Listed by the USPTO as GARCES, NELSON Y
Tech Center 4100 • Art Units: 2814 2892 4100
This examiner grants 81% of resolved cases
GARCES, NELSON Y is assigned to tech center 4100 and art unit 2814. The record covers 606 resolved cases, with an allowance rate of 80.7% and a median of 914 days to allowance. Allowance is the predominant recorded outcome, and the timing figure indicates that applicants should still plan for a meaningful examination period. Interviews show a 3.7% lift, so they appear most useful when a particular issue warrants direct clarification.
The leading companies are Samsung Display Co., Ltd., Intel Corporation, and STMicroelectronics N.V. The principal firms are CANTOR COLBURN LLP, Arcane Law PLLC, and Cooper Legal Group LLC. This mix provides context for display and semiconductor matters. Counsel can use the listed organizations to identify relevant experience while relying on focused written arguments and claim amendments.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18614804 | INTEGRATED CIRCUIT DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18477635 | SEMICONDUCTOR MODULE AND METHOD FOR MANUFACTURING SEMICONDUCTOR MODULE | Final Rejection | FUJI ELECTRIC CO., LTD. |
| 18508827 | PANEL AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | CANON KABUSHIKI KAISHA |
| 18443670 | MASK ASSEMBLY AND METHOD OF MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18422572 | DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., LTD. |
| 18421611 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 17972937 | PIXELATED FILTER COMPRISING AN INTERFERENCE FILTER | Non-Final OA | Commissariat à l'Énergie Atomique et aux Énergies Alternatives |
| 18114120 | PROTECTION AGAINST ELECTROMIGRATION WITHIN A LAYER OF AN INTEGRATED CIRCUIT | Final Rejection | Intel Corporation |
| 18174007 | NANORIBBON-BASED TRANSISTORS WITH ETCH STOP LAYER TO ASSIST SUBFIN REMOVAL | Final Rejection | Intel Corporation |
| 17940195 | BARRIER LAYER FOR DIELECTRIC RECESS MITIGATION | Non-Final OA | Intel Corporation |
| 18505928 | SEMICONDUCTOR DEVICE ASSEMBLIES WITH AN ENCAPSULANT MATERIAL HAVING ENHANCED THERMAL CONDUCTIVITY, AND METHODS FOR MAKING THE SAME | Final Rejection | Micron Technology, Inc. |
| 18292529 | PHOTODIODE ARRAY AND METHOD FOR MANUFACTURING PHOTODIODE ARRAY | Non-Final OA | KYOCERA Corporation |
| 18475476 | CONTACTS FOR JOSEPHSON JUNCTION-BASED QUBITS | Non-Final OA | International Business Machines Corporation |
| 18603113 | METHOD FOR MANUFACTURING A PLURALITY OF ELECTRONIC COMPONENTS | Non-Final OA | STMicroelectronics International N.V. |
| 18590785 | AIR-GAP IN TRENCH FIELD PLATE POWER MOSFET FOR REDUCED POWER LOSS PERFORMANCE | Non-Final OA | STMicroelectronics International N.V. |
| 18443616 | DEVICE PACKAGE AND MANUFACTURING METHOD THEREOF | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18413062 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18756313 | SEMICONDUCTOR DEVICE AND METHOD OF MAKING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED |
| 18760808 | METHOD OF MANUFACTURING LIGHT-EMITTING ELEMENT | Non-Final OA | NICHIA CORPORATION |
| 18038066 | SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF | Final Rejection | Semiconductor Manufacturing International (Beijing) Corporation |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy80.7% of resolved applications examined by Nelson Y Garces were allowed (606 resolved cases), compared with 74.2% across Art Unit 2814 over the last five years.
This examiner's interview lift is +3.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Nelson Y Garces took 914 days on average from filing to allowance.
Nelson Y Garces examines applications in Art Unit 2814 in Tech Center 4100.
