Listed by the USPTO as FRASER, STEWART A
Tech Center 1700 • Art Units: 1721 1723 1724 1737 1795
This examiner grants 86% of resolved cases
FRASER, STEWART A has resolved 1367 cases in Tech Center 1700 and Art Unit 1721. The profile reports an 86.0% allowance rate and a median of 905 days to allowance. Its 14.4% interview lift indicates a positive association between interviews and allowance outcomes, giving practitioners a basis for considering examiner discussion as part of response planning.
The listed companies include Taiwan Semiconductor Manufacturing Company, Ltd., Fujifilm Corporation, and Shin-Etsu Chemical Co., Ltd. The representative firms are Element IP, PLC, SQUIRE PB (SFR Office), and WHDA, LLP. The large resolved-case record provides substantial context for the profile, while the median timeline indicates that favorable allowance results do not eliminate the need for long-range prosecution management.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18586593 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | Non-Final OA | FUJIFILM Corporation |
| 18582661 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | Non-Final OA | FUJIFILM CORPORATION |
| 18578342 | ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE | Non-Final OA | Merck Patent GmbH |
| 18417298 | HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS | Non-Final OA | SAMSUNG SDI CO., LTD. |
| 18626972 | ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18614445 | EUV LITHOGRAPHY MASK BLANKS, EUV MASKS AND METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18417128 | PELLICLE FOR EUV APPLICATIONS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy86.0% of resolved applications examined by Stewart A Fraser were allowed (1,367 resolved cases), compared with 40.6% across Art Unit 1721 over the last five years.
This examiner's interview lift is +14.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Stewart A Fraser took 905 days on average from filing to allowance.
Stewart A Fraser examines applications in Art Unit 1721 in Tech Center 1700 (Chemistry & Materials).
