Listed by the USPTO as LI, ZHUO H
Tech Center 2100 • Art Units: 2133 2139 2185 2189
This examiner grants 89% of resolved cases
LI, ZHUO H is assigned to USPTO tech center 2100 and art unit 2133. The record includes 597 resolved cases, an 88.8% allowance rate, a 3.6% interview lift, and a median of 954 days to allowance. The high allowance rate and modest interview measure describe a profile where ordinary written prosecution outcomes are a significant part of the available record.
Micron Technology Inc., Samsung Electronics Co., Ltd., and Lodestar Licensing Group LLC appear among the leading companies. AMIN, TUROCY & WATSON, LLP, IP & T GROUP LLP, and SUGHRUE MION, PLLC are the listed firms. Applicants can use this representation pattern to anticipate semiconductor-focused claim issues and to coordinate interview use with written responses.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18891579 | MEMORY SYSTEM, OPERATING METHOD OF MEMORY SYSTEM, AND OPERATING METHOD OF MEMORY CONTROLLER | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19070291 | LOGICAL TO PHYSICAL MEMORY ADDRESS MAPPING USING BITMAPS | Final Rejection | Micron Technology, Inc. |
| 19067399 | ADVANCED FILE SYSTEM WITH DYNAMIC BLOCK ALLOCATION | Final Rejection | Micron Technology, Inc. |
| 18961097 | APPARATUSES AND METHODS FOR OPERATIONS IN A SELF-REFRESH STATE | Non-Final OA | Lodestar Licensing Group LLC |
| 19046543 | DATA STORAGE DEVICE TO EFFICIENTLY MANAGE MAP DATA AND METHOD OF OPERATING THE SAME | Final Rejection | SK hynix Inc. |
| 18758387 | Power Gating for Memory Physical Layers | Non-Final OA | Advanced Micro Devices, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy88.8% of resolved applications examined by Zhuo H Li were allowed (597 resolved cases), compared with 85.8% across Art Unit 2133 over the last five years.
This examiner's interview lift is +3.6 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Zhuo H Li took 954 days on average from filing to allowance.
Zhuo H Li examines applications in Art Unit 2133 in Tech Center 2100 (Computing & Software).
