Listed by the USPTO as MILLER, MICHAEL G
Tech Center 2800 • Art Units: 1692 1712 1787 1792 1795 2817
This examiner grants 52% of resolved cases
MILLER, MICHAEL G works in tech center 2800 and art unit 1692. The profile includes 650 resolved cases, an allowance rate of 52.3%, and a median of 1458 days to allowance. The 15.6% interview lift indicates some positive association with interviews, but the allowance result and extended pendency support careful planning for claim scope and prosecution duration.
The listed companies are ASM IP Holding B.V., Lam Research Corporation, and Samsung Display Co., Ltd. The leading firms are BANNER & WITCOFF, LTD., Snell & Wilmer (ASM IP Holding B.V.), and CANTOR COLBURN LLP. Counsel may benefit from early issue identification, disciplined written responses, and selective interviews supported by a clear technical agenda.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18931594 | MASK ASSEMBLY, APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS | Non-Final OA | Samsung Display Co., Ltd. |
| 19282309 | LIDAR REFLECTIVE MATERIAL AND MARKING SYSTEM | Non-Final OA | Toyota Motor Engineering & Manufacturing North America, Inc. |
| 19194543 | SUBSTRATE PROCESSING APPARATUS WITH TEMPERATURE CONTROLLER | Non-Final OA | ASM IP Holding B.V. |
| 19065143 | APPARATUS AND METHOD FOR PROVIDING A PULSE OF A PRECURSOR | Non-Final OA | ASM IP Holding B.V. |
| 18783002 | METHOD FOR FORMING A MOLYBDENUM SILICIDE LAYER ON A SURFACE OF A SUBSTRATE | Non-Final OA | ASM IP Holding B.V. |
| 18463034 | COMPOSITIONS COMPRISING BORAZINE AND ITS DERIVATIVES, AND RELATED METHODS AND SYSTEMS | Final Rejection | ASM IP Holding, B.V. |
| 18720153 | ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS | Non-Final OA | Lam Research Corporation |
| 19165590 | METHOD FOR CONSTRUCTING FRONT EDGE PROTECTIVE LAYER FOR WIND TURBINE BLADE, AND PROTECTIVE LAYER FOR WIND TURBINE BLADE | Non-Final OA | MITSUBISHI HEAVY INDUSTRIES, LTD. |
| 19205415 | CLEANING METHOD AND FILM-FORMING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18415616 | SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy52.3% of resolved applications examined by Michael G Miller were allowed (650 resolved cases), compared with 71.8% across Art Unit 1692 over the last five years.
This examiner's interview lift is +15.6 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Michael G Miller took 1,458 days on average from filing to allowance.
Michael G Miller examines applications in Art Unit 1692 in Tech Center 2800 (Semiconductors, Circuits & Optics).
