Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1711
This examiner grants 64% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18790857 | BUBBLE GENERATION DEVICE AND WASHING MACHINE HAVING SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18387316 | WASHING MACHINE AND CONTROL METHOD THEREOF | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18189953 | WASHING MACHINE AND CONTROLLING METHOD FOR SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18238892 | SYSTEMS FOR FLUID SUPPLY CONTAINMENT WITHIN ADDITIVE MANUFACTURING APPARATUSES | Non-Final OA | General Electric Company |
| 18315450 | SMALL PARTS CLEANING APPARATUS AND METHODS OF USE | Non-Final OA | Genentech, Inc. |
| 18793528 | LAUNDRY TREATMENT APPARATUS | Non-Final OA | LG ELECTRONICS INC. |
| 18835575 | METHOD FOR CONTROLLING CLOTHES TREATMENT APPARATUS | Non-Final OA | LG ELECTRONICS INC. |
| 18735431 | LAUNDRY TREATING APPARATUS AND SYSTEM HAVING THE SAME | Non-Final OA | LG Electronics Inc. |
| 17466735 | LAUNDRY TREATING APPARATUS | Final Rejection | LG Electronics Inc. |
| 18790202 | Pressure washer | Non-Final OA | Andreas Stihl AG & Co. KG |
| 17956293 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | KIOXIA CORPORATION |
| 18227156 | SUBSTRATE PROCESSING APPARATUS, SUPPLY SYSTEM, SUBSTRATE PROCESSING METHOD, AND SUPPLY METHOD | Non-Final OA | Tokyo Electron Limited |
| 18458740 | WASHING MACHINE FLUID SYSTEM DIAGNOSIS USING SOUND SIGNALS | Non-Final OA | Haier US Appliance Solutions, Inc. |
| 18177483 | WASHING MACHINE WITH ADAPTIVE ONE-STEP WASH AND DRY CYCLE | Non-Final OA | Haier US Appliance Solutions, Inc. |
| 18834103 | HIGH-PRESSURE WASHER | Non-Final OA | Jong Mo KIM |
| 18742740 | SYSTEMS FOR DECOLORING AND RECYCLING PURE FIBERS | Final Rejection | Looptworks Inc. |
| 18677435 | OZONE AND HYDROXYL INJECTION SYSTEMS | Non-Final OA | Omni Solutions LLC |
| 18287908 | INLINE SILICON DEPOSITION IN A PICKLING PLANT | Non-Final OA | Primetals Technologies Austria GmbH |
| 18369002 | CLEANING APPARATUS FOR WAFER STORAGE CONTAINER | Final Rejection | SHIBAURA MECHATRONICS CORPORATION |
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