Prosecution Insights
Last updated: October 27, 2026

Alex Kok Soon Liew, USPTO Patent Examiner

Listed by the USPTO as LIEW, ALEX KOK SOON

Tech Center 3700 • Art Units: 2624 2668 2674 3663 3795

This examiner grants 88% of resolved cases

Analysis

LIEW, ALEX KOK SOON handles cases in USPTO tech center 3700 and art unit 2624. The profile covers 1122 resolved cases, with an 87.7% allowance rate, a 7.2% interview lift, and a median of 944 days to allowance. The large record makes the allowance measure a useful planning signal, while the interview figure reflects a more limited observed effect.

Micron Technology Inc., Samsung Electronics Co., Ltd., and Canon Inc. are the principal companies. SUGHRUE MION, PLLC, AGORA LAW GROUP, PLLC, and Ahmann Kloke LLP are the listed firms. The company mix suggests substantial electronics and imaging experience, so applicants should connect claim language closely to disclosed technical structure and operation.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

87.7%
Allow Rate
+17.7% vs TC avg
1,154
Total Applications
+7.2%
Interview Lift
944
Avg Prosecution Days
Based on 1122 resolved cases, 2023–2026

Rejection Statute Breakdown

11.3%
§101 Eligibility
17.3%
§102 Novelty
63.9%
§103 Obviousness
4.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
19064174 METHOD AND ELECTRONIC DEVICE FOR MOTION-BASED IMAGE ENHANCEMENT Non-Final OA SAMSUNG ELECTRONICS CO., LTD.
19014029 OPEN-VOCABULARY OBJECT DETECTION IN IMAGES Non-Final OA Google LLC
18873345 GAZE DETECTION DEVICE Non-Final OA Sony Group Corporation
18969700 MONITORING SYSTEM, MONITORING METHOD, AND MONITORING PROGRAM Non-Final OA NEC Corporation
19086389 IMAGE PROCESSING METHOD AND RELATED DEVICE THEREOF Non-Final OA HUAWEI TECHNOLOGIES CO., LTD.
19111512 IMAGE PROCESSING DEVICE AND IMAGE PROCESSING METHOD Non-Final OA Panasonic Intellectual Property Management Co., Ltd.
19023452 JUDGMENT DEVICE, JUDGMENT METHOD, AND STORAGE MEDIUM Non-Final OA HONDA MOTOR CO., LTD.
18873398 IMAGE EDITING DEVICE, IMAGE EDITING METHOD, AND IMAGE EDITING PROGRAM Non-Final OA Konica Minolta, Inc.
18954735 SYSTEM FOR PROVIDING AN AUTOMATIC SEGMENTATION FOR NON-CONTRAST COMPUTED TOMOGRAPHY IMAGING DATA AND METHOD THEREOF Non-Final OA Siemens Healthineers AG
18823494 Surveillance Camera Upgrade via Removable Media having Deep Learning Accelerator and Random Access Memory Non-Final OA Micron Technology, Inc.
18590759 SYSTEM AND METHOD FOR EFFICIENT HARDWARE-ACCELERATED NEURAL NETWORK CONVOLUTION Final Rejection Micron Technology, Inc.
18878565 ELECTRONIC DEVICE, CONTROL METHOD, AND CONTROL PROGRAM Non-Final OA KYOCERA Corporation
18406658 DETECTION AND CHARACTERIZATION OF WELDING DEFECTS Final Rejection Baker Hughes Holdings LLC
18923346 IMAGE PROCESSING APPARATUS, METHOD THEROF AND METHOD OF TRAINING NEURAL NETWORK Non-Final OA SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
18265431 FEATURE EXTRACTION METHOD FOR EXTRACTING FEATURE VECTORS FOR IDENTIFYING PATTERN OBJECTS Non-Final OA ASML NETHERLANDS B.V.
19000667 DEVICES, METHODS, AND GRAPHICAL USER INTERFACES FOR ANALYZING, LABELING, AND MANAGING LAND IN A GEOSPATIAL PLATFORM Non-Final OA AIDash, Inc.

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Frequently Asked Questions

What is examiner Alex Kok Soon Liew's allowance rate?

87.7% of resolved applications examined by Alex Kok Soon Liew were allowed (1,122 resolved cases), compared with 74.2% across Art Unit 2624 over the last five years.

Does an interview help with examiner Alex Kok Soon Liew?

This examiner's interview lift is +7.2 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.

How long does examiner Alex Kok Soon Liew take to allow a patent?

Applications allowed by Alex Kok Soon Liew took 944 days on average from filing to allowance.

Which art unit does examiner Alex Kok Soon Liew work in?

Alex Kok Soon Liew examines applications in Art Unit 2624 in Tech Center 3700 (Medical Devices & Mechanical Engineering).

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