Listed by the USPTO as KIM, JUNG H
Tech Center 2800 • Art Units: 2816 2836 2842
This examiner grants 89% of resolved cases
This examiner works in Tech Center 2800 and Art Unit 2816, with 780 resolved cases. The allowance rate is 88.6%, and the median time to allowance is 690 days. The substantial record indicates favorable allowance outcomes and a comparatively short median timeline, information that may support more confident prosecution scheduling.
The interview lift is 6.3%, showing only a modest positive association with allowance outcomes. Applicants may use interviews selectively, while maintaining emphasis on clear claim drafting and written responses. The leading companies are STMicroelectronics N.V., ARM Limited, and Texas Instruments Incorporated. The leading firms are ARENTFOX SCHIFF, DeWitt LLP, and JCIPRNET.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18680701 | METHODS AND APPARATUS TO DRIVE INDUCTOR-CAPACITOR (LC) CIRCUITRY WITH SUBHARMONIC INJECTION | Non-Final OA | Texas Instruments Incorporated |
| 18963179 | AMPLIFIER WITH BYPASS MODE AND NOTCH FILTER | Non-Final OA | Skyworks Solutions, Inc. |
| 19056472 | METHOD AND DEVICE FOR REDUCING FILTER DELAY SPREAD IN INTERFACE IP | Non-Final OA | STMicroelectronics International N.V. |
| 18920681 | MULTIPLEXER WITH HIGHLY LINEAR ANALOG SWITCH | Final Rejection | STMicroelectronics International N.V. |
| 18925406 | DROOP PROTECTION METHOD AND CIRCUIT | Final Rejection | Arm Limited |
| 18905956 | Level-Shifting Circuitry Devices and Methods | Non-Final OA | Arm Limited |
| 19038333 | APPARATUS AND METHOD FOR HIGH LINEARITY SLEW ENHANCEMENT ON AN OUTPUT BUFFER | Non-Final OA | Analog Devices, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy88.6% of resolved applications examined by Jung H Kim were allowed (780 resolved cases), compared with 65.8% across Art Unit 2816 over the last five years.
This examiner's interview lift is +6.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jung H Kim took 690 days on average from filing to allowance.
Jung H Kim examines applications in Art Unit 2816 in Tech Center 2800 (Semiconductors, Circuits & Optics).
