Listed by the USPTO as MACARTHUR, SYLVIA
Tech Center 2800 • Art Units: 1713 1716 1718 1792 2813 2899
This examiner grants 66% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18758486 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18538419 | INTERNAL PRESSURE CONTROL APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18754712 | MASK ASSEMBLY, AND APPARATUS FOR MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 18423577 | TOOLS AND METHODS FOR SUBTRACTIVE METAL PATTERNING | Non-Final OA | Intel Corporation |
| 18958534 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18663644 | SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18392102 | SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18483608 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE GRIPPING DEVICE | Non-Final OA | Tokyo Electron Limited |
| 18552108 | SUBSTRATE LIQUID-TREATMENT DEVICE | Final Rejection | Tokyo Electron Limited |
| 18824860 | SUBSTRATE PROCESSING APPARATUS HAVING A MIDDLE ELECTRODE | Non-Final OA | SK hynix Inc. |
| 17786520 | SURFACE PROFILING AND TEXTURING OF CHAMBER COMPONENTS | Final Rejection | APPLIED MATERIALS, INC. |
| 18663606 | HEAT CLEANING SYSTEM AND METHOD FOR CMP PAD BY-PRODUCT CONTROL | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18763852 | SYSTEM FOR STORING CHEMICAL LIQUID AND METHOD FOR ADJUSTING GAS CONCENTRATION IN CHEMICAL LIQUID | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
| 18667673 | POLISHING APPARATUS | Non-Final OA | Taiwan Semiconductor Manufacturing Company Limited |
| 18390936 | Workpiece Processing Apparatus with Contact Temperature Sensor | Non-Final OA | Mattson Technology, Inc. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy65.9% of resolved applications examined by Sylvia Macarthur were allowed (973 resolved cases), compared with 62.4% across Art Unit 1713 over the last five years.
This examiner's interview lift is +25.7 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Sylvia Macarthur took 1,331 days on average from filing to allowance.
Sylvia Macarthur examines applications in Art Unit 1713 in Tech Center 2800 (Semiconductors, Circuits & Optics).
