Listed by the USPTO as KIM, JAY C
Tech Center 2800 • Art Units: 2815
This examiner grants 49% of resolved cases
This examiner is assigned to Tech Center 2800 and Art Unit 2815, with 876 resolved cases. The allowance rate is 49.4%, and the median time to allowance is 1290 days. The substantial record indicates a challenging allowance environment and a long median path, making careful claim positioning and prosecution budgeting important.
The interview lift is 21.6%, suggesting that interviews may improve allowance prospects when they address specific technical and claim issues. Practitioners should pair any interview strategy with written support for the proposed claim scope. The leading companies are Enkris Semiconductor Inc., Samsung Electronics Co., Ltd., and Semiconductor Energy Laboratory Co., Ltd. The leading firms are Westbridge IP, Carroll, Hoette & Butscher, and OLIFF PLC.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18613414 | PRINTED CIRCUIT BOARD AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18612110 | MEMORY DEVICE | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18406229 | DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18311038 | DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME | Final Rejection | Samsung Display Co., LTD. |
| 18628217 | SOLID-STATE IMAGING DEVICE | Non-Final OA | SONY SEMICONDUCTOR SOLUTIONS CORPORATION |
| 18032582 | RAY DETECTOR, MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE | Non-Final OA | BOE TECHNOLOGY GROUP CO., LTD. |
| 18648169 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR | Non-Final OA | FUJITSU LIMITED |
| 16476412 | SiC EPITAXIAL WAFER AND METHOD FOR PRODUCING SAME | Non-Final OA | DENSO CORPORATION |
| 18383526 | TRANSISTOR AND DISPLAY DEVICE | Final Rejection | Semiconductor Energy Laboratory Co., Ltd. |
| 18035150 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SEMICONDUCTOR DEVICE | Non-Final OA | Semiconductor Energy Laboratory Co., Ltd. |
| 18421830 | SEMICONDUCTOR-SUPERCONDUCTOR HYBRID DEVICE, ITS MANUFACTURE AND USES | Final Rejection | Microsoft Technology Licensing, LLC |
| 18270077 | SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE | Non-Final OA | KYOCERA Corporation |
| 18272620 | NITRIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR | Non-Final OA | SHIN-ETSU HANDOTAI CO., LTD. |
| 18272621 | NITRIDE SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR | Final Rejection | SHIN-ETSU HANDOTAI CO., LTD. |
| 18687233 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Nuvoton Technology Corporation Japan |
| 18291871 | VARIABLE CAPACITANCE ELEMENT | Final Rejection | Nuvoton Technology Corporation Japan |
| 18196187 | Ohmic Contact for Semiconductor Structures | Final Rejection | Applied Materials, Inc. |
| 18788287 | STRUCTURE FOR DETECTING/MONITORING PROCESS CHARGING DAMAGE DUE TO METAL AND ISOLATION WELL CHARGING | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18783478 | RAISED SOURCE/DRAIN OXIDE SEMICONDUCTING THIN FILM TRANSISTOR AND METHODS OF MAKING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18818538 | TUNED MATERIALS, TUNED PROPERTIES, AND TUNABLE DEVICES FROM ORDERED OXYGEN VACANCY COMPLEX OXIDES | Non-Final OA | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
| 18221404 | HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD FOR FABRICATING THE SAME | Final Rejection | UNITED MICROELECTRONICS CORP. |
| 18228994 | LIGHT-EMITTING ELEMENT STRUCTURE | Final Rejection | GLOBALWAFERS CO., LTD. |
| 18338975 | SEMICONDUCTOR STRUCTURES AND MANUFACTURING METHODS THEREOF | Non-Final OA | ENKRIS SEMICONDUCTOR, INC. |
| 18319437 | MANUFACTURING METHODS OF SEMICONDUCTOR STRUCTURES | Non-Final OA | ENKRIS SEMICONDUCTOR, INC. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy49.4% of resolved applications examined by Jay C Kim were allowed (876 resolved cases), compared with 61.3% across Art Unit 2815 over the last five years.
This examiner's interview lift is +21.6 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jay C Kim took 1,290 days on average from filing to allowance.
Jay C Kim examines applications in Art Unit 2815 in Tech Center 2800 (Semiconductors, Circuits & Optics).
