Listed by the USPTO as MIHALIOV, DMITRI
Tech Center 4100 • Art Units: 2812 4100
This examiner grants 74% of resolved cases
MIHALIOV, DMITRI practices in tech center 4100 and art unit 2812. The profile contains 31 resolved cases, an allowance rate of 74.2%, and a median of 1242 days to allowance. Interviews show a 33.3% lift, making interview preparation a notable consideration for applicants seeking to improve prosecution outcomes in this record.
The listed companies include Taiwan Semiconductor Manufacturing Company, Ltd., LG Display Co., Ltd., and Intel Corporation. The listed firms are BIRCH STEWART KOLASCH & BIRCH, LLP, SCHWABE, WILLIAMSON & WYATT, P.C., and CKC & Partners Co., LLC. Because the sample is limited, practitioners should use these figures as directional indicators rather than as a complete measure of examination behavior.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18776531 | SEMICONDUCTOR PACKAGE | Non-Final OA | Samsung Electronics Co., Ltd. |
| 17987623 | DISPLAY DEVICE | Non-Final OA | LG Display Co., Ltd. |
| 17980472 | A LIGHT EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF INCLUDING A LOW-LEVEL VOLTAGE POWER LINE DISPOSED ON A SUBPIXEL SUBSTRATE AND A DISPLAY PANEL COMPRISING INVERTED GROUPS OF SUBPIXELS | Non-Final OA | LG Display Co., Ltd. |
| 17485325 | OXIDE LAYER DOPING ON A SUB CHANNEL OF A TRANSISTOR STRUCTURE | Non-Final OA | Intel Corporation |
| 17485202 | CMOS INTEGRATION OF 2D MATERIAL BY END ETCH | Non-Final OA | Intel Corporation |
| 18904864 | SEMICONDUCTOR DEVICE | Non-Final OA | Mitsubishi Electric Corporation |
| 17818395 | PRE-PLATED LEAD TIP FOR WETTABLE FLANK LEADFRAME | Final Rejection | TEXAS INSTRUMENTS INCORPORATED |
| 18787428 | MANUFACTURING METHOD OF MEMORY DEVICE | Non-Final OA | SK hynix Inc. |
| 18757262 | IMAGE SENSING DEVICE AND METHOD FOR MANUFACTURING THE SAME | Non-Final OA | SK hynix Inc. |
| 18404290 | SEMICONDUCTOR STRUCTURE INCLUDING MICRO WELLS WITH DIFFERENT HEIGHTS | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18347329 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17887499 | A Semiconductor Package Comprising An Underfill Material That Extends to, And is Coplanar With, A Bottom Surface Of An Electrical Device | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17694889 | LIGHT-EMITTING ELEMENT WITH INTERMEDIATE LAYER BETWEEN SEMICONDUCTOR LAYERS AND DISPLAY DEVICE INCLUDING THE SAME | Non-Final OA | POSTECH Research and Business Development Foundation |
| 18787369 | OXIDATION AND CORROSION PREVENTION IN SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICE ASSEMBLIES | Non-Final OA | SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy74.2% of resolved applications examined by Dmitri Mihaliov were allowed (31 resolved cases), compared with 82.1% across Art Unit 2812 over the last five years.
This examiner's interview lift is +33.3 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Dmitri Mihaliov took 1,242 days on average from filing to allowance.
Dmitri Mihaliov examines applications in Art Unit 2812 in Tech Center 4100.
