Prosecution Insights
Last updated: October 26, 2026

Henok D Legesse, USPTO Patent Examiner

Listed by the USPTO as LEGESSE, HENOK D

Tech Center 2800 • Art Units: 2681 2853 2861

This examiner grants 86% of resolved cases

Analysis

LEGESSE, HENOK D is associated with Tech Center 2800 and Art Unit 2681. The profile includes 1100 resolved cases, an allowance rate of 86.5%, and an interview lift of 2.2%. The median time to allowance is 789 days. The large resolved-case record gives the allowance figure a substantial evidentiary base, while the interview measure indicates only a limited change associated with interviews in the reported cases.

The listed companies are Seiko Epson Corporation, Canon Inc., and Ricoh Company, Ltd. The listed firms are Venable LLP, WORKMAN NYDEGGER, and CANTOR COLBURN LLP. Prosecution teams may therefore place greater emphasis on claim drafting, amendment discipline, and written responses than on relying primarily on interviews. The median timing figure provides a separate planning consideration for applicants managing continuation, portfolio, or commercial launch decisions.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

86.5%
Allow Rate
+18.5% vs TC avg
1,120
Total Applications
+2.2%
Interview Lift
789
Avg Prosecution Days
Based on 1100 resolved cases, 2023–2026

Rejection Statute Breakdown

1.1%
§101 Eligibility
31.3%
§102 Novelty
42.5%
§103 Obviousness
14.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19178838 PRINTING CASSETTE AND PRINTER Non-Final OA BROTHER KOGYO KABUSHIKI KAISHA
19203724 PRINTING APPARATUS AND METHOD OF CONTROLLING PRINTING APPARATUS Non-Final OA CANON KABUSHIKI KAISHA
19195841 PRINTING APPARATUS Non-Final OA CANON KABUSHIKI KAISHA
19187428 DRYING DEVICE AND PRINTING SYSTEM Non-Final OA SEIKO EPSON CORPORATION
19076073 LIQUID EJECTION APPARATUS AND CONTROL METHOD FOR LIQUID EJECTION APPARATUS Non-Final OA SEIKO EPSON CORPORATION
19088086 NEGATIVE PRESSURE REGULATION VALVE AND INKJET RECORDING APPARATUS INCLUDING THE SAME Non-Final OA KYOCERA Document Solutions Inc.
18557645 DEFORMATION FACTORS BASED ON TENSION AND MEDIA ADVANCEMENT DATA Non-Final OA Hewlett-Packard Development Company, L.P.
18431105 WIPING DEVICE AND LIQUID DISCHARGE APPARATUS Non-Final OA RICOH COMPANY, LTD.
19175326 PRINTER WITH HIGH PRODUCTIVITY MEDIA SCANNING Non-Final OA ELECTRONICS FOR IMAGING, INC.

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Frequently Asked Questions

What is examiner Henok D Legesse's allowance rate?

86.5% of resolved applications examined by Henok D Legesse were allowed (1,100 resolved cases), compared with 85.6% across Art Unit 2681 over the last five years.

Does an interview help with examiner Henok D Legesse?

This examiner's interview lift is +2.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Henok D Legesse take to allow a patent?

Applications allowed by Henok D Legesse took 789 days on average from filing to allowance.

Which art unit does examiner Henok D Legesse work in?

Henok D Legesse examines applications in Art Unit 2681 in Tech Center 2800 (Semiconductors, Circuits & Optics).

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