Listed by the USPTO as LUND, JEFFRIE ROBERT
Tech Center 1700 • Art Units: 1713 1714 1716 1718 1792
This examiner grants 61% of resolved cases
Jeffrie Robert Lund is an examiner in Tech Center 1700 and Art Unit 1713 with 752 resolved cases. The allowance rate is 60.6 percent. The median pendency to allowance is 1452 days, and the interview lift is 29.3 percent. This 29.3 percent lift provides a mechanism for advancing prosecution within the 60.6 percent allowance rate.
Applied Materials Inc. and Tokyo Electron Limited are among the top companies in the 752 resolved cases. Firms like VOLPE KOENIG and Anova Law Group, PLLC represent many of these applicants. The 29.3 percent interview lift is a factor for practitioners to consider when managing the 1452-day median pendency. This 1452-day timeline is a consideration for portfolio management. The 60.6 percent allowance rate indicates the approach to examination, where advocacy can lead to successful outcomes for the applicant.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18324411 | SUBSTRATE SUPPORTS, SEMICONDUCTOR PROCESSING SYSTEMS, AND MATERIAL LAYER DEPOSITION METHODS | Final Rejection | ASM IP Holding, B.V. |
| 18825163 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18035401 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE | Non-Final OA | Tokyo Electron Limited |
| 19018386 | EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY | Non-Final OA | Applied Materials, Inc. |
| 18745494 | Heated Process Kit for Substrate Processing | Final Rejection | Applied Materials, Inc. |
| 18671402 | THERMALLY AND ELECTRICALLY CONDUCTIVE ADHESIVE FOR GROUNDING AND THERMAL GAP FILLING OF ELECTRODES | Non-Final OA | Applied Materials, Inc. |
| 18581127 | SILICON CARBIDE AND QUARTZ COMPOSITIONS FOR PROCESSING CHAMBERS, AND RELATED COMPONENTS AND METHODS | Non-Final OA | Applied Materials, Inc. |
| 18308776 | EPI THERMAL PROFILE TUNING WITH LAMP RADIATION SHIELDS | Final Rejection | Applied Materials, Inc. |
| 18746499 | SUBSTRATE PROCESSING APPARATUS, PROCESS VESSEL, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM | Non-Final OA | KOKUSAI ELECTRIC CORPORATION |
| 17898760 | SUBSTRATE PROCESSING APPARATUS, EXHAUST DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | Kokusai Electric Corporation |
| 17993996 | PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
| 18574169 | CONTAINER FOR VOLATILE RAW MATERIALS, AND SOLID GASIFICATION AND SUPPLY SYSTEM | Final Rejection | KOJUNDO CHEMICAL LABORATORY CO., LTD. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy60.6% of resolved applications examined by Jeffrie Robert Lund were allowed (752 resolved cases), compared with 62.4% across Art Unit 1713 over the last five years.
This examiner's interview lift is +29.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Jeffrie Robert Lund took 1,452 days on average from filing to allowance.
Jeffrie Robert Lund examines applications in Art Unit 1713 in Tech Center 1700 (Chemistry & Materials).
