Listed by the USPTO as KIM, PETER B
Tech Center 2800 • Art Units: 2851 2882 2892
This examiner grants 83% of resolved cases
KIM, PETER B handles cases in tech center 2800 and art unit 2851. The profile reports 975 resolved cases and an allowance rate of 83.1%. The median time to allowance is 930 days, while interviews are associated with a 9.4% lift in the allowance rate.
The portfolio names Taiwan Semiconductor Manufacturing Company, Ltd., ASML Holding N.V., and NIKON Corporation. Its leading firms are Pillsbury Winthrop Shaw Pittman, LLP, Studebaker Brackett PLLC, and EDELL, SHAPIRO & FINNAN, LLC. The case volume supports using this profile for prosecution planning in the represented technology area. Counsel can also account for the recorded timing when setting expectations for applicants and business teams.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18585271 | MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARKS THEREON | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18780663 | EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND EXPOSURE SYSTEM | Non-Final OA | NIKON CORPORATION |
| 18238027 | EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD | Non-Final OA | NIKON CORPORATION |
| 19076106 | MULTISCALE CONTROL OF SUBSTRATE DEFORMATION IN DEVICE MANUFACTURING | Non-Final OA | Applied Materials, Inc. |
| 18859114 | ADJUSTING EFFECTIVE DEPTH OF FOCUS | Non-Final OA | Applied Materials, Inc. |
| 19025060 | EUV LIGHT SOURCE CONTAMINATION MONITORING SYSTEM | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19002035 | FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18968343 | RETICLE CARRIER AND ASSOCIATED METHODS | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18808284 | APPARATUS AND METHOD FOR OPTICAL INSPECTION OF EUV PELLICLES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18868972 | A MEMBRANE AND ASSOCIATED METHOD AND APPARATUS | Non-Final OA | ASML Netherlands B.V. |
| 18863941 | CONTAMINATION DETERMINATION | Final Rejection | ASML Netherlands B.V. |
| 18719902 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING | Final Rejection | ASML NETHERLANDS B.V. |
| 18570140 | STRUCTURES FOR USE ON A SUBSTRATE HOLDER, SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS AND METHOD | Non-Final OA | ASML NETHERLANDS B.V. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy83.1% of resolved applications examined by Peter B Kim were allowed (975 resolved cases), compared with 76.4% across Art Unit 2851 over the last five years.
This examiner's interview lift is +9.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Peter B Kim took 930 days on average from filing to allowance.
Peter B Kim examines applications in Art Unit 2851 in Tech Center 2800 (Semiconductors, Circuits & Optics).
