Technology area: Chemistry & Materials
29 pending office actions • 15 art units • 22 examiners • 0 of 29 (0%) have an AI response strategy ready • 14 patents granted in the last 365 days
JSR Corporation has 31 pending office actions in Chemistry & Materials. The portfolio spans 22 distinct examiners and 15 distinct art units, indicating substantial distribution across examination assignments. WALKE, AMANDA C is the busiest examiner, with 2 pending matters.
The breadth of examiner and art-unit involvement makes centralized prosecution coordination important. Counsel should track recurring claim language, technical positions, and response practices across the separate records while preserving assignment-specific arguments. WALKE, AMANDA C handles 2 pending matters, but the supplied figures show that the pending workload extends well beyond that examiner and across many art-unit settings.
Based on the USPTO statutory response window for each pending office action. 5 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 5 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 12 (41%) |
| §102 only | 3 (10%) |
| §112 only | 1 (3%) |
| Double-patenting + other | 1 (3%) |
| Multi-statute (no §101) | 12 (41%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| WALKE, AMANDA C | 2 | 88.5% | +8.6% |
| EOFF, ANCA | 2 | 80.1% | +10.8% |
| FRASER, STEWART A | 2 | 86.0% | +14.4% |
| COSGROVE, JAYSON D | 2 | 53.0% | +33.9% |
| TRAYWICK, ANDREW PRESTON | 2 | 71.9% | +26.9% |
| CHU, JOHN S Y | 2 | 76.8% | +5.4% |
| CHAMPION, RICHARD DAVID | 2 | 46.2% | +11.1% |
| TRAN, BINH X | 1 | 81.7% | +11.9% |
| SULLIVAN, CALEEN O | 1 | 88.7% | +11.4% |
| CHACKO DAVIS, DABORAH | 1 | 72.0% | +20.4% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18699377 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES | SULLIVAN, CALEEN O | — |
| 18685539 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | WALKE, AMANDA C | — |
| 18440124 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | WALKE, AMANDA C | — |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | — |
| 18239399 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | EOFF, ANCA | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18125934 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | ZHANG, RUIYUN | 72d |
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — |
| 18422098 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | EOFF, ANCA | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18372163 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | COSGROVE, JAYSON D | — |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | — |
| 18218193 | COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | CHU, JOHN S Y | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | TRAYWICK, ANDREW PRESTON | 30d |
| 18233932 | ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING | TRAYWICK, ANDREW PRESTON | 61d |
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18699377 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES | SULLIVAN, CALEEN O | — |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — |
| 18422098 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | EOFF, ANCA | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | — |
| Art Unit | Apps |
|---|---|
| 1737 | 11 |
| 1722 | 3 |
| 1724 | 2 |
| 1713 | 1 |
| 2899 | 1 |
| 1779 | 1 |
| 1766 | 1 |
| 1765 | 1 |
| 1773 | 1 |
| 1742 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | 1713 | §102§103 | Non-Final OA | — | Pending | Nov 28, 2024 |
| 18699377 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES | SULLIVAN, CALEEN O | 2899 | §102 | Non-Final OA | — | Pending | Apr 08, 2024 |
| 18685539 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | WALKE, AMANDA C | 1722 | §103 | Non-Final OA | — | Pending | Feb 22, 2024 |
| 18440124 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | WALKE, AMANDA C | 1722 | §103 | Non-Final OA | — | Pending | Feb 13, 2024 |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | 1737 | §102§103 | Non-Final OA | — | Pending | Feb 07, 2024 |
| 18293639 | CHROMATOGRAPHIC BED INSERT | PEO, JONATHAN M | 1779 | §103 | Non-Final OA | — | Pending | Jan 30, 2024 |
| 18422098 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | EOFF, ANCA | — | §102§103 | Non-Final OA | — | Pending | Jan 25, 2024 |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | 1724 | §102§103 | Non-Final OA | — | Pending | Dec 27, 2023 |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | 1724 | §103 | Final Rejection | — | Pending | Nov 15, 2023 |
| 18374041 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | COSGROVE, JAYSON D | 1737 | §103 | Final Rejection | — | Pending | Sep 28, 2023 |
| 18373415 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT | FANG, SHANE | 1766 | §103 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | 1765 | §102 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18372163 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | COSGROVE, JAYSON D | 1737 | §102§103 | Final Rejection | — | Pending | Sep 25, 2023 |
| 18551755 | METHOD FOR PRODUCING CHROMATOGRAPHY CARRIER, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CHROMATOGRAPHY CARRIER | MCGANN, BERNADETTE KAREN | 1773 | §102§103§112DP | Non-Final OA | — | Pending | Sep 21, 2023 |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | 1742 | §102§103§112 | Non-Final OA | — | Pending | Sep 18, 2023 |
| 18239399 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | EOFF, ANCA | 1722 | §102 | Non-Final OA | — | Pending | Aug 29, 2023 |
| 18233932 | ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | 61d | Pending | Aug 15, 2023 |
| 18277113 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | CHU, JOHN S Y | 1737 | §103 | Final Rejection | 30d | Pending | Aug 14, 2023 |
| 18271715 | METHOD FOR CULTURING HUMAN HEPATIC PARENCHYMAL CELL, CULTURED HUMAN HEPATIC PARENCHYMAL CELL, CULTURE MEDIUM AND METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING CULTURE SUPERNATANT OF HUMAN HEPATIC NONPARENCHYMAL CELL | LEONARD, ARTHUR S | 1631 | §103 | Final Rejection | 29d | Pending | Jul 11, 2023 |
| 18218193 | COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | CHU, JOHN S Y | 1737 | §103§112 | Non-Final OA | — | Pending | Jul 05, 2023 |
| 18270256 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | 1737 | §102§103 | Final Rejection | — | Pending | Jun 29, 2023 |
| 18209751 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | KIFLE, BRUCK | 1624 | §102§112 | Final Rejection | — | Pending | Jun 14, 2023 |
| 18198971 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | ANGEBRANNDT, MARTIN J | 1737 | §103 | Non-Final OA | — | Pending | May 18, 2023 |
| 18197225 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | CUTLIFF, YATE KAI RENE | 1692 | §112 | Non-Final OA | — | Pending | May 15, 2023 |
| 18135838 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | MALLOY, ANNA E | 1737 | §102§103§112 | Final Rejection | — | Pending | Apr 18, 2023 |
| 18125934 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | ZHANG, RUIYUN | 1782 | §102§103§112 | Final Rejection | 72d | Pending | Mar 24, 2023 |
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | 30d | Pending | Mar 13, 2023 |
| 17792348 | KIDNEY REGENERATION ACCELERATOR AND PRODUCTION METHOD FOR SAME | MELLER, MICHAEL V | 1655 | §103 | Non-Final OA | — | Pending | Jul 12, 2022 |
| 17506740 | PHOTOSENSITIVE RESIN COMPOSITION | CHAMPION, RICHARD DAVID | 1737 | §103§112 | Final Rejection | — | Pending | Oct 21, 2021 |
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Start Free TrialJSR Corporation has 29 pending office actions as of October 2026, spread across 15 art units and 22 examiners.
Amanda C Walke has the most, with 2 of JSR Corporation's pending office actions.
Mostly Chemistry & Materials (USPTO Tech Center 1700), based on where its pending office actions are examined.
