Prosecution Insights
Last updated: October 26, 2026

Hwa S Lee, USPTO Patent Examiner

Listed by the USPTO as LEE, HWA S

Tech Center 3700 • Art Units: 1799 2800 2877 2886 3792

This examiner grants 72% of resolved cases

Analysis

LEE, HWA S has 750 resolved cases and a 72.3% allowance rate. The interview lift is 3.3%, and the median time to allowance is 1095 days. The examiner is assigned to Tech Center 3700 and Art Unit 1799. The allowance rate indicates a favorable outcome pattern, while the limited positive interview lift suggests that interviews have produced only a small measured difference. The 1095-day median should be incorporated into prosecution timelines.

The recurring companies are Hamamatsu Photonics K.K., Google LLC, and Cilag GmbH International. The leading firms are DINSMORE & SHOHL LLP, FAEGRE DRINKER BIDDLE & REATH LLP (DC), and Alleman Hall LLP. This combination gives counsel context for optical, software, and life-science matters in the docket.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

72.3%
Allow Rate
+2.3% vs TC avg
798
Total Applications
+3.3%
Interview Lift
1095
Avg Prosecution Days
Based on 750 resolved cases, 2023–2026

Rejection Statute Breakdown

4.3%
§101 Eligibility
20.8%
§102 Novelty
32.9%
§103 Obviousness
34.2%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18700512 System and Methods for Measuring Stimulated Raman Scattering Final Rejection Google LLC
18810230 SHARED SET OF OBJECT REGISTRATIONS FOR SURGICAL DEVICES USING INDEPENDENT REFERENCE PLANES Final Rejection Cilag GmbH International
18846341 MULTICORE OPTICAL FIBER, OPTICAL COMBINER, AND METHOD OF MEASURING FIBER CHARACTERISTICS Final Rejection SUMITOMO ELECTRIC INDUSTRIES, LTD.
18950734 DIFFERENTIAL MEASUREMENT OF IR ABSORPTION IN PLASMONIC MEMS SENSORS Non-Final OA TEXAS INSTRUMENTS INCORPORATED
17994900 AUTOMATIC QUALITY CATEGORIZATION METHOD AND SYSTEM FOR PHARMACEUTICAL GLASS CONTAINERS Non-Final OA CORNING INCORPORATED
18850772 TECHNIQUES FOR COLOR BATCH CORRECTION Final Rejection PPG INDUSTRIES OHIO, INC.
18863040 SPECTROSCOPIC ANALYSIS DEVICE Final Rejection HAMAMATSU PHOTONICS K.K.
18884192 SPECTROSCOPIC ANALYZER Final Rejection HAMAMATSU PHOTONICS K.K.
17311422 APPARATUS AND METHOD FOR GROUPING IMAGE PATTERNS TO DETERMINE WAFER BEHAVIOR IN A PATTERNING PROCESS Non-Final OA ASML NETHERLANDS B.V.
18983683 POSITION MEASUREMENT METHOD AND DEVICE Non-Final OA BRIGHTEST TECHNOLOGY TAIWAN CO., LTD.

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Frequently Asked Questions

What is examiner Hwa S Lee's allowance rate?

72.3% of resolved applications examined by Hwa S Lee were allowed (750 resolved cases), compared with 50.4% across Art Unit 1799 over the last five years.

Does an interview help with examiner Hwa S Lee?

This examiner's interview lift is +3.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Hwa S Lee take to allow a patent?

Applications allowed by Hwa S Lee took 1,095 days on average from filing to allowance.

Which art unit does examiner Hwa S Lee work in?

Hwa S Lee examines applications in Art Unit 1799 in Tech Center 3700 (Medical Devices & Mechanical Engineering).

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