Listed by the USPTO as NGUYEN, HUNG
Tech Center 2800 • Art Units: 2851 2852 2882 2893 2899
This examiner grants 91% of resolved cases
NGUYEN, HUNG is assigned to tech center 2800 and art unit 2851. The record covers 1491 resolved cases, with a 90.7% allowance rate. The 9.0% interview lift shows a positive but limited association between interviews and allowance outcomes. The median time to allowance is 796 days, so applicants should account for a meaningful examination interval even with the favorable allowance record.
The listed companies are Taiwan Semiconductor Manufacturing Company, Ltd., Carl Zeiss SMT GmbH, and Xsys Prepress NV. The leading firms are Studebaker Brackett PLLC, Akona IP PC - Intel, and EDELL, SHAPIRO & FINNAN, LLC. Practitioners may prioritize written claim clarity and focused amendments, with interviews available as a supplemental measure. The case volume gives the profile substantial historical support.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19007073 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19082370 | EXPOSURE APPARATUS, METHOD OF CONTROLLING EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING PRODUCT | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18383525 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY | Non-Final OA | NIKON CORPORATION |
| 19057024 | DIFFUSER-LESS GRAY-TONE LITHOGRAPHY PROCESS, MASK DESIGN, AND FABRICATION METHOD | Non-Final OA | Applied Materials, Inc. |
| 19068296 | METHOD OF USING WAFER STAGE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 19015027 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SEMICONDUCTOR DEVICE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18931576 | METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 19056047 | SUB-RESOLUTION GRATINGS IN EUV IMAGING | Non-Final OA | Katholieke Universiteit Leuven |
| 18877245 | METHOD FOR THE REPLICATION OF A HOLOGRAM BY MEANS OF AN OPTICAL ADHESIVE FILM | Non-Final OA | Carl Zeiss Jena GmbH |
| 18998282 | OPTICAL APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 19082502 | EUV TRANSMISSIVE MEMBRANE, PELLICLE, AND EXPOSURE METHOD | Non-Final OA | NGK INSULATORS, LTD. |
| 18861859 | METHOD AND SYSTEM OF OVERLAY MEASUREMENT USING CHARGED-PARTICLE INSPECTION APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 19059808 | INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, OPTICAL ELEMENT FOR A PROJECTION EXPOSURE APPARATUS, METHOD FOR PRODUCING AN INTERMEDIATE PRODUCT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT | Non-Final OA | Carl Zeiss SMT GmbH |
| 19047910 | CHAMBER DEVICE, GAS LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18854630 | METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM | Non-Final OA | XSYS PREPRESS NV |
| 18907982 | METHOD FOR IMAGING A MASK LAYER AND ASSOCIATED IMAGING SYSTEM | Non-Final OA | XSYS PREPRESS NV |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy90.7% of resolved applications examined by Hung Nguyen were allowed (1,491 resolved cases), compared with 76.4% across Art Unit 2851 over the last five years.
This examiner's interview lift is +9.0 percentage points: the difference in allowance rate between resolved applications that had an examiner interview and those that did not.
Applications allowed by Hung Nguyen took 796 days on average from filing to allowance.
Hung Nguyen examines applications in Art Unit 2851 in Tech Center 2800 (Semiconductors, Circuits & Optics).
