Listed by the USPTO as MOORE, KARLA A
Tech Center 1700 • Art Units: 1712 1713 1716 1718 1737 1782 1792
This examiner grants 43% of resolved cases
MOORE, KARLA A is a USPTO patent examiner in Tech Center 1700 and Art Unit 1712. The profile covers 791 resolved cases, with an allowance rate of 43.1%. The median time to allowance is 1508 days. The interview lift is 13.6%, indicating a positive association that is modest relative to the broader prosecution challenge reflected in the allowance rate.
The leading companies are Applied Materials Inc., Samsung Display Co., Ltd., and Tokyo Electron Limited. The leading firms are HARNESS, DICKEY & PIERCE, P.L.C., CANTOR COLBURN LLP, and VOLPE KOENIG. The substantial record supports planning around a longer prosecution timeline and a lower allowance outcome. Interviews may help address defined issues, but practitioners should give equal attention to claim construction, prior-art distinctions, and amendment strategy.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18428510 | ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18238874 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 19029464 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE | Final Rejection | Samsung Display Co., Ltd. |
| 18678194 | MASK ASSEMBLY, APPARATUS FOR MANUFACTURING DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY DEVICE | Non-Final OA | Samsung Display Co., Ltd. |
| 18636359 | DEPOSITION MASK | Final Rejection | Samsung Display Co., LTD. |
| 18519545 | CONTROL SYSTEM OF DEPOSITION SOURCE | Non-Final OA | Samsung Display Co., LTD. |
| 18489608 | DEPOSITION APPARATUS | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18331333 | APPARATUS FOR MANUFACTURING DISPLAY DEVICE | Final Rejection | SAMSUNG DISPLAY CO., LTD. |
| 18172158 | PROCESSING SYSTEM FOR SEMICONDUCTOR WAFERS | Final Rejection | ASM IP Holding, B.V. |
| 18092362 | REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REMOTE PLASMA | Non-Final OA | ASM IP Holding B.V. |
| 17169440 | REACTOR SYSTEM WITH MULTI-DIRECTIONAL REACTION CHAMBER | Non-Final OA | ASM IP Holding B.V. |
| 17631984 | EDGE RING SYSTEMS FOR SUBSTRATE PROCESSING SYSTEMS | Non-Final OA | LAM RESEARCH CORPORATION |
| 18589750 | SUBSTRATE PROCESSING DEVICE | Final Rejection | Kioxia Corporation |
| 18720641 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18411359 | PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17542874 | PLASMA PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 17501889 | PLASMA PROCESSING APPARATUS | Final Rejection | TOKYO ELECTRON LIMITED |
| 17273838 | PLASMA PROCESSING APPARATUS | Non-Final OA | Hitachi High-Tech Corporation |
| 18983235 | APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION | Non-Final OA | Applied Materials, Inc. |
| 18632421 | SUSCEPTOR | Non-Final OA | Applied Materials, Inc. |
| 18397234 | AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING | Non-Final OA | APPLIED MATERIALS, INC. |
| 18336036 | EVAPORATION DEVICE AND EVAPORATION METHOD | Non-Final OA | APPLIED MATERIALS, INC. |
| 18131212 | HIGH TEMPERATURE METAL SEALS FOR VACUUM SEGREGATION | Final Rejection | Applied Materials, Inc. |
| 16922931 | MULTI-LID STRUCTURE FOR SEMICONDUCTOR PROCESSING SYSTEM | Final Rejection | Applied Materials, Inc. |
| 18788133 | THIN FILM DEPOSITION WITH IMPROVED CONTROL OF PRECURSOR | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 17811876 | THIN FILM DEPOSITION WITH IMPROVED CONTROL OF PRECURSOR | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18677456 | Workpiece Processing Apparatus and Methods for the Treatment of Workpieces | Non-Final OA | Mattson Technology, Inc. |
| 17432284 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PHOTOCATALYST | Non-Final OA | EBARA CORPORATION |
| 16340702 | A PROCESSING APPARATUS AND A METHOD FOR CORRECTING A PARAMETER VARIATION ACROSS A SUBSTRATE | Final Rejection | ASML NETHERLANDS B.V. |
| 18002512 | SUBSTRATE PROCESSING APPARATUS AND METHOD | Final Rejection | Picosun Oy |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy43.1% of resolved applications examined by Karla A Moore were allowed (791 resolved cases), compared with 43.3% across Art Unit 1712 over the last five years.
This examiner's interview lift is +13.6 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Karla A Moore took 1,508 days on average from filing to allowance.
Karla A Moore examines applications in Art Unit 1712 in Tech Center 1700 (Chemistry & Materials).
