Listed by the USPTO as LEE, DOUGLAS
Tech Center 1700 • Art Units: 1711 1714 1718
This examiner grants 45% of resolved cases
LEE, DOUGLAS has 678 resolved cases, a 45.3% allowance rate, and a 13.7% interview lift. The median time to allowance is 1295 days. The profile covers Tech Center 1700 and Art Unit 1711. The allowance rate indicates that allowance has not been achieved in a majority of the resolved record, while the positive interview lift gives interviews a potentially useful role in addressing outstanding issues. The 1295-day median makes timing a material prosecution concern.
The leading companies are Henkel AG & Co. KGaA, Tokyo Electron Limited, and Samsung Electronics Co., Ltd. The principal firms are Chrisman Gallo Tochtrop LLC, Maschoff Brennan, and SCULLY SCOTT MURPHY & PRESSER, PC. This recurring applicant and counsel mix provides context for preparing technical amendments and interview agendas.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18888814 | ELECTRONIC APPARATUS FOR ADAPTIVELY CHANGING CLEANING PATH BASED ON DUST DISTRIBUTION AND CONTROL METHOD THEREOF | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18455976 | CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE | Final Rejection | CANON KABUSHIKI KAISHA |
| 19173239 | DE-POWDERING OF ADDITIVE MANUFACTURING BUILD | Non-Final OA | General Electric Company |
| 18726779 | ZONE CLEANING CONTROL METHOD AND APPARATUS FOR CLEANING ROBOT, AND ELECTRONIC DEVICE | Non-Final OA | Beijing Roborock Technology Co., Ltd. |
| 18879383 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND STORAGE MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18949248 | SUBSTRATE STANDBY DEVICE, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD | Final Rejection | Tokyo Electron Limited |
| 18526000 | ENVIRONMENT SCRUBBING VIA SWARM DEVICES | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18442234 | METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES | Non-Final OA | Applied Materials, Inc. |
| 18883420 | METHOD AND ARRANGEMENT FOR PRE-CLEANING AN ENDOSCOPE | Final Rejection | Olympus Winter & Ibe GmbH |
| 18615395 | LASER SURFACE MODIFICATION METHOD AND SYSTEM FOR IMPROVED PLATE SURFACE | Non-Final OA | Rockwell Collins, Inc |
| 18356486 | COMPOSITIONS AND METHODS OF USE THEREOF | Non-Final OA | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. |
| 18879974 | SYSTEM AND METHOD FOR REMOVAL OF RESIN FROM 3D PRINTED OBJECTS | Non-Final OA | PostProcess Technologies, Inc. |
| 18440548 | AUTOMATIC SWIMMING POOL CLEANER WITH MORE THAN ONE BATTERY PACK | Non-Final OA | ZODIAC POOL CARE EUROPE |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy45.3% of resolved applications examined by Douglas Lee were allowed (678 resolved cases), compared with 63.9% across Art Unit 1711 over the last five years.
This examiner's interview lift is +13.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Douglas Lee took 1,295 days on average from filing to allowance.
Douglas Lee examines applications in Art Unit 1711 in Tech Center 1700 (Chemistry & Materials).
