PLATE, METAL-CLAD LAMINATED PLATE, PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, METHOD FOR MANUFACTURING PREPREG, AND METHOD FOR MANUFACTURING METAL-CLAD LAMINATED PLATE | Final Rejection | Resonac Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy58.4% of resolved applications examined by Maria Veronica Ewald were allowed (310 resolved cases), compared with 48.7% across Art Unit 1744 over the last five years.
This examiner's interview lift is +8.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Maria Veronica Ewald took 1,146 days on average from filing to allowance.
Maria Veronica Ewald examines applications in Art Unit 1744 in Tech Center 1700 (Chemistry & Materials).
