Listed by the USPTO as LEWIS, CHERYL RENEA
Tech Center 2400 • Art Units: 2151 2154 2155 2166 2167 2492
This examiner grants 93% of resolved cases
Cheryl Renea Lewis has 511 resolved cases in Tech Center 2400. She has a very high allowance rate of 92.8 percent. The median time to allowance is 891 days. The interview lift is 7.9 percent, showing a small positive impact from interviews in Art Unit 2151.
Samsung Electronics Co., Ltd. and View Systems Inc. are frequent applicants. Keller Preece PLLC and NSIP LAW are among the top firms. The 92.8 percent allowance rate and 891 median days to allowance suggest an efficient and highly favorable prosecution environment.
With 511 resolved cases, the 92.8 percent allowance rate is exceptionally high. The 7.9 percent interview lift adds to this already strong probability of success. Practitioners can expect a relatively fast 891-day median pendency, making Art Unit 2151 one of the more efficient units for these applicants to navigate.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19340718 | METHOD AND APPARATUS FOR DATA GENERATION | Non-Final OA | Samsung Electronics Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy92.8% of resolved applications examined by Cheryl Renea Lewis were allowed (511 resolved cases), compared with 81.0% across Art Unit 2151 over the last five years.
This examiner's interview lift is +7.9 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Cheryl Renea Lewis took 891 days on average from filing to allowance.
Cheryl Renea Lewis examines applications in Art Unit 2151 in Tech Center 2400 (Networking & Security).
