Listed by the USPTO as LEE, SHUN K
Tech Center 2800 • Art Units: 2884
This examiner grants 43% of resolved cases
LEE, SHUN K examines in Tech Center 2800 and Art Unit 2884. The record contains 725 resolved cases and an allowance rate of 42.6%. The median time to allowance is 1293 days, indicating both a demanding recorded outcome pattern and a lengthy prosecution horizon.
Interviews show a 16.4% lift, making them a relevant option when developing prosecution strategy. NEC, GE Precision Healthcare, and Canon are the leading listed companies. MCDONALD HOPKINS, Abel Schillinger, and FAEGRE DRINKER BIDDLE & REATH are the leading listed firms. The company mix reflects medical, imaging, and communications-related work.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19172208 | RADIATION IMAGING APPARATUS AND MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19204715 | BOLOMETER ARRAY, BOLOMETER ARRAY UNIT, AND LIGHT DETECTION METHOD | Non-Final OA | NEC Corporation |
| 18772245 | BOLOMETER, DETECTION METHOD, AND BOLOMETER MANUFACTURING METHOD | Final Rejection | NEC Corporation |
| 18325438 | DETECTOR AND MOBILE TERMINAL | Non-Final OA | HUAWEI TECHNOLOGIES CO., LTD. |
| 19175685 | MEDICAL SYSTEM AND RECORDING MEDIUM | Non-Final OA | GE Precision Healthcare LLC |
| 18771774 | METHOD AND SYSTEM FOR AUTOMATIC SCAN SUBJECT POSITIONING | Final Rejection | GE Precision Healthcare LLC |
| 18786747 | Filter Control for a Medical Imaging System | Final Rejection | Siemens Healthineers AG |
| 18727694 | ELECTRIC CIRCUITRY FOR BASELINE RESTORATION | Non-Final OA | ams International AG |
| 18998713 | DIAMOND RADIATION DETECTOR | Non-Final OA | TOHOKU UNIVERSITY |
| 18780724 | METHOD FOR EVALUATING SiC SUBSTRATE, METHOD FOR MANUFACTURING SiC SUBSTRATE, AND SiC SUBSTRATE EVALUATION DEVICE | Final Rejection | Resonac Corporation |
| 18822903 | MASS ESTIMATION METHOD AND X-RAY INSPECTION APPARATUS | Final Rejection | ANRITSU CORPORATION |
| 19205136 | SYSTEM AND METHOD FOR CONTINUOUS CALIBRATION OF X-RAY SCANS | Non-Final OA | Hologic, Inc. |
| 19082747 | OPTICAL MEASUREMENT DEVICE AND OPTICAL MEASUREMENT METHOD | Non-Final OA | HAMAMATSU PHOTONICS K.K. |
| 18771605 | RADIATION DETECTION APPARATUS HAVING A STABILIZED PHOTOMULTIPLIER | Final Rejection | Luxium Solutions, LLC |
| 18569310 | HANDHELD 3D SCANNER | Final Rejection | CREAFORM INC. |
| 18356979 | MULTI-SPOT CONFOCAL IMAGING SYSTEM WITH SPECTRAL MULTIPLEXING | Final Rejection | FEI DEUTSCHLAND GMBH |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy42.6% of resolved applications examined by Shun K Lee were allowed (725 resolved cases), compared with 73.0% across Art Unit 2884 over the last five years.
This examiner's interview lift is +16.4 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Shun K Lee took 1,293 days on average from filing to allowance.
Shun K Lee examines applications in Art Unit 2884 in Tech Center 2800 (Semiconductors, Circuits & Optics).
